公开(公告)号：WO2008008098A3

公开(公告)日：2008-07-17

申请号：PCT/US2007005670

申请日：2007-03-06

Applicant: SILICA TECH LLC ,  ASLAMI MOHD A ,  WU DAU ,  DELUCA CHARLES

Inventor： ASLAMI MOHD A ,  WU DAU ,  DELUCA CHARLES

IPC: C23C16/24 ,  C23C16/513

CPC classification number: C23C16/24 ,  C23C16/513 ,  H05H1/30

Abstract: ? plasma deposition apparatus (100) for making polycrystalline silicon including a chamber for depositing said polycrystalline silicon, the chamber- having an exhaust system for recovering un-deposited gases; a support (103) located within the deposition chamber for holding a target substrate (104) having a deposition surface (106), the deposition surface defining a deposition zone (105); at least one induction coupled plasma torch (107) located within the deposition chamber and spaced apart from the support (103), the at least one induction coupled plasma torch (102) producing a plasma flame that is substantially perpendicular to the deposition surface (106), the plasma flame defining a reaction zone (126) for reacting at least one precursor gas source to produce the polycrystalline silicon for depositing a layer of the polycrystalline silicon the deposition surface (106).

Abstract translation: ？ 用于制造多晶硅的等离子体沉积设备（100），其包括用于沉积所述多晶硅的室，所述室具有用于回收未沉积气体的排气系统; 位于所述沉积室内的用于保持具有沉积表面（106）的目标衬底（104）的支撑件（103），所述沉积表面限定沉积区域（105）; 至少一个感应耦合等离子体焰炬（107），其位于所述沉积室内并且与所述支撑件（103）间隔开，所述至少一个感应耦合等离子体焰炬（102）产生基本垂直于所述沉积表面（106）的等离子体火焰 ），等离子体火焰限定反应区（126），用于使至少一个前体气体源反应以产生用于沉积多晶硅层沉积表面（106）的多晶硅。

公开(公告)号：WO2007079127A2

公开(公告)日：2007-07-12

申请号：PCT/US2006049389

申请日：2006-12-28

Applicant: SILICA TECH LLC ,  GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  WU DAU

Inventor： GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  WU DAU

CPC classification number: C03B37/01426 ,  C03B2207/81 ,  H05H1/30 ,  H05H1/42 ,  Y02P40/57

Abstract: The improved plasma torch for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing to provide active environment isolation. In addition, the present induction plasma torch includes a ring disk for more compact but complete environmental protection (360 degree coverage). It also includes offsetting and switching the position of the chemical injection nozzles for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch maintains laminar flow for the injected chemicals and the middle quartz tube is provided with a concave section for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets. It also includes chemical injection nozzles having a downward angular inclination.

Abstract translation: 用于制造合成二氧化硅的改进的等离子体焰炬包括使用来自外部石英管的氮气屏蔽气体来提供主动环境隔离。 此外，本感应等离子体焰炬包括用于更紧凑但完全环境保护（360度覆盖）的环形盘。 它还包括当以水平模式操作时，偏移和切换化学喷嘴的位置，以允许在两个方向上改善沉积。 此外，本发明的感应等离子体焰炬维持注入的化学品的层流，并且中间石英管设置有用于增加等离子体射流的平均焓的凹部，从而提高等离子体焰炬的效率。 此外，它可以利用更多的等离子体气体入口。 它还包括具有向下角度倾斜的化学喷嘴。

公开(公告)号：WO2007120776A8

公开(公告)日：2009-03-05

申请号：PCT/US2007009046

申请日：2007-04-13

Applicant: SILICA TECH LLC ,  ASLAMI MOHD A ,  WU DAU

Inventor： ASLAMI MOHD A ,  WU DAU

IPC: C23C16/507 ,  C23C16/54 ,  H01L31/20

CPC classification number: C23C16/507 ,  C23C16/513 ,  C23C16/54 ,  H01L31/0322 ,  H01L31/202 ,  H01L31/206 ,  Y02B10/10 ,  Y02E10/541 ,  Y02P70/521

Abstract: A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.

