AN APPARATUS AND METHOD FOR MANUFACTURING A MOTHERBOARD COMPRISING ONE OR MORE ELECTROCHROMIC DEVICES

    公开(公告)号:WO2022140747A1

    公开(公告)日:2022-06-30

    申请号:PCT/US2021/072993

    申请日:2021-12-17

    Abstract: An apparatus and method of manufacturing a motherboard is disclosed. The motherboard can include one or more electrochromic devices. The apparatus can include a central processing unit that executes instructions. The instructions and method can include mapping the motherboard, analyzing one or more electrochromic devices within a batch to determine a yield of each of the one or more electrochromic devices, prioritizing the one or more electrochromic devices based on the yield, and placing a first electrochromic device on the motherboard, where the first electrochromic device has the highest priority of the one or more electrochromic devices within the batch.

    SOLENOID LOW FRICTION BEARING LINER
    3.
    发明申请

    公开(公告)号:WO2022126107A1

    公开(公告)日:2022-06-16

    申请号:PCT/US2021/072793

    申请日:2021-12-08

    Abstract: The present disclosure relates to a low friction bearing liner for a solenoid may include a low friction layer. The low friction layer may include a first fluoropolymer matrix component and a first thermoplastic filler component distributed throughout the first fluoropolymer matrix component. The content of the first fluoropolymer matrix component may be at least about 1 wt.% and not greater than about 99 wt.% for a total weight of the first low friction layer. The content of the first thermoplastic filler component may be at least about 1 wt.% and not greater than about 99 wt.% for a total weight of the first low friction layer.

    ENHANCED CONTROL OF AN IGU WITH GRADED TINTING

    公开(公告)号:WO2021119111A1

    公开(公告)日:2021-06-17

    申请号:PCT/US2020/063984

    申请日:2020-12-09

    Abstract: A method for controlling multiple electrochromic devices (ECDs) that have a variable tint profile. The method can include applying an initial test voltage profile to four or more bus bars of a first ECD, producing a first test tint profile in the first ECD in response to the initial test voltage profile, adjusting the initial test voltage profile to produce a first desired tint profile (DTP) in the first ECD, determining first modeling parameters based on the adjustments of the initial test voltage profile, modeling the first ECD based on the first modeling parameters, determining first compensation parameters via the first ECD model determining a first compensated voltage profile (CVP) by modifying the initial test voltage profile based on the first compensation parameters, and producing the first DTP in the first ECD in response to applying the first CVP to the first ECD.

    APPARATUS TO MAINTAIN A CONTINUOUSLY GRADED TRANSMISSION STATE

    公开(公告)号:WO2020142204A1

    公开(公告)日:2020-07-09

    申请号:PCT/US2019/066856

    申请日:2019-12-17

    Abstract: An apparatus including a substrate with at least three sides and an active stack on the substrate. The active stack can include a first transparent conductive layer, a second transparent conductive layer, an anodic electrochemical layer, and a cathodic electrochemical layer. The apparatus can also include a first bus bar set comprising a plurality of bus bars, wherein each bus bar of the first bus bar set is electrically coupled to the first transparent conductive layer, a second bus bar set comprising a plurality of bus bars, wherein each bus bar of the second bus bar set is electrically coupled to the second transparent conductive layer, and a bus bar arrangement wherein the bus bar arrangement comprises a bus bar from the first bus bar set and a bus bar from the second bus bar set on at least three sides of the substrate.

    ADHESIVE COMPOSITION AND METHODS OF FORMING THE SAME

    公开(公告)号:WO2020139672A1

    公开(公告)日:2020-07-02

    申请号:PCT/US2019/067329

    申请日:2019-12-19

    Abstract: An adhesive composition may include at least about 2 wt.% and not greater than 49 wt.% of a (meth)acrylic based polymeric component A for a total weight of the adhesive composition, at least about 51 wt.% of a (meth)acrylic based polymeric component B for a total weight of the adhesive composition; and at least about 0.1 wt.% and not greater than about 30 wt.% of a tackifier component for a total weight of the adhesive composition. The (meth)acrylic based polymeric component A may be acidic and may have a glass transition temperature (Tg) of at least about 40 C. The (meth)acrylic based polymeric component B may be basic and may have a glass transition temperature (Tg) of not greater than about 20 C.

    WIDEBAND RADOME DESIGN
    9.
    发明申请

    公开(公告)号:WO2020139569A1

    公开(公告)日:2020-07-02

    申请号:PCT/US2019/065947

    申请日:2019-12-12

    Abstract: A radome structure may include an inner tuning layer component and a laminate component overlying the inner tuning layer component. The inner tuning layer component may include a thermoset foam or a thermoplastic foam. The laminate component may include a first fiber reinforced dielectric layer, a second fiber reinforced dielectric layer overlying the first fiber reinforced dielectric layer, and a third fiber reinforced dielectric layer overlying the second fiber reinforced dielectric layer. The first fiber reinforced dielectric layer may include a first low dielectric constant material. The second fiber reinforced dielectric layer may include a first high dielectric constant material. The third fiber reinforced dielectric layer may include a second low dielectric constant material.

    CHEMICAL MECHANICAL PLANARIZATION SLURRY AND METHOD FOR FORMING SAME
    10.
    发明申请
    CHEMICAL MECHANICAL PLANARIZATION SLURRY AND METHOD FOR FORMING SAME 审中-公开
    化学机械平面化浆料及其制备方法

    公开(公告)号:WO2018057674A1

    公开(公告)日:2018-03-29

    申请号:PCT/US2017/052604

    申请日:2017-09-21

    Abstract: A CMP slurry including a carrier, a particulate material within the carrier including an oxide, carbide, nitride, boride, diamond or any combination thereof, an oxidizer including at least one material selected from the group of peroxides, persulfates, permanganates, periodates, perchlorates, hypocholorites, iodates, peroxymonosulfates, cerric ammonium nitrate, periodic acid, ferricyanides, or any combination thereof, and a material removal rate index (MRR) of at least 500 nm/hr and an average roughness index (Ra) of not greater than 5 Angstroms according to the Standardized Polishing test.

    Abstract translation: CMP浆料包括载体,载体内的颗粒材料,包括氧化物,碳化物,氮化物,硼化物,金刚石或其任何组合,氧化剂包括选自过氧化物 ,过硫酸盐,高锰酸盐,高碘酸盐,高氯酸盐,次氯酸盐,碘酸盐,过氧单硫酸盐,硝酸铈铵,过碘酸,铁氰化物或其任何组合,以及至少500nm / hr的材料去除速率指数(MRR) (Ra)根据标准抛光测试不大于5埃。

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