公开(公告)号：WO2020078660A1

公开(公告)日：2020-04-23

申请号：PCT/EP2019/075316

申请日：2019-09-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HU, Xuerang ,  LUO, Xinan ,  XI, Qingpo ,  LIU, Xuedong ,  REN, Weiming

IPC: H01J37/28 ,  H01J37/317

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved alignment mechanism is disclosed. An improved charged particle beam inspection apparatus may include a second electron detection device to generate one or more images of one or more beam spots of the plurality of secondary electron beams during the alignment mode. The beam spot image may be used to determine the alignment characteristics of one or more of the plurality of secondary electron beams and adjust a configuration of a secondary electron projection system.

公开(公告)号：WO2020193102A1

公开(公告)日：2020-10-01

申请号：PCT/EP2020/055959

申请日：2020-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： XI, Qingpo ,  HU, Xuerang ,  LIU, Xuedong ,  REN, Weiming ,  CHEN, Zhong-wei

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28

Abstract: A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.

公开(公告)号：WO2020239505A1

公开(公告)日：2020-12-03

申请号：PCT/EP2020/063831

申请日：2020-05-18

Applicant: ASML NETHERLANDS B.V.

Inventor： REN, Weiming ,  HU, Xuerang ,  XI, Qingpo ,  LIU, Xuedong

IPC: H01J37/09 ,  H01J37/244 ,  H01J37/28

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged- particle detector in a multi-beam apparatus are disclosed. The multibeam apparatus comprises an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector (140). The electro-optical system includes a first pre-limit aperture plate (155P) comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array (155) comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements (140_1, 140_2, 140_3), wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.

公开(公告)号：WO2022207254A1

公开(公告)日：2022-10-06

申请号：PCT/EP2022/055900

申请日：2022-03-08

Applicant: ASML NETHERLANDS B.V.

Inventor： GU, Shichen ,  REN, Weiming ,  XI, Qingpo

IPC: H01J37/09 ,  H01J37/26 ,  H01J37/28

Abstract: Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged-particle detector in a multi-beam apparatus are disclosed. The multi-beam apparatus may comprise an electro-optical system comprising a beam-limit aperture plate having a surface substantially perpendicular to an optical axis, the beam-limit aperture plate comprising a first aperture at a first distance relative to the surface of the beam-limit aperture plate, and a second aperture at a second distance relative to the surface of the beam-limit aperture plate, the second distance being different from the first distance. The first aperture may be a part of a first set of apertures of the beam-limit aperture plate at the first distance, and the second aperture may be a part of a second set of apertures of the beam-limit aperture plate at the second distance.

公开(公告)号：WO2023083574A1

公开(公告)日：2023-05-19

申请号：PCT/EP2022/079038

申请日：2022-10-19

Applicant: ASML NETHERLANDS B.V.

Inventor： GU, Shichen ,  XI, Qingpo ,  DOU, Juying

IPC: F16K51/02 ,  F16K3/18 ,  H01J37/00 ,  H01J37/28

Abstract: Systems with valves that increase cycle life and reduce particle generation. Embodiments may include a first movable member (413), a second movable member (411), and a third movable member (415); a first link (412_1, 412_2) coupled to the first movable member and the second movable member such that when the second movable member is moved laterally and the third movable member is stopped, the first link exerts a force on the first movable member that causes the first movable member to move towards a surface (409) and press against the surface to form a vacuum seal; and a second link ( 412_3) coupled to the first movable member and the third movable member such that when the first link causes the first movable member to move, the second link exerts a force on the first movable member that limits movement of the first movable member such that the first movable member moves towards the surface with limited offset.

公开(公告)号：WO2022048898A1

公开(公告)日：2022-03-10

申请号：PCT/EP2021/072716

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： WALVOORT, Derk, Ferdinand ,  MUDRETSOV, Dmitry ,  HU, Xuerang ,  XI, Qingpo ,  VAN SOEST, Jurgen ,  WIELAND, Marco, Jan-Jaco

IPC: H01J37/09 ,  H01J37/16 ,  H01J37/28 ,  H01J37/317

Abstract: Disclosed herein is an electron-optical assembly for an electron-optical column for projecting a charged particle beam along a beam path towards a target, the electron-optical assembly comprising: electromagnetic shielding surrounding the charged particle beam path and configured to shield the charged particle beam from an electromagnetic field external to the electromagnetic shielding; wherein the electromagnetic shielding comprises a plurality of sections extending along different positions along the beam path, each section surrounding the charged particle beam, wherein the sections are separable.

公开(公告)号：WO2021249872A1

公开(公告)日：2021-12-16

申请号：PCT/EP2021/064949

申请日：2021-06-03

Applicant: ASML NETHERLANDS B.V.

Inventor： OTTEN, Christiaan ,  CRANS, Peter-Paul ,  SMITS, Marc ,  DEL TIN, Laura ,  TEUNISSEN, Christan ,  HUANG, Yang-Shan ,  STEENBRINK, Stijn, Wilem, Herman, Karel ,  HU, Xuerang ,  XI, Qingpo ,  LUO, Xinan ,  LIU, Xuedong

IPC: H01J37/02 ,  H01J37/18 ,  H01J2237/184 ,  H01J2237/2006 ,  H01J2237/20214 ,  H01J2237/2817 ,  H01J37/023 ,  H01J37/14 ,  H01J37/1477 ,  H01J37/15 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: 2019P00380WO 68 ABSTRACT Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the 5 support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus. [FIG. 7]

公开(公告)号：WO2019063561A1

公开(公告)日：2019-04-04

申请号：PCT/EP2018/075996

申请日：2018-09-25

Applicant: ASML NETHERLANDS B.V.

Inventor： LIU, Xuedong ,  XI, Qingpo ,  JIANG, Youfei ,  REN, Weiming ,  HU, Xuerang ,  CHEN, Zhongwei

IPC: H01J37/02 ,  H01J37/04 ,  H01J37/28

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.