公开(公告)号：WO2013047902A1

公开(公告)日：2013-04-04

申请号：PCT/JP2012/075867

申请日：2012-09-28

Applicant: FUJIFILM Corporation

Inventor： HIRANO, Shuji ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki

IPC: G03F7/039 ,  C08F220/28 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0388 ,  C08F12/08 ,  C08F212/08 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/11 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.

Abstract translation: 本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含含有至少一种衍生自下述通式（aa1-1）的单体的重复单元（Aa1）的树脂（Aa）和至少一种衍生自 来自下述通式（aa2-1）的单体，并且包含当被酸作用时改变其碱溶解度的树脂（Ab）。

公开(公告)号：WO2010104218A1

公开(公告)日：2010-09-16

申请号：PCT/JP2010/054727

申请日：2010-03-12

Applicant: FUJIFILM Corporation ,  TSUBAKI, Hideaki ,  SHIRAKAWA, Koji ,  YATSUO, Tadateru ,  TSUCHIHASHI, Toru ,  TSUCHIMURA, Tomotaka

Inventor： TSUBAKI, Hideaki ,  SHIRAKAWA, Koji ,  YATSUO, Tadateru ,  TSUCHIHASHI, Toru ,  TSUCHIMURA, Tomotaka

IPC: G03F7/039 ,  C08F12/22 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0046

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in an alkali developer Formula (I), wherein Ar represents an aromatic ring having Cy groups and optionally further other substituents, n is an integer of 2 or greater, Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted cycloaliphatic group, provided that a plurality of Cy groups may be identical with or different from each other, and M + represents an organic onium ion.

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包含（A）下述通式（I）的任何化合物和（B）含有具有电离的化合物的残基（c）的树脂 潜在值低于苯酚，当被酸作用时，在碱显影剂式（I）中表现出增加的溶解度，其中Ar表示具有Cy基团和任选地进一步其它取代基的芳环，n为整数2或 更优选，Cy表示具有取代或未取代的烷基或具有取代或未取代的脂环族基团的基团，条件是多个Cy基团可以彼此相同或不同，M +表示有机鎓离子。

公开(公告)号：WO2013147325A1

公开(公告)日：2013-10-03

申请号：PCT/JP2013/060406

申请日：2013-03-29

Applicant: FUJIFILM CORPORATION

Inventor： INOUE, Naoki ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/02 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/38 ,  B82Y10/00 ,  B82Y40/00 ,  C08F220/28 ,  G03F7/0002 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising, in order: (i) a step of forming a film by using an extreme ultraviolet-sensitive resin composition containing (A) a resin having an acid-decomposable group; (ii) a step of exposing the film by using an extreme ultraviolet ray; (iii) a step of heating the film; and (iv) a step of developing the film to form a pattern, wherein in the step (ii), an optical image formed by exposure on the surface of the film is an optical image having a line part with a line width of 20 nm or less as an exposed area or an unexposed area, and, the heating temperature T PEB (°C) in the step (iii) satisfies the specific formula.

Abstract translation: 提供了一种图案形成方法，其包括以下步骤：（i）通过使用包含（A）具有酸可分解基团的树脂的极紫外线敏感性树脂组合物形成膜的步骤; （ii）通过使用极紫外线曝光胶片的步骤; （iii）加热薄膜的步骤; 和（iv）显影该膜以形成图案的步骤，其中在步骤（ii）中，通过在膜的表面上曝光形成的光学图像是具有线宽度为20nm的线部分的光学图像 或更低的曝光面积或未曝光区域，并且步骤（iii）中的加热温度TPEB（℃）满足具体公式。

公开(公告)号：WO2013081184A1

公开(公告)日：2013-06-06

申请号：PCT/JP2012/081717

申请日：2012-11-30

Applicant: FUJIFILM CORPORATION

Inventor： YOKOKAWA, Natsumi ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji

IPC: G03F7/039 ,  C08F8/00 ,  H01L21/027

CPC classification number: G03F7/0388 ,  C08F8/00 ,  C08F212/00 ,  C08F222/10 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract translation: 提供了光化射线敏感或辐射敏感性组合物，其包含（P）具有酚羟基的化合物和通过用特定式表示的基团取代酚羟基中的氢原子形成的基团，抗蚀剂 使用特定的光化射线敏感或辐射敏感组合物形成的膜，包含曝光和显影抗蚀剂膜的步骤的图案形成方法，包含图案形成方法的电子器件的制造方法和由 电子设备的具体制造方法。

公开(公告)号：WO2013047895A1

公开(公告)日：2013-04-04

申请号：PCT/JP2012/075734

申请日：2012-09-27

Applicant: FUJIFILM Corporation

Inventor： KAWABATA, Takeshi ,  TSUBAKI, Hideaki

IPC: G03F7/039 ,  C08F212/14 ,  G03F7/004 ,  H01L21/027

CPC classification number: C08F28/06 ,  C08F8/10 ,  C08F28/02 ,  C08F212/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  C08F212/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括：（P）含有（A）能够在光化学射线或辐射照射下分解以在树脂的侧链中产生酸的重复单元的树脂（P） ）和（C）由说明书中定义的下式（I）表示的重复单元，其中树脂（P）的多分散性为1.20以下。

公开(公告)号：WO2010095763A1

公开(公告)日：2010-08-26

申请号：PCT/JP2010/053014

申请日：2010-02-19

Applicant: FUJIFILM Corporation ,  TSUBAKI, Hideaki ,  SHIRAKAWA, Koji ,  TSUCHIHASHI, Toru

Inventor： TSUBAKI, Hideaki ,  SHIRAKAWA, Koji ,  TSUCHIHASHI, Toru

IPC: G03F7/32 ,  G03F7/038 ,  H01L21/027

CPC classification number: G03F7/325 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/322

Abstract: Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.

