公开(公告)号：US09063436B2

公开(公告)日：2015-06-23

申请号：US13427512

申请日：2012-03-22

申请人： Soichi Owa ,  Hiroyuki Nagasaka ,  Ryu Sugawara

发明人： Soichi Owa ,  Hiroyuki Nagasaka ,  Ryu Sugawara

IPC分类号： G03F7/20

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70733

摘要： An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a first liquid between the first optical element and an upper surface of a transparent member provided on a side of the image plane of the projection optical system, and an observation unit which observes a state of the first liquid immersion area. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure.

摘要翻译： 曝光装置设置有投影光学系统，投影光学系统包括最靠近投影光学系统的像面设置的第一光学元件。 曝光装置包括：第一浸液机构，其在第一光学元件与设置在投影光学系统的像面侧的透明构件的上表面之间形成第一液体的第一液浸区域;以及观察 观察第一液浸区域的状态的单元。 可以掌握液体的液浸区域的状态，从而进行最佳的液浸曝光。

公开(公告)号：US08807978B2

公开(公告)日：2014-08-19

申请号：US12967572

申请日：2010-12-14

申请人： Soichi Owa ,  Katsura Otaki

发明人： Soichi Owa ,  Katsura Otaki

IPC分类号： C23F1/02 ,  C23F1/00 ,  B05D3/12

CPC分类号： G03F7/0002 ,  B29C33/424 ,  B29C43/003 ,  B29C43/021 ,  B29C43/14 ,  B29C2043/025 ,  B29C2043/142 ,  B29C2043/3634 ,  B29C2043/525 ,  B29C2043/561 ,  B29C2043/5833 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/9501 ,  G03F1/84

摘要： There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

摘要翻译： 提供了一种模板检查装置，其通过压印方法从具有凹凸形状的主模板检查复制模板，该模板检查装置包括：发出平面波的检查光的检查光源部; 配置成将所述主模板和所述副本模板配置成彼此靠近并被所述检查光照射的台; 以及检测部，其检测通过所述主模板和所述副本模板发送的与所述平面波不同的部件的光。 因此，可以在短时间内检查模板。

公开(公告)号：US08780327B2

公开(公告)日：2014-07-15

申请号：US13064867

申请日：2011-04-21

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.

摘要翻译： 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。

公开(公告)号：US08570632B2

公开(公告)日：2013-10-29

申请号：US13085001

申请日：2011-04-12

申请人： Soichi Owa ,  Junji Suzuki

发明人： Soichi Owa ,  Junji Suzuki

IPC分类号： G02B7/182 ,  G02B26/08

CPC分类号： G02B26/0841 ,  B81B3/0051 ,  B81B2201/042 ,  B81B2203/053 ,  B81B2203/058 ,  G02B26/001 ,  G03F7/70291 ,  G03F7/70825 ,  Y10S359/90

摘要： A pair of support members each having a spring section in a part thereof support a mirror element, and a pair of drive mechanisms arranged respectively corresponding to a pair of the support members transform the spring sections of the corresponding support members, thereby changing a distance between each of support points at which the support members support the mirror element and a base. Accordingly, the mirror element can be translated by driving all of the drive mechanisms, or the mirror element can be inclined with respect to the base by driving some of the drive mechanisms.

摘要翻译： 在其一部分中具有弹簧部分的一对支撑构件支撑反射镜元件，并且分别对应于一对支撑构件设置的一对驱动机构使相应的支撑构件的弹簧部分变换，从而改变 每个支撑点支撑构件支撑镜子元件和基座。 因此，可以通过驱动所有的驱动机构来平移镜元件，或者通过驱动一些驱动机构，镜元件可以相对于基座倾斜。

公开(公告)号：US08384880B2

公开(公告)日：2013-02-26

申请号：US12232064

申请日：2008-09-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo ,  Jiro Inoue ,  Hirotaka Kohno ,  Masahiro Nei ,  Motokatsu Imai ,  Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Yasufumi Nishii ,  Hiroaki Takaiwa

IPC分类号： G03B27/58 ,  G03B27/52 ,  G03B27/42 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US08040491B2

