公开(公告)号：WO2012098550A1

公开(公告)日：2012-07-26

申请号：PCT/IL2012/050014

申请日：2012-01-18

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  BARAK, Gilad ,  BRILL, Boaz

Inventor： BARAK, Gilad ,  BRILL, Boaz

IPC: G01B11/06

CPC classification number: G01N21/9501 ,  G01B11/02 ,  G01B11/12 ,  G01B11/22 ,  G01B2210/56 ,  G01N21/956 ,  G01N2021/8822 ,  H01L22/12 ,  H01L2924/0002 ,  H04L25/0216 ,  H04L25/0222 ,  H04L25/0226 ,  H04L27/2607 ,  H04L27/2655 ,  H01L2924/00

Abstract: An optical system is presented for use in measuring in patterned structures having vias. The system is configured and operable to enable measurement of a via profile parameters. The system comprises an illumination channel for propagating illuminated light onto the structure being measured, a detection channel for collecting light returned from the illuminated structure to a detection unit, and a modulating assembly configured and operable for implementing a dark-field detection mode by carrying out at least one of the following: affecting at least one parameter of light propagating along at least one of the illumination and detection channels, and affecting propagation of light along at least the detection channel.

Abstract translation: 提供了一种用于在具有通孔的图案化结构中进行测量的光学系统。 该系统被配置并且可操作以允许测量通孔轮廓参数。 该系统包括用于将被照射的光传播到所测量的结构上的照明通道，用于将从照明结构返回的光聚集到检测单元的检测通道，以及调制组件，其配置和可操作以通过执行暗区检测模式 以下中的至少一个：影响沿着照明和检测通道中的至少一个传播的光的至少一个参数，并且影响光沿着至少检测通道的传播。

公开(公告)号：WO2009019690A2

公开(公告)日：2009-02-12

申请号：PCT/IL2008/001073

申请日：2008-08-05

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  BRILL, Boaz ,  GOLBER, Rafael ,  MUZIKOVSKY, Vladimir

Inventor： BRILL, Boaz ,  GOLBER, Rafael ,  MUZIKOVSKY, Vladimir

IPC: G01N21/21

CPC classification number: G01N21/956 ,  G01J3/02 ,  G01J3/0208 ,  G01J3/0218 ,  G01J3/0237 ,  G01J3/0291 ,  G01J3/447 ,  G01J3/453 ,  G01J2003/1213

Abstract: An optical measurement Method and System for spectroscopy are disclosed for evaluating the parameters of a sample. The device generally includes a broadband source for generating a light beam. Reflected light beam are simultaneously analyzed as a function of the position within the beam to provide information at multiple wavelengths and/or angular distribution. A Furier filter, comprising dispersion element and a two-dimensional photodetector array are used so that the beam may be simultaneously or consicuently analyzed at multiple angles of returned from the sample (diffracted) light at multiple wavelengths.

Abstract translation: 公开了用于评估样品参数的光学测量方法和系统。 该装置通常包括用于产生光束的宽带源。 作为光束内的位置的函数同时分析反射光束，以提供多个波长和/或角度分布的信息。 使用包括色散元件和二维光电检测器阵列的富尔滤光器，使得可以以从多个波长的样品（衍射）光返回的多个角度同时或仔细地分析光束。

公开(公告)号：WO2005119225A1

公开(公告)日：2005-12-15

申请号：PCT/IL2005/000563

申请日：2005-05-31

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  FINAROV, Moshe

Inventor： FINAROV, Moshe

IPC: G01N21/956

CPC classification number: G01N21/956 ,  G01N21/211 ,  G01N21/8806

Abstract: A system (1) and method are presented for measurement on an article (w). The system comprises an illuminator (2) for producing light of at least one predetermined wavelength range; an optical system (4); a displacement arrangement (5); and a control system (6). The optical system is configured to define at least a measurement channel, and comprises a light directing assembly for directing an input light beam, propagating along an input light path from the illuminator, onto the article and directing a light beam returned from the illuminated region of the article to at least one light detector. The displacement arrangement is associated with at least the light directing assembly of the optical system, and is configured and operable by the control system to rotate said at least light directing assembly of the optical system with respect to a stage (10) supporting the article about a rotational axis (OA) substantially normal to the stage.

Abstract translation: 提供了一种用于物品（w）上的测量的系统（1）和方法。 该系统包括用于产生至少一个预定波长范围的光的照明器（2） 光学系统（4）; 位移布置（5）; 和控制系统（6）。 光学系统被配置为至少限定测量通道，并且包括光导组件，用于将输入光束沿着从照明器的输入光路传播到物品上并引导从照明区域的光束返回的光束 该物品至少有一个光检测器。 所述位移布置与至少所述光学系统的所述光导组件相关联，并且被所述控制系统配置和操作以使所述光学系统的所述至少光导向组件相对于支撑所述制品的台架（10）旋转 基本上垂直于平台的旋转轴线（OA）。

公开(公告)号：WO2005060351A2

公开(公告)日：2005-07-07

申请号：PCT/IL2004/001159

申请日：2004-12-23

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  RING, Sven

Inventor： RING, Sven

IPC: B01D59/44 ,  G01N20060101 ,  G01N15/00 ,  G01N15/10

CPC classification number: G01N15/1031 ,  G01N2015/0046

Abstract: A method for use to identify particles in a medium comprising inputting the medium into an evacuable chamber; and irradiating the medium in the chamber by focused radiation of a predetermined power density to cause substantially total fragmentation and ionization of at least small particles in the medium. It causes creation of ionized species including multiply charged ions in case when particles exist in the medium.