Abstract translation: 一种用于制造太阳能电池的等离子体沉积设备，包括具有用于支撑至少一个基板的纵向轴线的输送机; 至少两个模块，其每个具有至少一个等离子体焰炬，用于在所述至少一个衬底上沉积反应产物层，所述至少一个等离子体焰炬与所述至少一个衬底相距一定距离; 用于容纳所述输送机和所述至少两个模块的室; 和排气系统。 在另一个实施例中，用于制造太阳能电池的等离子体沉积装置包括：用于支撑基板的装置; 提供反应物的手段; 用于在衬底上沉积产品的等离子体焰炬装置，等离子体焰炬装置位于离衬底一定距离处; 以及用于相对于衬底振荡等离子体焰炬装置的装置。

公开(公告)号：WO2008008098A2

公开(公告)日：2008-01-17

申请号：PCT/US2007/005670

申请日：2007-03-06

Applicant: SILICA TECH, LLC ,  ASLAMI, Mohd, A. ,  WU, Dau ,  DELUCA, Charles

Inventor： ASLAMI, Mohd, A. ,  WU, Dau ,  DELUCA, Charles

IPC: C23C16/24 ,  C23C16/513

CPC classification number: C23C16/24 ,  C23C16/513 ,  H05H1/30

Abstract: A plasma deposition apparatus for making polycrystalline silicon including a chamber for depositing said polycrystalline silicon, the chamber having an exhaust system for recovering un-deposited gases; a support located within the deposition chamber for holding a target substrate having a deposition surface, the deposition surface defining a deposition zone; at least one induction coupled plasma torch located within the deposition chamber and spaced apart from the support, the at least one induction coupled plasma torch producing a plasma flame that is substantially perpendicular to the deposition surface, the plasma flame defining a reaction zone for reacting at least one precursor gas source to produce the polycrystalline silicon for depositing a layer of the polycrystalline silicon the deposition surface.

Abstract translation: 一种用于制造多晶硅的等离子体沉积设备，包括用于沉积所述多晶硅的室，所述室具有用于回收未沉积气体的排气系统; 位于所述沉积室内的用于保持具有沉积表面的目标基底的支撑体，所述沉积表面限定沉积区; 至少一个感应耦合等离子体焰炬，其位于所述沉积室内并与所述支撑件间隔开，所述至少一个感应耦合等离子体焰炬产生基本垂直于所述沉积表面的等离子体火焰，所述等离子体火焰限定用于在 至少一个前体气体源，以产生用于沉积多晶硅层沉积表面的多晶硅。

公开(公告)号：WO2007120776A2

公开(公告)日：2007-10-25

申请号：PCT/US2007/009046

申请日：2007-04-13

Applicant: SILICA TECH, LLC ,  WU, Dau ,  ASLAMI, Mohd, A.

Inventor： WU, Dau ,  ASLAMI, Mohd, A.

CPC classification number: C23C16/507 ,  C23C16/513 ,  C23C16/54 ,  H01L31/0322 ,  H01L31/202 ,  H01L31/206 ,  Y02B10/10 ,  Y02E10/541 ,  Y02P70/521

Abstract: A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.

Abstract translation: 一种用于制造太阳能电池的等离子体沉积设备，包括具有用于支撑至少一个基板的纵向轴线的输送机; 至少两个模块，其每个具有至少一个等离子体焰炬，用于在所述至少一个衬底上沉积反应产物层，所述至少一个等离子体焰炬与所述至少一个衬底相距一定距离; 用于容纳所述输送机和所述至少两个模块的室; 和排气系统。 在另一个实施例中，用于制造太阳能电池的等离子体沉积装置包括：用于支撑基板的装置; 提供反应物的手段; 用于在衬底上沉积产品的等离子体焰炬装置，等离子体焰炬装置位于离衬底一定距离处; 以及用于相对于衬底振荡等离子体焰炬装置的装置。

公开(公告)号：WO2008140501A3

公开(公告)日：2009-04-16

申请号：PCT/US2007025058

申请日：2007-12-07

Applicant: SILICA TECH LLC ,  GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  DANILOV EVGUENI B ,  WU DAU

Inventor： GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  DANILOV EVGUENI B ,  WU DAU

