公开(公告)号：US06291145B1

公开(公告)日：2001-09-18

申请号：US09038683

申请日：1998-03-09

申请人： Tadayosi Kokubo ,  Kazuya Okamoto ,  Hiroshi Ooki ,  Masato Shibuya ,  Soichi Owa

发明人： Tadayosi Kokubo ,  Kazuya Okamoto ,  Hiroshi Ooki ,  Masato Shibuya ,  Soichi Owa

IPC分类号： G03F524

CPC分类号： G03F7/70466 ,  G03F7/033 ,  G03F7/038 ,  G03F7/2022

摘要： Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the mth power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator. The multiple exposures can be performed while: (a) changing the exposure intensity distribution on the photosensitive material, or (b) shifting the projected mask pattern and the sensitive substrate relative to each other by a specified amount, or (c) using a different projected mask pattern for each exposure.

摘要翻译： 公开了在这种方法中使用的图像形成方法和感光材料，其形成非常高分辨率的图案。 感光材料包括由自由基触发以进行潜像形成反应的成分。 自由基由照明光的光子产生。 或者，成分由被暴露产生的自由基活化的反应性中间体化合物触发。 感光材料具有根据入射光强度的第m次幂（m> 1）潜影反应密度增加的非线性灵敏度特性。 可以将感光材料施加到敏感基板上以进行曝光。 在存在自由基失活剂的情况下，使用投影的掩模图案来进行敏感基材的多次曝光。 可以执行多次曝光，同时：（a）改变感光材料上的曝光强度分布，或（b）将投影的掩模图案和敏感基板相对于彼此移动指定量，或（c）使用不同的 每次曝光的投影面具图案。