Abstract translation: 一种用于识别介质中的颗粒的方法，包括将介质输入到可抽空室中; 以及通过预定功率密度的聚焦辐射来照射所述室中的介质，以引起所述介质中至少小颗粒的基本上完全碎裂和电离。 在介质中存在颗粒的情况下，会导致电离物质的产生，包括多重带电离子。

公开(公告)号：WO2003075099A3

公开(公告)日：2003-09-12

申请号：PCT/IL2003/000176

申请日：2003-03-06

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  FINAROV, Moshe ,  SCHEINER, David

Inventor： FINAROV, Moshe ,  SCHEINER, David

IPC: G03F7/20

Abstract: An optical measurement method and system are presented for imaging two target structures (T1, T2) in two parallel layers (L1, L2), respectively, of a sample (W), to enable determination of a registration between the two target structures along two mutually perpendicular axes of the layer (L1). The sample is illuminated with incident radiation to produce a radiation response of the sample. The radiation response is collected by an objective lens arrangement (14), and the collected radiation response is split into two spatially separated radiation components (B(1)res, B(2)res). The split radiation components are directed towards at least one imaging plane (24 or 26) along different optical channels characterized by optical paths of different lengths (S1, S2), respectively. The two split radiation components are detected in said at least one imaging plane, and two image parts are thereby acquired, each image part containing images of the two target structures.

公开(公告)号：WO2003075041A3

公开(公告)日：2003-09-12

申请号：PCT/IL2003/000167

申请日：2003-03-04

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  BRILL, Boaz

Inventor： BRILL, Boaz

IPC: G03B27/42

Abstract: A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities for deriving information representative of said line edge roughness parameter/s from said spectral response of the structure

公开(公告)号：WO2003075041A2

公开(公告)日：2003-09-12

申请号：PCT/IL2003/000167

申请日：2003-03-04

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  BRILL, Boaz

Inventor： BRILL, Boaz

IPC: G02B

CPC classification number: G03F7/70616 ,  G01B11/00 ,  G01N21/956

Abstract: A method and system for optical measurements of line edge roughness (LER) of patterned structures based on illuminating the structure with incident radiation and detecting a spectral response of the structure, and further applying software and/or hardware utilities for deriving information representative of said line edge roughness parameter/s from said spectral response of the structure

Abstract translation: 一种基于以入射辐射照射该结构并检测该结构的光谱响应并进一步应用软件和/或硬件来光学测量图案化结构的线边缘粗糙度（LER）的方法和系统 用于从结构的所述光谱响应中导出代表所述线边缘粗糙度参数的信息的实用程序

公开(公告)号：WO2003049150A3

公开(公告)日：2003-06-12

申请号：PCT/IL2002/000973

申请日：2002-12-04

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  MACHAVARIANI, Vladimir ,  SCHEINER, David ,  WEINGARTEN, Amit ,  RAVID, Avi

Inventor： MACHAVARIANI, Vladimir ,  SCHEINER, David ,  WEINGARTEN, Amit ,  RAVID, Avi

IPC: H01L21/00

Abstract: A method and system are presented for use in controlling a process of material removal from the surface of a patterned structure, by measuring at least one of residue, erosion, dishing and corrosion effects in the structure induced by this process. The structure is imaged utilizing phase modulation of light reflected from the structure, and a phase map of the structure is thereby obtained. This phase map is analyzed and data indicative of light reflective properties of layer stacks of the structure is utilized to determine a phase difference between light reflected from a selected measured site and at least one reference site spaced-apart from the selected site. The phase difference is thus indicative of the measured effect.

公开(公告)号：WO2003040771A3

公开(公告)日：2003-05-15

申请号：PCT/IL2002/000898

申请日：2002-11-10

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  FINAROV, Moshe

Inventor： FINAROV, Moshe

IPC: G02B06/00

Abstract: An optical system is presented for use in a measurement system (100) for use in measurements of thin films of a workpiece (W), the system comprising an optical assembly (14), comprising illuminator assembly, a detector assembly, and a light directing assembly (FA-OF) for directing illuminating light to a plurality of measurement sites in the workpiece (W) arranged in an array of substantially concentric ring-like regions, such that an area defined by the measurement sites within one of the substantially concentric ring-like regions is substantially equal to that of the other substantially concentric ring-like region.

公开(公告)号：WO2003014658A2

公开(公告)日：2003-02-20

申请号：PCT/IL2002/000656

申请日：2002-08-08

Applicant: NOVA MEASURING INSTRUMENTS LTD. ,  FINAROV, Moshe

Inventor： FINAROV, Moshe

IPC: G01B11/00

CPC classification number: G01B11/00 ,  G01B11/0616

Abstract: An optical system is presented for use in a measurement system (OS) for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises (OS) an illuminator unit (10) producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector (26) and a spectrophotometer detector (30), and a light directing assembly (31). The light directing assembly (31) defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path.

Abstract translation: 提出了一种用于在图案化结构中测量的测量系统（OS）中使用的光学系统，这对控制在生产线上进行的结构的处理特别有用。 该系统包括：产生照明光的照明器单元（10），所述照明器单元产生照射光以被引导到所述结构以产生返回的光;检测器单元，其包括成像检测器（26）和分光光度计检测器（30）;以及导光组件 31）。 导光组件（31）限定用于光传播的第一和第二光路径。 容纳在第一光路中的光学元件影响光，以提供结构平面的相对较小的测量区域。 与第一光路相比，第二光路位于第一光路外部，通过第二光路的光传播提供相对较大的测量区域。