IPC: C03B37/018 ,  H05H1/30

CPC classification number: C03B37/01884 ,  C03B37/0183 ,  H05H1/30

Abstract: A method and apparatus for making an optical fiber preform, including injecting a plasma gas source into the first end of a tubular member; generating a ring plasma flame with the plasma gas source flowing through a plasma gas feeder nozzle, the plasma gas feeder nozzle including: an inner tube, an outer tube, wherein the plasma gas source is injected between the inner tube and the outer tube to produce the ring plasma flame, such that at least a portion of the ring plasma flame is directed radially toward the inner surface of the tubular member; traversing the tubular member along the longitudinal axis relative to the plasma flame; depositing at least one soot layer on the interior surface of the tubular member by introducing reagent chemicals into the plasma flame; and fusing all of the soot layers into a glass material on the interior surface of the tubular member.

Abstract translation: 一种用于制造光纤预制棒的方法和装置，包括将等离子体气体源注入到管状构件的第一端中; 在等离子体气体源流过等离子体气体供给喷嘴的同时产生环形等离子体火焰，等离子体气体供给喷嘴包括：内管，外管，其中等离子体气体源被注入内管和外管之间以产生 环等离子体火焰，使得至少一部分环等离子体火焰径向地朝向管状构件的内表面; 沿着纵向轴线相对于等离子体火焰穿过管状构件; 通过将试剂化学品引入等离子体火焰中，将至少一个烟灰层沉积在管状构件的内表面上; 并将所有烟灰层熔合到管状构件的内表面上的玻璃材料中。

公开(公告)号：WO2007120776A3

公开(公告)日：2008-02-28

申请号：PCT/US2007009046

申请日：2007-04-13

Applicant: SILICA TECH LLC ,  WU DAU ,  ASLAMI MOHD A

Inventor： WU DAU ,  ASLAMI MOHD A

IPC: C23C16/507 ,  C23C16/54 ,  H01L31/20

CPC classification number: C23C16/507 ,  C23C16/513 ,  C23C16/54 ,  H01L31/0322 ,  H01L31/202 ,  H01L31/206 ,  Y02B10/10 ,  Y02E10/541 ,  Y02P70/521

Abstract: A plasma deposition apparatus for making solar cells comprising a conveyor having a longitudinal axis for supporting at least one substrate; at least two modules each having at least one plasma torch for depositing a layer of a reaction product on the at least one substrate, the at least one plasma torch located a distance from the at least one substrate; a chamber for containing the conveyor and the at least two modules; and an exhaust system. In another embodiment, the plasma deposition apparatus for making solar cells comprises: means for supporting a substrate; means for supplying reactants; plasma torch means for depositing a product on the substrate, the plasma torch means located a distance from the substrate; and means for oscillating the plasma torch means relative to the substrate.

Abstract translation: 一种用于制造太阳能电池的等离子体沉积设备，包括具有用于支撑至少一个基板的纵向轴线的输送机; 至少两个模块，其每个具有至少一个等离子体焰炬，用于在所述至少一个衬底上沉积反应产物层，所述至少一个等离子体焰炬与所述至少一个衬底相距一定距离; 用于容纳所述输送机和所述至少两个模块的室; 和排气系统。 在另一个实施例中，用于制造太阳能电池的等离子体沉积装置包括：用于支撑基板的装置; 提供反应物的手段; 用于在衬底上沉积产品的等离子体焰炬装置，等离子体焰炬装置位于离衬底一定距离处; 以及用于相对于衬底振荡等离子体焰炬装置的装置。

公开(公告)号：WO2008140501A2

公开(公告)日：2008-11-20

申请号：PCT/US2007/025058

申请日：2007-12-07

Applicant: SILICA TECH LLC ,  GUSKOV, Mikhail, I. ,  ASLAMI, Mohd, A. ,  DANILOV, Evgueni, B. ,  WU, Dau

Inventor： GUSKOV, Mikhail, I. ,  ASLAMI, Mohd, A. ,  DANILOV, Evgueni, B. ,  WU, Dau

