公开(公告)号：US06239861B1

公开(公告)日：2001-05-29

申请号：US09479671

申请日：2000-01-10

申请人： Kei Nara ,  Tsuyoshi Naraki

发明人： Kei Nara ,  Tsuyoshi Naraki

IPC分类号： G03B2442

CPC分类号： G03F7/70466 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70808

摘要： A substrate coated with a photosensitive agent is exposed to light beams passing through a mask by projecting the light beams upon the substrate through a projection optical system, on which occasion areas having a large layer thickness of the photosensitive agent on the substrate are subjected to double exposures, i.e., the exposure through the projection optical system and an exposure through an optical system different therefrom.

摘要翻译： 用感光剂涂布的基材通过投影光学系统将光束投射到基板上而暴露于通过掩模的光束，在该情况下，基板上的感光剂层厚度大的区域经受双重 曝光，即通过投影光学系统的曝光和通过与其不同的光学系统的曝光。