Composition for film formation and film
    1.
    发明授权
    Composition for film formation and film 有权
    成膜和成膜

    公开(公告)号:US06235101B1

    公开(公告)日:2001-05-22

    申请号:US09203534

    申请日:1998-12-01

    IPC分类号: C09D525

    摘要: A composition for film formation and a film obtained by heating the composition. The composition comprises: (A) a hydrolyzate and/or partial condensate of a compound represented by the following formula (1) R1nSi(OR2)4-n  (1) wherein R1 and R2 may be the same or different and each represent an alkyl group having 1 to 5 carbon atoms or an aryl group having 6 to 20 carbon atoms, and n is an integer of 1 or 2; (B) a metal chelate compound represented by the following formula (2) R3tM(OR4)s-t  (2) wherein R3 represents a chelating agent, M represents a metal atom, R4 represents an alkyl group having 2 to 5 carbon atoms or an aryl group having 6 to 20 carbon atoms, s represents a valence of the metal M, and t is an integer of 1 to s; (C) an organic solvent having a boiling point of 110 to 180° C.; and (D) &bgr;-diketone.

    摘要翻译: 用于成膜的组合物和通过加热组合物获得的膜。组合物包含:(A)由下式(1)表示的化合物的水解产物和/或部分缩合物,其中R 1和R 2可以相同或不同, 各自表示碳原子数1〜5的烷基或碳原子数6〜20的芳基,n表示1或2的整数,(B)由下式(2)表示的金属螯合物,其中,R3表示 螯合剂,M表示金属原子,R4表示碳原子数2〜5的烷基或碳原子数6〜20的芳基,s表示金属M的化合价,t表示1〜s的整数。 ;(C)沸点为110〜180℃的有机溶剂。 和(D)β-二酮。