Device for analyzing gaseous samples
    1.
    发明授权
    Device for analyzing gaseous samples 失效
    气体样品分析装置

    公开(公告)号:US06381014B1

    公开(公告)日:2002-04-30

    申请号:US09389348

    申请日:1999-09-03

    IPC分类号: G01N2173

    CPC分类号: G01N21/73

    摘要: The invention relates to a device for analyzing gaseous samples comprising a device for generating a plasma, a feeding device for the sample to be analyzed and at least one detector unit which in particular comprises at least one interference filter, a lens arrangement and a photodetector for detecting radiation, especially atomic emission or molecular emission, emitted by the sample to be analyzed. According to the invention, said device for generating the plasma is made up of two in particular ring- or disk-shaped parallel, interspaced electrodes, wherein each electrode has one essentially centrical, especially circular through-opening, and an isolator positioned between said electrodes, said isolator having a particularly circular through-opening for confining the plasma. In addition the invention provides for an optical unit, in particular a collimator lens, to be placed between said device for generating the plasma and the detector unit for forming a parallel ray beam.

    摘要翻译: 本发明涉及一种用于分析气体样品的装置,包括用于产生等离子体的装置,用于待分析的样品的进料装置和至少一个检测器单元,其特别地包括至少一个干涉滤光器,透镜装置和光电检测器 检测待分析样品发射的辐射,特别是原子发射或分子发射。 根据本发明,用于产生等离子体的所述装置由两个特别是环形或盘形的平行的间隔电极组成,其中每个电极具有一个基本上是中心的,特别是圆形的通孔,以及位于所述电极之间的隔离器 所述隔离器具有用于限制等离子体的特别圆形的通孔。 此外,本发明提供了一种光学单元,特别是准直透镜,其被放置在用于产生等离子体的所述装置和用于形成平行射线束的检测器单元之间。

    Microwave plasma monitoring system for real-time elemental analysis
    2.
    发明授权
    Microwave plasma monitoring system for real-time elemental analysis 失效
    微波等离子体监测系统进行实时元素分析

    公开(公告)号:US06429935B1

    公开(公告)日:2002-08-06

    申请号:US09580100

    申请日:2000-05-26

    申请人: Yixiang Duan

    发明人: Yixiang Duan

    IPC分类号: G01N2173

    CPC分类号: G01N21/73

    摘要: There has been invented a process for analyzing ambient air in a microwave induced plasma without use of an additional carrier gas. There has also been invented an apparatus for analyzing ambient air, other sample gas, or nebulized and desolvated liquids wherein a novel arrangement of plasma gas and sample gas conduits is used to enhance dependability of the plasma. This apparatus embodiment of the invention has a concentric arrangement of plasma gas and sample gas conduits so as to provide a sheath of plasma gas both within and surrounding the flow of analyte into the plasma region. The microwave plasma torch can either be contained within a sealed housing or can be operated in ambient air at ambient pressures. The microwave plasma torch of this invention is portable and can be operated continuously for real-time analysis of air. The apparatuses and methods of the present invention can be used wherever there is a need for monitoring air for the presence of minor amounts of elements, particularly transition metals, rare earth elements, actinides, and alkali and alkaline earth elements. The invention apparatus can also be used to monitor for the presence of halogens, sulfur and silicon. The invention apparatuses and methods are more particularly useful for monitoring air for the presence of beryllium.

    摘要翻译: 已经发明了一种用于分析微波感应等离子体中的环境空气而不使用另外的载气的方法。 还已经发明了用于分析环境空气,其它样品气体或雾化和脱溶液体的装置,其中使用等离子体气体和样品气体导管的新颖布置来增强等离子体的可靠性。 本发明的该装置实施例具有等离子体气体和样品气体管道的同心布置,以便在分析物流进入等离子体区域内并围绕其中包围等离子体气体鞘。 微波等离子体焰炬可以包含在密封的外壳中,也可以在环境空气中在环境压力下操作。 本发明的微波等离子体焰炬是便携式的并且可以连续地操作以便对空气进行实时分析。 本发明的装置和方法可以在需要监测空气中是否存在少量元素,特别是过渡金属,稀土元素,锕系元素和碱金属和碱土金属元素的地方使用。 本发明装置还可用于监测卤素,硫和硅的存在。 本发明的装置和方法对于监测空气是否存在铍更为特别有用。

