公开(公告)号：WO2020074238A1

公开(公告)日：2020-04-16

申请号：PCT/EP2019/075313

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  WANG, Yixiang ,  KANG, Zhiwen

IPC: G03F7/20

Abstract: An illumination unit comprising a first electromagnetic wave source including circuitry for outputting a first electromagnetic wave in a first direction to illuminate a first region of a sample; a second electromagnetic wave source including circuitry for outputting a second electromagnetic wave in a second direction substantially opposite to the first direction; and a reflector configured to reflect the second electromagnetic wave substantially in the first direction to illuminate a second region of the sample.

公开(公告)号：WO2022023304A1

公开(公告)日：2022-02-03

申请号：PCT/EP2021/070930

申请日：2021-07-27

Applicant: ASML NETHERLANDS B.V.

Inventor： GAURY, Benoit, Herve ,  LA FONTAINE, Bruno ,  JIANG, Jun ,  HASAN, Shakeeb Bin ,  KANAI, Kenichi ,  VAN RENS, Jasper, Frans, Mathijs ,  TABERY, Cyrus, Emil ,  MA, Long ,  PATTERSON, Oliver, Desmond ,  ZHANG, Jian ,  JEN, Chih-Yu ,  WANG, Yixiang

IPC: H01J37/22 ,  H01J37/244

Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged- particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.

公开(公告)号：WO2021083773A1

公开(公告)日：2021-05-06

申请号：PCT/EP2020/079674

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： CHEN, Tianming ,  KUAN, Chiyan ,  WANG, Yixiang ,  WANG, Zhi Po

IPC: H01J37/20 ,  H01J37/02

Abstract: A system for grounding a mask (50) using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong (52) configured to contact a conductive layer (56) of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：WO2021078819A1

公开(公告)日：2021-04-29

申请号：PCT/EP2020/079672

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZHANG, Jian ,  YE, Ning ,  WANG, Yixiang ,  FANG, Jie

IPC: H01J37/22 ,  H01J37/28 ,  G01N23/2251

Abstract: An apparatus for and a method of inspecting a substrate in which a charged particle beam is arranged to impinge on a portion of the substrate and a first light beam having a first wavelength and a second light beam having a second wavelength different from the first wavelength are also arranged to impinge on the portion of the substrate.

公开(公告)号：WO2021037695A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/073443

申请日：2020-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： YANG, Jinmei ,  ZHANG, Jian ,  KANG, Zhiwen ,  WANG, Yixiang

IPC: G01C9/00 ,  G01N23/2251 ,  G03F9/00 ,  H01L21/66 ,  H01L21/68 ,  G01B11/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.

公开(公告)号：WO2020212170A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/059558

申请日：2020-04-03

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yixiang ,  WANG, Yanqiu ,  HE, Xiaodong ,  YE, Guofan

IPC: H01J37/141 ,  H01J37/24

Abstract: Disclosed among other aspects is a power supply such as may be used in a charged particle inspection system. The power supply includes a direct current source such as a programmable linear current source connected to a controlled voltage source where the control signal for the controlled voltage source is derived from a measured voltage drop across the direct current source.

公开(公告)号：WO2019048293A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/073161

申请日：2018-08-28

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： TSENG, Kuo-Feng ,  DONG, Zhonghua ,  WANG, Yixiang ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：WO2019025188A1

公开(公告)日：2019-02-07

申请号：PCT/EP2018/069524

申请日：2018-07-18

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： ZHANG, Frank, Nan ,  CHEN, Zhongwei ,  WANG, Yixiang ,  SHEN, Ying, Crystal

IPC: H01J37/26 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.