公开(公告)号：WO2020099095A1

公开(公告)日：2020-05-22

申请号：PCT/EP2019/079076

申请日：2019-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/145 ,  H01J37/28 ,  H01J37/143

Abstract: An electromagnetic compound lens may be configured to focus a charged particle beam. The compound lens may include an electrostatic lens provided on a secondary optical axis and a magnetic lens also provided on the secondary optical axis. The magnetic lens may include a permanent magnet. A charged particle optical system may include a beam separator configured to separate a plurality of beamlets of a primary charged particle beam generated by a source along a primary optical axis from secondary beams of secondary charged particles. The system may include a secondary imaging system configured to focus the secondary beams onto a detector along the secondary optical axis. The secondary imaging system may include the compound lens.

公开(公告)号：WO2019211072A1

公开(公告)日：2019-11-07

申请号：PCT/EP2019/059206

申请日：2019-04-11

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LIU, Xuedong ,  CHEN, Zhongwei ,  REN, Weiming

IPC: H01J37/317

Abstract: An improved source conversion unit of a charged particle beam apparatus is disclosed. The source conversion unit comprises a first micro-structure array including a plurality of micro- structures. The plurality of micro-structures is grouped into one or more groups. Corresponding electrodes of micro-structures in one group are electrically connected and driven by a driver to influence a corresponding group of beamlets. The micro-structures in one group may be single-pole structures or multi-pole structures. The micro-structures in one group have same or substantially same radial shifts from an optical axis of the apparatus. The micro-structures in one group have same or substantially same orientation angles with respect to their radial shift directions.

公开(公告)号：WO2019063794A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/076477

申请日：2018-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： WANG, Joe ,  WANG, Yongxin ,  CHEN, Zhongwei ,  HU, Xuerang

IPC: H01J37/244 ,  H01L27/146

Abstract: A multi-cell detector includes a first layer (420) having a region (422) of a first conductivity type and a second layer (440) including a plurality of regions (444) of a second conductivity type. The second layer may also include one or more regions (442) of the first conductivity type. The plurality of regions of the second conductivity type is partitioned from one another, perferably by the one or more regions (444) of the first conductivity type of the second layer. The plurality of regions (444) of the second conductivity type may be spaced apart from one or more regions (442) of the first conductivity type in the second layer. The detector further includes an intrinsic layer (430,432) between the first and second layers.

公开(公告)号：WO2019057644A1

公开(公告)日：2019-03-28

申请号：PCT/EP2018/074985

申请日：2018-09-14

Applicant: ASML NETHERLANDS B.V.

Inventor： MAASSEN, Martinus, Gerardus, Maria, Johannes ,  HEMPENIUS, Peter, Paul ,  REN, Weiming ,  CHEN, Zhongwei

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/28

Abstract: A charged particle beam apparatus includes a beamlet forming unit configured to form and scan an array of beamlets (410) on a sample (440). A first portion of the array of beamlets is focused onto a focus plane (430), and a second portion of the array of beamlets has at least one beamlet with a defocusing level (490) with respect to the focus plane. The charged particle beam apparatus also includes a detector configured to detect an image of the sample formed by the array of beamlets, and a processor configured to estimate a level of separation between the focus plane and the sample based on the detected image and then reduce the level of separation based on the estimated level.

公开(公告)号：WO2019020396A1

公开(公告)日：2019-01-31

申请号：PCT/EP2018/068980

申请日：2018-07-12

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  LUO, Xinan ,  CHEN, Zhongwei

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J37/244

Abstract: Systems and methods are provided for compensating dispersion of a beam separator in a single-beam or multi-beam apparatus. Embodiments of the present disclosure provide a dispersion device comprising an electrostatic deflector and a magnetic deflector configured to induce a beam dispersion set to cancel the dispersion generated by the beam separator. The combination of the electrostatic deflector and the magnetic deflector can be used to keep the deflection angle due to the dispersion device unchanged when the induced beam dispersion is changed to compensate for a change in the dispersion generated by the beam separator. In some embodiments, the deflection angle due to the dispersion device can be controlled to be zero and there is no change in primary beam axis due to the dispersion device.

公开(公告)号：WO2018029018A1

公开(公告)日：2018-02-15

申请号：PCT/EP2017/069270

申请日：2017-07-31

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： DOU, Juying ,  FAN, Zheng ,  KUO, Tzu-Yi ,  CHEN, Zhongwei

IPC: H01J9/02 ,  H01J1/14 ,  H01J1/304 ,  H01J37/06 ,  H01J37/065 ,  H01J37/073

Abstract: Electron emitters and methods of fabricating the electron emitters are disclosed. According to certain embodiments, an electron emitter includes a tip with a planar region having a diameter in a range of approximately (0.05-10) micrometers. The electron emitter tip is configured to release field emission electrons. The electron emitter further includes a work-function-lowering material coated on the tip.

Abstract translation: 公开了电子发射体和制造电子发射体的方法。 根据某些实施例，电子发射器包括具有直径在大约（0.05-10）微米范围内的平面区域的尖端。 电子发射器尖端被配置为释放场致发射电子。 电子发射器还包括涂覆在尖端上的功函降低材料。

公开(公告)号：WO2018122176A1

公开(公告)日：2018-07-05

申请号：PCT/EP2017/084429

申请日：2017-12-22

Applicant: ASML NETHERLANDS B.V. ,  HERMES MICROVISION, INC.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/141 ,  H01J37/145 ,  H01J37/317

Abstract: The present disclosure proposes an anti-rotation lens and using it as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. The anti-rotation condenser lens keeps rotation angles of beamlets unchanged when changing currents thereof, and thereby enabling the pre-beamlet-forming mechanism to cut off electrons not in use as much as possible. In this way, the multi-beam apparatus can observe a sample with high resolution and high throughput, and is competent as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry.

公开(公告)号：WO2020030483A1

公开(公告)日：2020-02-13

申请号：PCT/EP2019/070566

申请日：2019-07-31

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  LIU, Xuedong ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/28 ,  H01J37/04 ,  H01J37/153 ,  H01J37/05

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：WO2019068666A1

公开(公告)日：2019-04-11

申请号：PCT/EP2018/076707

申请日：2018-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LIU, Xuedong ,  REN, Weiming ,  CHEN, Zhongwei

IPC: H01J37/28

Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.

公开(公告)号：WO2019063561A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075996

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xuedong ,  XI, Qingpo ,  JIANG, Youfei ,  REN, Weiming ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/02 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.