    Method and a system for identifying gaseous effluents, and a facility provided with such a system
    3.
    发明授权
    Method and a system for identifying gaseous effluents, and a facility provided with such a system 失效
    用于识别气体流出物的方法和系统,以及设置有这种系统的设备

    公开(公告)号:US06643014B2

    公开(公告)日:2003-11-04

    申请号:US09487722

    申请日:2000-01-19

    IPC分类号: G01N2173

    CPC分类号: G01N21/68

    摘要: The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases. According to the invention the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source in contact with the gases contained in the enclosure and combined with a generator for generating a plasma from the gases to be analyzed; and the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing the variation of the radiation spectrum emitted by the generated plasma.

    摘要翻译: 本发明涉及一种用于在受控压力下分析外壳中的气体的气体分析系统,该系统包括用于离子化待分析气体的装置和用于分析电离气体的装置。 根据本发明,用于电离待分析的气体的装置包括与包含在外壳中的气体接触的专用等离子体源,并与用于从待分析的气体产生等离子体的发生器组合; 并且用于分析电离气体的装置包括位于产生等离子体的区域附近的辐射传感器,并且连接到用于分析由所产生的等离子体发射的辐射光谱的变化的光谱仪。

    Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy
    4.
    发明授权
    Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopy 失效
    使用光发射光谱法监测等离子体半导体处理期间的膜特性

    公开(公告)号:US06633391B1

    公开(公告)日:2003-10-14

    申请号:US09708258

    申请日:2000-11-07

    IPC分类号: G01N2173

    CPC分类号: G01N21/71

    摘要: A method and system to monitor characteristics of films by sensing the spectral emissions of a plasma to which the films are exposed. As a result, the method includes sensing optical energy produced by the plasma. The optical energy has a plurality of spectral bands associated therewith, a subset of which is identified as including information corresponding to the film characteristics. The film characteristics are then measured as a function of this information. To increase the accuracy of the measurements, in one embodiment of the present invention a subgroup of the plurality of spectral bands is observed that has data associated that is substantially independent of the characteristics of interest. The characteristics are then measured as a function of both the information and the data.

    摘要翻译: 通过感测膜暴露于其中的等离子体的光谱发射来监测膜的特性的方法和系统。 结果,该方法包括感测由等离子体产生的光能。 光能具有与其相关联的多个光谱带,其一部分被识别为包括对应于胶片特性的信息。 然后根据该信息测量胶片特性。 为了提高测量的准确度,在本发明的一个实施例中,观察到具有与感兴趣特征基本上独立的数据相关联的多个频谱带的子组。 然后,根据信息和数据的不同,测量特征。

    Continuous emissions monitor of multiple metal species in harsh environments
    5.
    发明授权
    Continuous emissions monitor of multiple metal species in harsh environments 失效
    在恶劣环境中多种金属物种的连续排放监测

    公开(公告)号:US06577390B1

    公开(公告)日:2003-06-10

    申请号:US10031527

    申请日:2002-01-17

    IPC分类号: G01N2173

    摘要: A continuous emissions monitor for the measurement of vapor phase and particulate-based metals in gas streams such as those at coal-fired utility plants, incinerators and manufacturing facilities, in which a pulsed plasma source (10), utilizing a resonant reentrant microwave cavity (12) which is powered by a microwave generator (34), operates at sub atmospheric pressures (

    摘要翻译: 用于测量诸如在燃煤电厂,焚化炉和制造设施的燃气流中的气相和颗粒状金属的连续排放监测器,其中使用谐振可重入微波腔(10)的脉冲等离子体源(10) 由微波发生器(34)提供动力的电池(12)通过使用泵(48)在次大气压(<50乇)下工作,以消除气流中其它物质的发光过程的猝灭,并减少 背景辐射和源的脉冲操作减少了由氮气和氧气运行的等离子体源产生的氮氧化物的背景光发射,从而增强了对比度和信号对背景; 导致仪器对于汞以及其他金属元素如砷和硒具有0.01微克/立方米-3的最小检测水平,并且需要小于10瓦的微波功率。