公开(公告)日：2011-10-18

申请号：US12007450

申请日：2008-01-10

申请人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo

发明人： Soichi Owa ,  Nobutaka Magome ,  Shigeru Hirukawa ,  Yoshihiko Kudo

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

摘要翻译： 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

公开(公告)号：US07995187B2

公开(公告)日：2011-08-09

申请号：US11767425

申请日：2007-06-22

申请人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

发明人： Naoyuki Kobayashi ,  Akikazu Tanimoto ,  Yasushi Mizuno ,  Kenichi Shiraishi ,  Katsushi Nakano ,  Soichi Owa

IPC分类号： G03B27/52 ,  G03B27/42

摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.

公开(公告)号：US07907253B2

公开(公告)日：2011-03-15

申请号：US11826465

申请日：2007-07-16

申请人： Hiroyuki Nagasaka ,  Soichi Owa ,  Yasugumi Nishii

发明人： Hiroyuki Nagasaka ,  Soichi Owa ,  Yasugumi Nishii

IPC分类号： G03B27/54 ,  G03B27/52

CPC分类号： G03F7/70733 ,  G03F7/70341 ,  G03F7/708 ,  G03F7/7095

摘要： An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system, and a liquid recovery mechanism which recovers the liquid on the substrate simultaneously at a plurality of positions. The liquid recovery mechanism recovers the liquid with a recovery force which differs depending on the position for recovering the liquid.

摘要翻译： 曝光装置通过将预定图案的图像通过液体投影到基板上来曝光基板。 曝光装置包括将图案的图像投影到基板上的投影光学系统，将液体供给到基板上以在基板的一部分上形成液浸区域的液体供给机构，该液浸区域包括投影光学部 系统，以及在多个位置同时回收基板上的液体的液体回收机构。 液体回收机构用回收力来回收液体，该恢复力根据用于回收液体的位置而不同。

公开(公告)号：US20100134772A1

公开(公告)日：2010-06-03

申请号：US12656456

申请日：2010-01-29

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Soichi Owa ,  Shigeru Hirukawa

IPC分类号： G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70925

摘要： An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.

摘要翻译： 曝光装置在投影光学系统的像面一侧形成液体的浸没区域，并通过投影光学系统和浸没区域的液体进行基板的曝光。 曝光装置具有光学清洁单元，其将具有光学清洁效果的预定照射光照射到例如与用于形成浸没区域的液体接触的基底台的上表面。 因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

公开(公告)号：US20100099049A1

公开(公告)日：2010-04-22

申请号：US12648648

申请日：2009-12-29

申请人： Soichi OWA ,  Shigeru HIRUKAWA

发明人： Soichi OWA ,  Shigeru HIRUKAWA

IPC分类号： G03F7/22 ,  G03B27/42

CPC分类号： G03F9/7003 ,  G03F7/70291 ,  G03F7/70475 ,  G03F9/7015 ,  G03F9/7019

摘要： During a period after starting exposure to a plurality of shot areas subject to exposure on a wafer until completing the exposure, a light via a slit pair arranged on a stage that holds the wafer, of illumination light via a pattern generating device, is received, and information on a positional relation between an illumination light and the stage (and hence a positional relation between the illumination light and the wafer) is detected. With this operation, even if the information on the positional relation between the illumination light and the wafer varies due to some reason, information on the variation can be detected while performing the exposure to the plurality of shot areas. Accordingly, high-precision exposure can be achieved in an exposure operation, by considering this detection results.

摘要翻译： 在开始曝光到在晶片上曝光的多个照射区域直到完成曝光之前的期间，接收经由图案生成装置经由经由经由经由图案生成装置保持晶片的台阶上的狭缝对的照明光的光， 并且检测关于照明光和舞台之间的位置关系的信息（因此照明光和晶片之间的位置关系）。 通过该操作，即使关于照明光和晶片之间的位置关系的信息由于某些原因而变化，也可以在对多个拍摄区域进行曝光的同时检测关于变化的信息。 因此，通过考虑该检测结果，可以在曝光操作中实现高精度的曝光。