IPC: B05D7/22 ,  H05H1/24 ,  C23C4/00 ,  B05D1/08 ,  C23C16/00

CPC classification number: C03B37/01884 ,  C03B37/0183 ,  H05H1/30

Abstract: A method and apparatus for making an optical fiber preform, including injecting a plasma gas source into the first end of a tubular member; generating a ring plasma flame with the plasma gas source flowing through a plasma gas feeder nozzle, the plasma gas feeder nozzle including: an inner tube, an outer tube, wherein the plasma gas source is injected between the inner tube and the outer tube to produce the ring plasma flame, such that at least a portion of the ring plasma flame is directed radially toward the inner surface of the tubular member; traversing the tubular member along the longitudinal axis relative to the plasma flame; depositing at least one soot layer on the interior surface of the tubular member by introducing reagent chemicals into the plasma flame; and fusing all of the soot layers into a glass material on the interior surface of the tubular member.

Abstract translation: 一种用于制造光纤预制棒的方法和装置，包括将等离子体气体源注入到管状构件的第一端中; 在等离子体气体源流过等离子体气体供给喷嘴的同时产生环形等离子体火焰，等离子体气体供给喷嘴包括：内管，外管，其中等离子体气体源被注入内管和外管之间以产生 环等离子体火焰，使得至少一部分环等离子体火焰径向地朝向管状构件的内表面; 沿着纵向轴线相对于等离子体火焰穿过管状构件; 通过将试剂化学品引入等离子体火焰中，将至少一个烟灰层沉积在管状构件的内表面上; 并将所有烟灰层熔合到管状构件的内表面上的玻璃材料中。

公开(公告)号：WO2007079127B1

公开(公告)日：2007-11-01

申请号：PCT/US2006049389

申请日：2006-12-28

Applicant: SILICA TECH LLC ,  GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  WU DAU

Inventor： GUSKOV MIKHAIL I ,  ASLAMI MOHD A ,  WU DAU

IPC: C03B37/014 ,  H05H1/34

CPC classification number: C03B37/01426 ,  C03B2207/81 ,  H05H1/30 ,  H05H1/42 ,  Y02P40/57

Abstract: The plasma torch (40) for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing (53) to provide active environment isolation. In addition, the present induction plasma torch (40) includes ring disks (66, 70) for more compact but complete environmental protection (360 degree coverage) . It also includes offsetting and switching the position of the chemical injection nozzles (68) for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch (40) maintains laminar flow for the injected chemicals and the middle quartz tube (154) is provided with a concave section (157) for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets (76) . It also includes chemical injection nozzles (68) having a downward angular inclination.

Abstract translation: 用于制造合成二氧化硅的等离子体焰炬（40）包括使用来自外部石英管（53）的氮气屏蔽气体来提供主动环境隔离。 此外，本感应等离子体焰炬（40）包括用于更紧凑但完全环境保护（360度覆盖）的环形盘（66,70）。 它还包括当以水平模式操作时，偏移和切换化学喷嘴（68）的位置，以允许在两个方向上改进的沉积。 此外，本发明的感应等离子体焰炬（40）保持注入的化学物质的层流，并且中间石英管（154）设置有用于增加等离子体射流的平均焓的凹部（157），从而提高等离子体的效率 火炬。 此外，它可以利用更多的等离子体气体入口（76）。 它还包括具有向下角度倾斜的化学喷嘴（68）。

公开(公告)号：WO2007079127A3

公开(公告)日：2007-07-12

申请号：PCT/US2006/049389

申请日：2006-12-28

Applicant: SILICA TECH, LLC ,  GUSKOV, Mikhail, I. ,  ASLAMI, Mohd, A. ,  WU, Dau

Inventor： GUSKOV, Mikhail, I. ,  ASLAMI, Mohd, A. ,  WU, Dau

IPC: C03B37/014 ,  H05H1/34

Abstract: The plasma torch (40) for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing (53) to provide active environment isolation. In addition, the present induction plasma torch (40) includes ring disks (66, 70) for more compact but complete environmental protection (360 degree coverage) . It also includes offsetting and switching the position of the chemical injection nozzles (68) for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch (40) maintains laminar flow for the injected chemicals and the middle quartz tube (154) is provided with a concave section (157) for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets (76) . It also includes chemical injection nozzles (68) having a downward angular inclination.