公开(公告)号：WO2022122320A1

公开(公告)日：2022-06-16

申请号：PCT/EP2021/081924

申请日：2021-11-17

Applicant: ASML NETHERLANDS B.V. [NL]/[NL]

Inventor： REN, Weiming ,  LIU, Xuedong ,  HOQUE, Shahedul ,  JI, Xiaoyu ,  DILLEN, Hermanus, Adrianus

IPC: H01J37/147 ,  H01J37/28

Abstract: A charged particle apparatus comprising a charged particle source (401) and a first deflector (421) configured to deflect the charged- particle beam to land on a surface of a sample at a beam-tilt angle, wherein the first deflector is located substantially at a principal plane of an objective lens (411). In further embodiments, the apparatus may comprise a first deflector located between the charged-particle source and an objective lens and configured to deflect the charged- particle beam away from the primary optical axis; a second deflector located substantially at a focal plane of the objective lens and configured to deflect the charged-particle beam back towards the primary optical axis; and a third deflector located substantially at a principal plane of the objective lens, wherein the third deflector is configured to shift a wobbling center of the objective lens to an off-axis wobbling location, and wherein the first and the second deflectors are configured to deflect the charged-particle beam to pass through the off-axis wobbling location to land on a surface of a sample at a first landing location and having a beam-tilt angle.

公开(公告)号：WO2022063540A1

公开(公告)日：2022-03-31

申请号：PCT/EP2021/074216

申请日：2021-09-02

Applicant: ASML NETHERLANDS B.V.

Inventor： KRUPIN, Oleg ,  REN, Weiming ,  HU, Xuerang ,  LIU, Xuedong

IPC: H01J37/147 ,  H01J37/21 ,  H01J37/244

Abstract: A method of operating a secondary imaging system of a charged particle beam apparatus may include using an anti-scanning mode. Excitation of a component of the secondary imaging system may be adjusted synchronously with a primary scanning deflection unit. Together with an anti- scanning deflection unit performing anti-scanning, a component of the secondary imaging system, such as a lens, may be adjusted in step. As scanning and anti-scanning is performed, excitation parameters of the component may also be constantly updated.

公开(公告)号：WO2021185938A1

公开(公告)日：2021-09-23

申请号：PCT/EP2021/056889

申请日：2021-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Yongxin ,  DONG, Zhonghua ,  JI, Xiaoyu ,  HOQUE, Shahedul ,  REN, Weiming ,  LIU, Xuedong ,  YE, Guofan ,  CHIEN, Kuo-Chin

IPC: H01J37/147 ,  H01J37/28

Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.

公开(公告)号：WO2021180745A1

公开(公告)日：2021-09-16

申请号：PCT/EP2021/055956

申请日：2021-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  WANG, Yongxin

IPC: H01J37/04 ,  H01J37/244

Abstract: Systems and methods of observing a sample using an electron beam apparatus are disclosed. The electron beam apparatus comprises an electron source configured to generate a primary electron beam along a primary optical axis (404), and a first electron detector (420) having a first detection layer (421) substantially parallel to the primary optical axis and configured to detect a first portion of a plurality of signal electrons (412) generated from a probe spot on a sample. The method may comprise generating a plurality of signal electrons and detecting the signal electrons using the first electron detector substantially parallel to the primary optical axis of the primary electron beam. A second detection layer of a second electron detector (407) may be substantially perpendicular to the primary optical axis. An electrostatic element or a magnetic element may be configured to detect backscattered electrons by disposing the first electron detector on an inner surface of the electrostatic or magnetic element.

公开(公告)号：WO2021122863A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/086595

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  GONG, Zizhou ,  HU, Xuerang ,  LIU, Xuedong ,  CHEN, Zhong-wei

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/153 ,  H01J37/244 ,  H01J37/29 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/049 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/1532 ,  H01J2237/20207 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J37/1474 ,  H01J37/20 ,  H01J37/292 ,  H01J37/3177

Abstract: Systems and methods of forming images of a sample using a multi-beam apparatus are disclosed. The method may include generating a plurality of secondary electron beams from a plurality of probe spots on the sample upon interaction with a plurality of primary electron beams. The method may further include adjusting an orientation of the plurality of primary electron beams interacting with the sample, directing the plurality of secondary electron beams away from the plurality of primary electron beams, compensating astigmatism aberrations of the plurality of directed secondary electron beams, focusing the plurality of directed secondary electron beams onto a focus plane, detecting the plurality of focused secondary electron beams by a charged-particle detector, and positioning a detection plane of the charged-particle detector at or close to the focus plane.

公开(公告)号：WO2020030483A1

公开(公告)日：2020-02-13

申请号：PCT/EP2019/070566

申请日：2019-07-31

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/28 ,  H01J37/04 ,  H01J37/153 ,  H01J37/05

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：WO2019068666A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/076707

申请日：2018-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LIU, Xuedong ,  REN, Weiming ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：WO2019063561A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075996

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xuedong ,  XI, Qingpo ,  JIANG, Youfei ,  REN, Weiming ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/02 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

公开(公告)号：WO2018197169A1

公开(公告)日：2018-11-01

申请号：PCT/EP2018/058631

申请日：2018-04-04

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： HU, Xuerang ,  REN, Weiming ,  LIU, Xuedong ,  CHEN, Zhongwei

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/12

Abstract: Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.

公开(公告)号：WO2018145983A1

公开(公告)日：2018-08-16

申请号：PCT/EP2018/052480

申请日：2018-02-01

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： WANG, Yongxin ,  REN, Weiming ,  DONG, Zhonghua ,  CHEN, Zhongwei

IPC: H01J37/244 ,  H01J37/28

Abstract: Systems and methods are provided for charged particle detection. The detection system comprises a signal processing circuit (502) configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements (244). The detection system further comprises a beam spot processing module (506) configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.