Abstract translation: 提供了一种图案形成方法，其包括以下顺序：（1）使用含有可酸分解重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的方法，并且能够 通过酸的作用降低有机溶剂中的溶解度; （2）用电子束或EUV射线曝光胶片的方法; 和（4）用含有机溶剂的显影剂显影该膜的方法。

公开(公告)号：WO2013141395A1

公开(公告)日：2013-09-26

申请号：PCT/JP2013/058467

申请日：2013-03-18

Applicant: FUJIFILM CORPORATION

Inventor： YOKOKAWA, Natsumi ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/30 ,  H01L21/027

CPC classification number: G03F7/0392 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F8/34 ,  C08F8/36 ,  C08F12/20 ,  C08F12/24 ,  C08F12/30 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/18 ,  C08F220/20 ,  C08F220/30 ,  C08F232/08 ,  C08F2800/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322 ,  C08F112/14 ,  C08F120/20 ,  C08F2220/283 ,  C08F2220/382 ,  C08F2220/305 ,  C08F2220/301

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

Abstract translation: 提供了含有具有由下式（A）表示的重复单元并且具有由下式（B）表示的重复单元中的至少两个的树脂（P）的光化射线敏感或辐射敏感性树脂组合物， 由下式（C）表示的重复单元，由下式（D）表示的重复单元和由下式（E）表示的重复单元。

公开(公告)号：WO2013039243A1

公开(公告)日：2013-03-21

申请号：PCT/JP2012/073765

申请日：2012-09-11

Applicant: FUJIFILM Corporation ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji

Inventor： TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji

IPC: G03F7/038 ,  C08F212/14 ,  C08F220/10 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0041 ,  C08F12/20 ,  C08F12/24 ,  C08F212/14 ,  C08F212/32 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2037 ,  G03F7/2059 ,  G03F7/325 ,  H01J37/3174

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation and (C) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of forming a negative pattern by development of the film with a developer containing an organic solvent after the exposing of the film, wherein a content of the compound (B) is 21% by mass to 70% by mass on the basis of all solids content of the composition.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 （A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射下能够产生酸的化合物和（C）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 和步骤（4），通过在所述膜暴露之后用含有机溶剂的显影剂显影所述膜形成负图案，其中化合物（B）的含量为21质量％至70质量％ 组合物的所有固体含量的基础。

公开(公告)号：WO2012133939A1

公开(公告)日：2012-10-04

申请号：PCT/JP2012/059300

申请日：2012-03-29

Applicant: FUJIFILM Corporation ,  TAKAHASHI, Toshiya ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji ,  TSUCHIMURA, Tomotaka

Inventor： TAKAHASHI, Toshiya ,  TAKIZAWA, Hiroo ,  TSUBAKI, Hideaki ,  HIRANO, Shuji ,  TSUCHIMURA, Tomotaka

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) containing an acid-decomposable repeating unit (A), which resin when acted on by an acid, increases its solubility in an alkali developer, a compound (Q) that when exposed to actinic rays or radiation, generates an acid, and a compound (R) expressed by general formula (1) or (2) below.

Abstract translation: 本发明提供了包含含有酸分解性重复单元（A）的树脂（P）的光化学射线或辐射敏感性树脂组合物，该树脂在被酸作用时增加其在碱性显影剂中的溶解度，化合物 Q）当暴露于光化射线或辐射时，产生酸和由以下通式（1）或（2）表示的化合物（R）。

公开(公告)号：WO2011025070A1

公开(公告)日：2011-03-03

申请号：PCT/JP2010/065192

申请日：2010-08-31

Applicant: FUJIFILM Corporation ,  TAKAHASHI, Hidenori ,  HIRANO, Shuji ,  ITO, Takayuki ,  TSUBAKI, Hideaki

Inventor： TAKAHASHI, Hidenori ,  HIRANO, Shuji ,  ITO, Takayuki ,  TSUBAKI, Hideaki

IPC: G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20

Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

Abstract translation: 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括不仅含有至少一个重复单元（A）的树脂（P），当暴露于光化射线或辐射时，其被分解，从而产生酸， 由下述通式（I）〜（III）中的任何一个表示，但也包含至少含有芳环基的重复单元（B），条件是重复单元（B）不包括通式（I） 至（III）。 （通式（I）〜（III）中使用的字符具有说明书中提及的含义。）