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244 条记录 (耗时 0.033 秒)

    Cyclic sulfonium salt, process for production of same, and α-glucosidase inhibitor comprising same
    2.
    发明授权
    Cyclic sulfonium salt, process for production of same, and α-glucosidase inhibitor comprising same 有权
    环状锍盐，其制备方法，和含有它的α-葡糖苷酶抑制剂

    公开(公告)号：US09073897B2

    公开(公告)日：2015-07-07

    申请号：US13982715

    申请日：2012-01-31

    申请人： Osamu Muraoka ,  Genzoh Tanabe

    发明人： Osamu Muraoka ,  Genzoh Tanabe

    IPC分类号： C07D409/12 ,  A23L1/30 ,  C07D333/46

    CPC分类号： C07D409/12 ,  A23L33/10 ,  C07D333/46

    摘要： Provided is a novel cyclic sulfonium salt compound which is useful for the prevention or treatment of diabetes and the like. The present invention relates to a novel cyclic sulfonium salt compound represented by general formula (I) or (II), an isomer or solvate of the compound, or a pharmaceutically acceptable salt of the compound or the isomer or solvate. The present invention also relates to an α-glucosidase inhibitor, a pharmaceutical composition for preventing or treating diabetes, and an anti-diabetes food, each of which comprises the compound represented by general formula (I) or (II) and the like.

    摘要翻译： 提供了可用于预防或治疗糖尿病等的新型环状锍盐化合物。 本发明涉及由通式（I）或（II）表示的新型环状锍盐化合物，该化合物的异构体或溶剂化物，或该化合物或异构体或溶剂合物的药学上可接受的盐。 本发明还涉及α-葡萄糖苷酶抑制剂，用于预防或治疗糖尿病的药物组合物和抗糖尿病食品，其各自包含由通式（I）或（II）表示的化合物等。

    SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
    7.
    发明申请
    SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN 有权
    盐，光电组合物和生产光电子图案的方法

    公开(公告)号：US20120328986A1

    公开(公告)日：2012-12-27

    申请号：US13443175

    申请日：2012-04-10

    申请人： Yukako ANRYU ,  Koji ICHIKAWA

    发明人： Yukako ANRYU ,  Koji ICHIKAWA

    IPC分类号： C07C309/19 ,  C07D333/22 ,  C07C69/96 ,  G03F7/027 ,  G03F7/20

    CPC分类号： C07C309/12 ,  C07C25/18 ,  C07C303/32 ,  C07C309/17 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D327/08 ,  C07D333/46 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y02P20/55

    摘要： A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.

    摘要翻译： 由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，n表示0或1，L1表示单键或C1-C10烷二基，其中亚甲基 可以被氧原子或羰基取代，条件是当n为0时，L1不是单键，环W表示可以被氧原子替代亚甲基的C 3 -C 36脂族环，硫原子， 羰基或磺酰基，其中氢原子可以被羟基，C 1 -C 12烷基或C 1 -C 12烷氧基取代，R 1表示羟基或被保护基保护的羟基， Z +表示有机阳离子。

    Chemically amplified resist composition and salt employed therein
    9.
    发明授权
    Chemically amplified resist composition and salt employed therein 有权
    化学扩增抗蚀剂组合物和其中使用的盐

    公开(公告)号：US08288077B2

    公开(公告)日：2012-10-16

    申请号：US12844557

    申请日：2010-07-27

    申请人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

    发明人： Koji Ichikawa ,  Isao Yoshida ,  Satoshi Yamaguchi

    IPC分类号： G03F7/004 ,  C07C309/00

    CPC分类号： C07C381/12 ,  C07C309/17 ,  C07C2601/14 ,  C07C2603/74 ,  C07D307/77 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    摘要： The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor.By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.

    摘要翻译： 本发明的目的是提供一种分辨率和掩模误差增强因子优异的化学放大抗蚀剂组合物。 通过使用由式（A1）表示的盐作为抗蚀剂组合物的酸产生剂，实现了上述目的。 其中Z +表示有机阳离子，Q1和Q2各自独立地表示氟原子或全氟烷基，Ra2表示二价脂环族烃基，Ra2表示由式（II-1）或（II- 2）。 在式（II-1）或（II-2）中，Ra 3和Ra 4各自独立地表示氢原子或脂肪族烃基，Ra 5表示脂肪族烃基，Ra 6表示二价脂肪族烃基，Ra 7表示脂肪族 烃基。