SELECTIVE DEPOSITION MODELING MATERIAL
    94.
    发明申请
    SELECTIVE DEPOSITION MODELING MATERIAL 审中-公开
    选择沉积物建模材料

    公开(公告)号:WO00011092A1

    公开(公告)日:2000-03-02

    申请号:PCT/EP1999/005788

    申请日:1999-08-10

    Abstract: The present invention relates to a selective deposition modeling material containing a base material, a plasticizing component containing at least 10 % by weight of at least one plasticizing agent that is solid at ambient conditions, and at least one tackifying resin that is compatible with the base material and the plasticizing component, wherein the modeling material has a viscosity of less than about 30 mPa s (centipoise) at 130 DEG C. The selective deposition modeling material can alternatively contain about 52 % to 98 % of a reactive polymeric material that is a mixture of at least one compound containing at least one glycidyl group per molecule, at least one compound having at least one terminal unsaturated group per molecule, at least one compound having at least one vinyl ether group per molecule or mixtures thereof; and a cure agent or activator; and optionally a non-reactive polymeric material or wax material, wherein the modeling material contains a fast set inducing segment content of about 10 % to 70 % by weight. The present invention further relates to a method for producing a three-dimensional article using said modeling materials.

    Abstract translation: 本发明涉及包含基材的选择性沉积建模材料,包含至少10重量%的至少一种在环境条件下为固体的增塑剂的增塑组分和至少一种与碱相容的增粘树脂 材料和增塑组分,其中建模材料在130℃下具有小于约30mPa·s(厘泊)的粘度。选择性沉积建模材料可以包含约52%至98%的反应性聚合物材料,其为 每分子含有至少一个缩水甘油基的至少一种化合物的混合物,至少一种每分子具有至少一个末端不饱和基团的化合物,至少一种每分子具有至少一个乙烯基醚基团的化合物或其混合物; 和固化剂或活化剂; 和任选的非反应性聚合物材料或蜡材料,其中所述建模材料含有约10重量%至70重量%的快速凝固诱导链段含量。 本发明还涉及使用所述建模材料制造三维制品的方法。

    METHOD FOR PRODUCING PARTICLE-SHAPED POLYMERS
    96.
    发明申请
    METHOD FOR PRODUCING PARTICLE-SHAPED POLYMERS 审中-公开
    用于生产粒状聚合物

    公开(公告)号:WO99037690A1

    公开(公告)日:1999-07-29

    申请号:PCT/EP1999/000393

    申请日:1999-01-21

    CPC classification number: C08F20/12 C08F2/22 C08F265/06 C08F2/18

    Abstract: The invention relates to the production of particle-shaped rubber-elastic polymers by carrying out the following steps: (1) dispersion of a11: between 85 and 100 weight percent ethylenically unsaturated monomers, the homopolymers of which are rubber-elastic, as component A11, and a12: between 0 and 15 weight percent cross-linking monomers as component A12, in water in the presence of a protective colloid and an emulsifier to obtain a dispersion with a mean particle diameter of between 0.08 and 8 mu m; (2) polymerisation of the droplets with a radical polymerisation initiator; and possibly (3) graft polymerisation of the mixture obtained in step (2) in the presence of ethylenically unsaturated monomers.

    Abstract translation: 从85到100重量,其均聚物是橡胶弹性的烯属不饱和单体的%,作为组分A11,A12:弹性体的粒状聚合物的制备是通过(1)分散所有进行从0至15重量%的交联单体作为组分A12, 在使用保护性胶体和乳化剂,以形成具有0.08〜8微米的平均粒径的分散体,(2)液滴的聚合与自由基聚合引发剂和,任选地,(3)的混合物的步骤而获得的接枝聚合水(2)在 存在烯属不饱和单体。

    METHOD FOR IMPROVED STABILITY OF AQUEOUS POLYMER DISPERSIONS
    97.
    发明申请
    METHOD FOR IMPROVED STABILITY OF AQUEOUS POLYMER DISPERSIONS 审中-公开
    一种提高水性聚合物的稳定性

    公开(公告)号:WO99036444A1

    公开(公告)日:1999-07-22

    申请号:PCT/EP1999/000212

    申请日:1999-01-15

    CPC classification number: C08K5/42 C08J3/03

    Abstract: The invention relates to a method for improved stability of aqueous polymer dispersions in the face of thermal and/or mechanical influences. Said method is characterized in that at least a bis-C4-C18-alkyl ester salt of a sulfonated dicarboxylic acid with 4 to 8 C atoms is added to the aqueous polymer dispersion.

