Fabrication method of liquid crystal display device having a reduced number of process steps
    1.
    发明授权
    Fabrication method of liquid crystal display device having a reduced number of process steps 有权
    液晶显示装置的制造方法具有减少的工艺步骤数量

    公开(公告)号:US06590623B2

    公开(公告)日:2003-07-08

    申请号:US10118081

    申请日:2002-04-09

    IPC分类号: G02F136

    摘要: A method for fabricating a liquid crystal display device comprises steps of forming a first metal layer on a substrate and patterning the first metal layer into a plurality of scanning signal lines using a photolithographic treatment; forming a first insulating film, a semiconductor layer, and a second metal layer sequentially in this order on the substrate so as to cover the plurality of scanning signal lines thereby without a photolithographic treatment; patterning the second metal layer into a plurality of data lines and a plurality of electrodes using a photolithographic treatment so that the plurality of data lines extend in a transverse direction to extension directions of the plurality of scanning signal lines and each of the plurality of electrodes confronts one of the data lines on one of the plurality of the scanning signal lines; etching the semiconductor layer using a mask; forming a second insulating film on the data lines, the electrodes, and the first insulating film; forming a plurality of openings through the second insulating film at portions thereof located on the respective electrodes using a photolithographic treatment, each of the plurality of openings exposing one of the electrodes; forming an oxide conductor film on the second insulating film so that the oxide conductor film contacts with each of the electrodes in each of the plurality of openings; and patterning the oxide conductor film into a plurality of pixel electrodes, each of which is connected to one of the electrodes using a photolithographic treatment.

    摘要翻译: 一种制造液晶显示装置的方法包括以下步骤:在基板上形成第一金属层,并使用光刻处理将第一金属层图案化成多条扫描信号线; 在基板上依次顺序地形成第一绝缘膜,半导体层和第二金属层,从而不经光刻处理覆盖多个扫描信号线; 使用光刻处理将第二金属层图案化成多个数据线和多个电极,使得多条数据线在横向上延伸到多条扫描信号线的延伸方向,并且多个电极中的每一条面对 在多条扫描信号线之一上的数据线之一; 使用掩模蚀刻半导体层; 在数据线,电极和第一绝缘膜上形成第二绝缘膜; 通过使用光刻处理在位于各个电极的部分处通过第二绝缘膜形成多个开口,多个开口中的每一个露出电极中的一个; 在所述第二绝缘膜上形成氧化物导体膜,使得所述氧化物导体膜与所述多个开口中的每一个中的每个电极接触; 以及将氧化物导体膜图案化成多个像素电极,每个像素电极使用光刻处理连接到一个电极。