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44 条记录 (耗时 0.021 秒)

    Black-and-white organic solvent-based photothermographic materials containing mercaptotriazole toners
    2.
    发明申请
    Black-and-white organic solvent-based photothermographic materials containing mercaptotriazole toners 失效
    含有巯基三唑调色剂的黑白有机溶剂型光热成像材料

    公开(公告)号：US20040013984A1

    公开(公告)日：2004-01-22

    申请号：US10192944

    申请日：2002-07-11

    申请人： Eastman Kodak Company

    发明人： Doreen C. Lynch ,  Stacy M. Ulrich ,  Chaofeng Zou

    IPC分类号： G03C001/34 ,  G03C001/498 ,  G03C001/825

    CPC分类号： G03C1/49845 ,  G03C1/49809 ,  G03C1/49881 ,  G03C2200/40 ,  G03C2200/43

    摘要： Organic solvent-based photothermographic materials comprise one or more mercaptotriazoles represented by the following Structure I as toner(s): 1 wherein R1 and R2 independently represent hydrogen, or an alkyl, aryl, aralkyl, alkenyl, cycloalkyl, or aromatic or non-aromatic heterocyclyl group, M is hydrogen or a cation, or R1 and R2 taken together can form a saturated or unsaturated heterocyclic ring, or still again, R1 and R2 taken together can represent a divalent linking group, provided that R1 and R2 are not simultaneously hydrogen or an unsubstituted phenyl group, and further provided that when R2 is hydrogen, R1 is not a methyl or phenyl group having a solubilizing substituent.

    摘要翻译： 有机溶剂型光热敏成像材料包含一种或多种由以下结构I表示的巯基三唑作为调色剂：其中R 1和R 2独立地表示氢或烷基，芳基，芳烷基，烯基，环烷基或芳族或非芳族杂环基 基团，M是氢或阳离子，或者R 1和R 2一起可以形成饱和或不饱和的杂环，或者再一次，R 1和R 2一起可以表示二价连接基团，条件是R 1和R 2不同时为氢或 未取代的苯基，进一步条件是当R 2为氢时，R 1不是具有增溶取代基的甲基或苯基。

    Fluorinated surfactants in overcoat compositions and elements containing same
    3.
    发明申请
    Fluorinated surfactants in overcoat compositions and elements containing same 审中-公开
    外涂层组合物中含氟表面活性剂和含有它们的元素

    公开(公告)号：US20030148232A1

    公开(公告)日：2003-08-07

    申请号：US10156298

    申请日：2002-05-28

    发明人： Michael W. Orem ,  Ronald R. Andrews

    IPC分类号： G03C001/815 ,  G03C001/825 ,  G03C001/85

    CPC分类号： G03C1/85 ,  G03C1/385

    摘要： A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I):RfnullCH2CH2nullSnull(A)nullDnullnull(I)where Rf is null(CF2)nCF3, where n is 3 or 5 in at least 90% of the Rf groups present; A is a divalent linking group that includes substituted alkylene or alkylene (N-alkylene)amide; and D is an anionic group or a cationic group. A photographic element with an outermost layer containing the coating composition is also disclosed.

    摘要翻译： 一种用于在照相元件中形成外涂层的涂料组合物，所述组合物包含水溶液：两种或更多种表面活性剂的混合物; 亲水性粘合剂; 哑光珠; 和润滑剂; 其中一种表面活性剂由下式（I）表示：Rf-CH 2 CH 2 -S-（A）-D（I）其中R f为 - （CF 2）n CF 3，其中n为3或5，至少90％ Rf组存在; A是包含取代的亚烷基或亚烷基（N-亚烷基）酰胺的二价连接基团; D为阴离子基团或阳离子基团。 还公开了具有包含涂料组合物的最外层的照相元件。

    Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
    4.
    发明申请
    Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed 有权

    公开(公告)号：US20020136970A1

    公开(公告)日：2002-09-26

    申请号：US10054932

    申请日：2002-01-25

    发明人： Toshihiko Tanaka ,  Shoichi Uchino ,  Naoko Asai

    IPC分类号： G03F009/00 ,  G03C005/00 ,  G03C001/815 ,  G03C001/825

    CPC分类号： G03F7/091 ,  Y10S430/151

    摘要： Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.

    Aggregated dyes for radiation-sensitive elements
    5.
    发明申请
    Aggregated dyes for radiation-sensitive elements 失效
    用于辐射敏感元件的聚集染料

    公开(公告)号：US20010038979A1

    公开(公告)日：2001-11-08

    申请号：US09733787

    申请日：2000-12-07

    发明人： Margaret Jones Helber ,  William James Harrison ,  Elizabeth Ann Gallo ,  Mary Christine Brick ,  Steven Wade Kortum ,  Gary Norman Barber

    IPC分类号： G03C001/83 ,  G03C001/815 ,  G03C001/825

    CPC分类号： G03C1/832 ,  C09B67/008

    摘要： A dispersion comprising an aqueous medium having dispersed therein an aggregated dye of the Formula (I): 1 wherein X is oxygen or sulfur; R1-R4 each independently represent an unsubstituted or substituted alkyl group, an unsubstituted or substituted aryl group or an unsubstituted or substituted heteroaryl group; L1, L2 and L3 each independently represent substituted or unsubstituted methine groups; Mnull represents a proton or an inorganic or organic cation; and n is 0, 1, 2 or 3 and wherein the aggregated dye in the dispersion has an absorption halfbandwidth of less than 55 nm.