    Abstract translation: 本发明涉及一种用于改善聚合物水分散体,以热和/或机械作用的稳定性,这是其特征在于通过向聚合物水分散体的至少一种盐双-C 4 -C 18烷基酯具有4至8个C的磺化二羧酸的 是-atoms。

    THERMOPLASTIC MOULDING MATERIALS WITH REDUCED TENDENCY TO YELLOWING
    98.
    发明申请
    THERMOPLASTIC MOULDING MATERIALS WITH REDUCED TENDENCY TO YELLOWING 审中-公开
    具有低VERGELBUNGSNEIGUNG热塑性模塑材料

    公开(公告)号:WO98039383A1

    公开(公告)日:1998-09-11

    申请号:PCT/EP1998/000928

    申请日:1998-02-18

    CPC classification number: C08K5/06 C08F283/12 C08K5/54 C08L33/20

    Abstract: Thermoplastic moulding materials with reduced tendency to yellowing are obtained by (i) polymerising a monomer mixture A which contains (in relation to A): (a1) 1 to 100 % by weight acrylonitrile and (a2) 0 to 99 % by weight of one or several monomers which can be copolymerised with acrylonitrile, in the presence of 0.01 to 5 % by weight (in relation to the monomer mixture A), of an additive B which contains: (b1) at least one compound containing at least one silicon-hydrogen bond ("silyl hydrides"); (b2) orthocarbonates, orthocarboxylic acid esters or orthosilicates ("ortho compounds"), or mixtures of said ortho compounds; or (b3) mixtures of silyl hydrides (b1) and ortho compounds (b2); or by (ii) adding 0.01 to 5 % by weight (in relation to the monomer mixture A) of additive B when subsequently processing the polymers which correspond to the monomer mixture A.

    Abstract translation: 低的倾向,一种热塑性模塑组合物黄变,由单体混合物A的聚合),其包括,基于A)a1)的1〜100重量的丙烯腈%,并且获得I)A2)0〜99重量%的一种或多种可共聚的与丙烯腈的 单体在0.01存在至5重量%,基于单体混合物a)中,添加剂B),其包含b1)的至少一种含有化合物的至少一个硅 - 氢键(“silylhydrides”),或b2)中 原碳酸酯,邻羧酸酯,或原硅酸盐(“邻位化合物”),或邻位的化合物的混合物,或b3)中的silylhydrides b1的混合物)和邻位的化合物B2),或ii)通过将0.01至5重量%,基于所述 单体混合物A)中,在单体混合物A的进一步处理相应聚合物添加剂B))的。

    HIGH-GLOSS LATEX PAINTS AND POLYMERIC COMPOSITIONS FOR USE THEREIN
    99.
    发明申请
    HIGH-GLOSS LATEX PAINTS AND POLYMERIC COMPOSITIONS FOR USE THEREIN 审中-公开
    高光乳胶漆及其使用的聚合物组合物

    公开(公告)号:WO1990015102A2

    公开(公告)日:1990-12-13

    申请号:PCT/US1990003246

    申请日:1990-06-07

    CPC classification number: C09D125/14 C09D5/02 C09D133/06 C09D157/00

    Abstract: A polymeric composition comprising a polymer and less than about 1 weight percent surfactant is useful for producing a high-gloss latex paint. The polymer comprises about 25 to about 60 weight percent of a soft monomer whose homopolymer has a Tg of less than about -20°C and about 40 to about 75 weight percent of a hard monomer whose homopolymer has a Tg of greater than about 30°C, and has a calculated Tg of about 15° to about 35°C, an actual Tg of about 10° to about 60°C, and a particle size of less than about 250nm.

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