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31 条记录 (耗时 0.019 秒)

    Alkyl or alkoxy substituted S-heterocyclic retinoids
    2.
    发明授权
    Alkyl or alkoxy substituted S-heterocyclic retinoids 失效
    烷基或烷氧基取代的S-杂环类视黄醇

    公开(公告)号：US5512683A

    公开(公告)日：1996-04-30

    申请号：US324836

    申请日：1994-10-18

    申请人： Michael Klaus ,  Peter Mohr

    发明人： Michael Klaus ,  Peter Mohr

    IPC分类号： A61K31/38 ,  A61K31/381 ,  A61K31/382 ,  A61P17/00 ,  A61P37/06 ,  C07D333/54 ,  C07D335/06 ,  C07D337/08 ,  C07D337/04

    CPC分类号： C07D333/54 ,  C07D335/06 ,  C07D337/08

    摘要： Compounds of the formula ##STR1## in which X is --S--, --SO-- or --SO.sub.2 --; R.sup.1 is C.sub.7-10 -alkyl or C.sub.7-10 -alkoxy; R.sup.2 is a residue of the formula ##STR2## R.sup.3 is carboxy or lower-alkoxycarbonyl; and n is an integer of 1, 2 or 3; and salts of carboxylic acids of formula I can be used for the treatment of autoimmune diseases and diseases having a strong immunological component, such as psoriasis.

    摘要翻译： 其中X是-S-，-SO-或-SO 2 - 的式I的化合物; R1是C7-10-烷基或C7-10-烷氧基; R 2是下式的残基：R 3是羧基或低级烷氧基羰基; n为1,2或3的整数; 式I的羧酸盐可用于治疗具有强免疫组分的自身免疫性疾病和疾病，例如牛皮癣。

    Process for the manufacture of compounds containing vinyl groups
    3.
    发明授权
    Process for the manufacture of compounds containing vinyl groups 失效

    公开(公告)号：US4016203A

    公开(公告)日：1977-04-05

    申请号：US374142

    申请日：1973-06-27

    申请人： Hermann Rempfler ,  Hans Bosshard ,  Kurt Weber

    发明人： Hermann Rempfler ,  Hans Bosshard ,  Kurt Weber

    IPC分类号： C07D327/06 ,  C07D333/46 ,  C07D335/02 ,  C07D337/00 ,  C07D337/04 ,  C07D339/08 ,  C09B69/02 ,  C07C143/24

    CPC分类号： C09B69/02 ,  C07D327/06 ,  C07D333/46 ,  C07D337/04

    摘要： A novel process for the production of compounds of the formula ##STR1## wherein A and A.sub.1, independently of one another, denote phenyl, naphthyl, diphenylyl, 2-phenyl-1,2,3-triazol-4-yl or pyridyl, it being possible for A and A.sub.1 to contain non-chromophoric substituents, and D denotes 4,4'-diphenylylene,1,5- or 2,6-naphthylene, or a 9,10-dihydrophenanthrene or dibenzofurane radical which is bonded to the vinylene groups in the 2,7-position, which comprises reacting in a first stage a compound of the formulaX-CH.sub.2 -D-CH.sub.2 -X (II)wherein X denotes halogen, especially chlorine or bromine, hydroxyl or a group ##STR2## wherein X.sub.1 represents an aliphatic cycloaliphatic or aromatic hydrocarbon radical, especially alkyl having 1 to 6 carbon atoms, or phenyl, and D has the indicated meaning, in a strongly acid medium, in a molar ratio of at least 1:2, with an organic sulphide containing 5 to 8 ring members, of the formula ##STR3## wherein B represents a polymethylene group of 4 to 7 methylene groups and wherein one of these methylene groups can be replaced by a hetero-atom and wherein these methylene groups can also contain alkyl groups with 1 to 4 carbon atoms as substituents, to give a sulphonium salt of the formula ##STR4## wherein M represents the anion of the strong acid used and n denotes the numbers 1 or 2; reacting, in a second stage, the resulting sulphonium salt with 2 mols of an aldehyde of the formula(V) A-CHOor (VI) A.sub.1 -CHOor their mixture, in the presence of strong bases, in a strongly polar, protic or aprotic, water-miscible solvent to give a diepoxide of the formula ##STR5## and subjecting in a 3rd stage, the diepoxide of the formula (VII), thus obtained, to a reduction according to processes which are in themselves known for the reduction of epoxides, with elimination of the epoxide oxygen and formation of vinylene groups.