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1.发明申请
公开(公告)号：WO2021121871A1
公开(公告)日：2021-06-24
申请号：PCT/EP2020/082933
申请日：2020-11-20
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , GAURY, Benoit, Herve
IPC: G03F7/20 , G03F7/70633 , G03F7/70658
Abstract: Optically determining whether metallic features in different layers in a structure are in electrical contact with each other is described. When the metallic features comprise different metals and/or have different dimensions, which cause one or more resonances in reflected radiation to be detected, the metallic features in the different layers are determined to be in contact or out of contact with each other based on the spectral positions of the one or more resonances. When the metallic features are formed from the same metal and have the same dimensions, the metallic features in the different layers are determined to be in contact with each other responsive to detection of a single resonance associated with the metallic features and out of contact with each other responsive to detection of two or more resonances associated with the metallic features.
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Patent Agency Ranking
公开(公告)号：WO2022194448A1
公开(公告)日：2022-09-22
申请号：PCT/EP2022/052816
申请日：2022-02-07
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , GOOSEN, Maikel, Robert
Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.
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公开(公告)号：WO2020164951A1
公开(公告)日：2020-08-20
申请号：PCT/EP2020/052662
申请日：2020-02-04
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , REN, Yan , GOOSEN, Maikel, Robert , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul
Abstract: Disclosed among other aspects is a charged particle inspection system including an absorbing component and a programmable charged-particle mirror plate arranged to modify the energy distribution of electrons in a beam and shape the beam to reduce the energy spread of the electrons and aberrations of the beam, with the absorbing component including a structure defining a cavity, the cavity having an interior surface, and a metamaterial aborber provided on the interior surface. In operation, the cavity extends along a part of the beam path. In further embodiments, the metamaterial includes a set of absorbing structures configured as absorbing structures provided on a transparent conductive layer. Further, a method using such an absorbing component and with the programmable charged-particle mirror plate including a set of pixels configured to generate a customized electric field to shape the beam and using such a programmable charged-particle mirror plate is disclosed.
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4.发明申请
公开(公告)号：WO2022028778A1
公开(公告)日：2022-02-10
申请号：PCT/EP2021/067854
申请日：2021-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , KUMAR, Nitish
IPC: G03F7/20 , G01N21/55 , G01N21/956
Abstract: The present disclosure relates to a method for determining deviations in a fabrication process, comprising the following steps: a. providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range; b. illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range; c. detecting light reflected and/or scattered from the layer of the sample; and d. determining deviations in the fabrication process from the detected light.
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5.发明申请
公开(公告)号：WO2022023304A1
公开(公告)日：2022-02-03
申请号：PCT/EP2021/070930
申请日：2021-07-27
Applicant: ASML NETHERLANDS B.V.
Inventor： GAURY, Benoit, Herve , LA FONTAINE, Bruno , JIANG, Jun , HASAN, Shakeeb Bin , KANAI, Kenichi , VAN RENS, Jasper, Frans, Mathijs , TABERY, Cyrus, Emil , MA, Long , PATTERSON, Oliver, Desmond , ZHANG, Jian , JEN, Chih-Yu , WANG, Yixiang
IPC: H01J37/22 , H01J37/244
Abstract: Systems and methods of observing a sample using a charged-particle beam apparatus in voltage contrast mode are disclosed. The charged-particle beam apparatus comprises a charged- particle source, an optical source, a charged-particle detector configured to detect charged particles, and a controller having circuitry configured to apply a first signal to cause the optical source to generate the optical pulse, apply a second signal to the charged-particle detector to detect the second plurality of charged particles, and adjust a time delay between the first and the second signals. In some embodiments, the controller having circuitry may be further configured to acquire a plurality of images of a structure, to determine an electrical characteristic of the structure based on the rate of gray level variation of the plurality of images of the structure, and to simulate, using a model, a physical characteristic of the structure based on the determined electrical characteristic.
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公开(公告)号：WO2021032652A1
公开(公告)日：2021-02-25
申请号：PCT/EP2020/072941
申请日：2020-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： HUISMAN, Thomas, Jarik , HASAN, Shakeeb Bin
Abstract: Systems and methods for image enhancement are disclosed. A method for enhancing an image may include acquiring a scanning electron microscopy (SEM) image. The method may also include simulating diffused charge associated with a position of the SEM image. The method may further include providing an enhanced SEM image based on the SEM image and the diffused charge.
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