    摘要翻译： 一种分散体，其包含其中分散有式（I）的聚集染料的水性介质：其中X是氧或硫; R 1 -R 4各自独立地表示未取代或取代的烷基，未取代或取代的芳基或未取代或取代的杂芳基; L1，L2和L3各自独立地表示取代或未取代的次甲基; M +表示质子或无机或有机阳离子; 并且n为0,1,2或3，并且其中所述分散体中的聚集染料的吸收半带宽小于55nm。

    Holographic recording medium
    8.
    发明申请
    Holographic recording medium 有权
    全息记录介质

    公开(公告)号：US20040067419A1

    公开(公告)日：2004-04-08

    申请号：US10676747

    申请日：2003-10-01

    申请人： TDK Corporation

    发明人： Tetsuro Mizushima

    IPC分类号： G03H001/04 ,  G03C001/825 ,  G03C001/815

    CPC分类号： G11B7/252 ,  G11B7/0065 ,  G11B7/00745 ,  G11B7/0938 ,  G11B7/24044 ,  G11B7/2533 ,  G11B7/2548 ,  G11B2007/25411 ,  G11B2007/25414 ,  G11B2007/25417

    摘要： A holographic recording medium includes a holographic recording carrier including a first light transmittable substrate, a second light transmittable substrate and a holographic recording layer sandwiched therebetween, a first antireflection film formed on the surface of the first light transmittable substrate and a second antireflection film formed on the surface of the second light transmittable substrate, and optical characteristics of the first antireflection film and those of the second antireflection film are determined to be different from each other the thus constituted holographic recording medium can achieves improved data recording characteristics and data reproducing characteristics using an object beam and a reference beam, and concurrently enables desired positioning of an object beam and a reference beam, or only the reference beam, and detection of the address of the region in which data are being recorded or from which data are being reproduced using a position control beam.

    摘要翻译： 全息记录介质包括全息记录载体，其包括第一透光性基板，第二可透光基板和夹在其间的全息记录层，形成在第一透光性基板的表面上的第一防反射膜和形成在第一透光性基板上的第二防反射膜 第二透光性基板的表面和第一防反射膜的光学特性和第二防反射膜的光学特性被确定为彼此不同，因此构成的全息记录介质可以使用以下方式实现改善的数据记录特性和数据再现特性 目标光束和参考光束，并且同时使得能够对目标光束和参考光束或仅参考光束进行期望的定位，以及检测正在记录数据的区域的地址或使用 位置控制 梁。

    Thermally developable imaging materials with reduced mottle providing improved image uniformity
    9.
    发明申请
    Thermally developable imaging materials with reduced mottle providing improved image uniformity 失效
    具有降低斑点性的可显影成像材料，提供改善的图像均匀性

    公开(公告)号：US20030138738A1

    公开(公告)日：2003-07-24

    申请号：US10012171

    申请日：2001-12-05

    申请人： Eastman Kodak Company

    发明人： Bryan V. Hunt ,  Steven H. Kong ,  William D. Ramsden ,  Gary E. Labelle

    IPC分类号： G03C001/20 ,  G03C001/498 ,  G03C001/825 ,  G03C001/34

    CPC分类号： G03C1/49854 ,  G03C1/127 ,  G03C1/20 ,  G03C1/49872 ,  G03C1/74 ,  G03C1/825 ,  G03C2001/7635 ,  Y10S430/136 ,  Y10S430/162

    摘要： A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials are independently coated and dried while the material is conveyed at a rate of at least meters per minute.

    摘要翻译： 一种光热照相材料，其包括其上具有一个或多个可热显影的成像层的支撑体，所述成像层包括粘合剂和反应性缔合，感光卤化银，可还原银离子的非光敏源和用于非光敏源的还原组合物 可还原银离子。 热可显影层还包含一种或多种辐射吸收化合物，其在热显影成像层中提供大于0.6且高达和包括3的总吸光度。 这些光热敏成像材料被独立地涂覆并干燥，同时材料以至少每分钟米的速度输送。

    Method of preparing planographic printing plate
    10.
    发明申请
    Method of preparing planographic printing plate 有权
    制备平版印刷版的方法

    公开(公告)号：US20030113667A1

    公开(公告)日：2003-06-19

    申请号：US10215673

    申请日：2002-08-08

    发明人： Toshiyuki Matsumura

    IPC分类号： G03F007/30 ,  G03C001/815 ,  G03C001/825

    CPC分类号： G03F7/029 ,  G03F7/033 ,  G03F7/092 ,  G03F7/322

    摘要： A planographic printing plate manufacturing method is disclosed which comprises the step of developing a presensitized planographic printing plate with a developer with a pH of from 11.5 to less than 12.5 which does not substantially contain an organic solvent, wherein the presensitized planographic printing plate comprises a support having a roughened hydrophilic surface with a center line average surface roughness Ra of from 0.5 to 0.8 nullm, and provided thereon, a photopolymerizable light sensitive layer and an oxygen shielding layer in that order, the photopolymerizable light sensitive layer containing A) an addition polymerizable monomer having an ethylenic double bond, B) a photopolymerization initiator, C) a sensitizing dye, and D) a polymer binder, and the oxygen shielding layer containing E) polyvinyl alcohol and F) polyvinyl pyrrolidone.

    摘要翻译： 公开了一种平版印刷版制造方法，其包括用pH为11.5至小于12.5的显影剂显影未敏化平版印刷版的步骤，所述显影剂基本上不含有机溶剂，其中所述预敏化平版印刷版包括载体 具有中心线平均表面粗糙度Ra为0.5〜0.8μm的粗糙亲水性表面，并且依次设置光聚合性感光层和氧气屏蔽层，所述光聚合性感光层含有A）可加聚单体 具有乙烯双键，B）光聚合引发剂，C）增感染料，D）聚合物粘合剂，以及含有E）聚乙烯醇和F）聚乙烯吡咯烷酮的氧屏蔽层。