FUSED SILICA HAVING LOW OH, OD LEVELS AND METHOD OF MAKING
    11.
    发明申请
    FUSED SILICA HAVING LOW OH, OD LEVELS AND METHOD OF MAKING 审中-公开
    具有低OH,熔点和制备方法的熔融二氧化硅

    公开(公告)号:WO2009017613A1

    公开(公告)日:2009-02-05

    申请号:PCT/US2008/008836

    申请日:2008-07-18

    Abstract: A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.

    Abstract translation: 具有小于10ppm(ppm)的羟基(OH)和氘氧化(OD)浓度的组合浓度的熔融二氧化硅制品,在一个实施方案中小于1ppm。 熔融二氧化硅制品通过在包含一氧化碳的无卤素气氛中干燥烟炱坯料而形成。 干燥的烟炱坯料可以任选地被掺杂以达到OH和OD浓度的目标水平并且改善熔融二氧化硅制品内的均匀性。 然后将干燥的烟灰坯料氧化并烧结以形成制品。 还描述了将OH和OD的组合浓度降低至小于10ppm的方法。

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