光ファイバ母材の製造方法
    1.
    发明申请
    光ファイバ母材の製造方法 审中-公开
    生产光纤基材的方法

    公开(公告)号:WO2010029734A1

    公开(公告)日:2010-03-18

    申请号:PCT/JP2009/004466

    申请日:2009-09-09

    Inventor: 乙坂 哲也

    Abstract:  トレンチ型屈折率分布を有し、伝送損失が小さく、標準シングルモード光ファイバとの接続損失が小さく、耐曲げ特性の良い光ファイバが得られる光ファイバ母材の製造方法を提供する。 少なくともコア、第1クラッド、フッ素を含有する第2クラッドからなる光ファイバ母材の製造方法において、コア及び第1クラッドを有する出発母材を準備する出発母材準備ステップと、高周波誘導熱プラズマトーチにガラス原料を供給してガラス微粒子を合成し母材上に堆積させて多孔質中間ガラス母材を作成するプラズマ堆積ステップと、該多孔質中間ガラス母材をフッ素を含有する雰囲気中で加熱ガラス化して、コア、第1クラッド及びフッ素を含有する第2クラッドを有する中間ガラス母材形成ステップとを含むことを特徴とする。

    Abstract translation: 提供一种光纤基材的制造方法,其能够赋予具有沟槽型折射率分布的光纤,低传输损耗,对标准单模光纤的拼接损耗低,耐挠曲性好的光纤。 该方法用于生产含有氟的至少包含芯,第一包层和第二包层的光纤基材。 该方法的特征在于包括:起始基材料制备步骤,其中制备包含芯和第一包层的起始基材; 将原料玻璃材料供给到高频感应热等离子体焰炬以合成细玻璃粒子的等离子体沉积步骤,并将该颗粒沉积在基材上以制备多孔中间玻璃基材; 以及在含氟气氛中加热玻璃化多孔中间玻璃基材以形成包含含有氟的芯,第一包层和第二包层的中间玻璃基材的工序。

    METHOD FOR PRODUCING A TUBULAR SEMIFINISHED PRODUCT FROM FLUORINE-DOPED QUARTZ GLASS
    2.
    发明申请
    METHOD FOR PRODUCING A TUBULAR SEMIFINISHED PRODUCT FROM FLUORINE-DOPED QUARTZ GLASS 审中-公开
    从氟化石英玻璃生产管状半球形产品的方法

    公开(公告)号:WO2008003613A1

    公开(公告)日:2008-01-10

    申请号:PCT/EP2007/056354

    申请日:2007-06-26

    Abstract: To improve a generally known method for producing a tubular semifinished product from fluorine-doped quartz glass such that it is possible to produce a tubular semifinished product of fluorine-doped quartz glass with an inner bore of high quality while the efforts for making or treating the same are as small as possible, the present invention suggests a method comprising the following steps: (a) providing a substrate tube consisting of fluorine-doped quartz glass; (b) forming, in a deposition process, SiO 2 particles by means of plasma burners and in the presence of fluorine, and depositing said particles in layers on the cylindrical outer surface of the substrate tube rotating about its longitudinal axis with formation of a mother tube consisting of fluorine-doped quartz glass; and (c) elongating the mother tube in an elongation process to obtain the tubular semifinished product.

    Abstract translation: 为了改进用于从掺氟石英玻璃制造管状半成品的通常已知的方法,使得可以制造具有高质量内孔的掺氟石英玻璃的管状半成品,同时制造或处理 本发明提供了一种方法,包括以下步骤:(a)提供由氟掺杂石​​英玻璃构成的衬底管; (b)通过等离子体燃烧器和氟存在下在沉积过程中形成SiO 2颗粒,并且在基板管的圆柱形外表面上层叠所述颗粒,所述圆柱形外表面围绕其旋转 纵轴形成由掺氟石英玻璃构成的母管; 和(c)在伸长过程中延伸母管以获得管状半成品。

    VERFAHREN ZUR HERSTELLUNG EINES ROHRFÖRMIGEN HALBZEUGS AUS QUARZGLAS, VERFAHREN ZUR HERSTELLUNG EINES OPTISCHEN BAUTEILS UNTER EINSATZ DES HALBZEUGS, SOWIE HALBZEUG AUS FLUORDOTIERTEM QUARZGLAS
    4.
    发明申请
    VERFAHREN ZUR HERSTELLUNG EINES ROHRFÖRMIGEN HALBZEUGS AUS QUARZGLAS, VERFAHREN ZUR HERSTELLUNG EINES OPTISCHEN BAUTEILS UNTER EINSATZ DES HALBZEUGS, SOWIE HALBZEUG AUS FLUORDOTIERTEM QUARZGLAS 审中-公开
    用于生产半成品由石英玻璃,METHOD用于制造光学组件中使用氟掺杂QUARZGLAS的半成品和半成品的管状

    公开(公告)号:WO2010034843A1

    公开(公告)日:2010-04-01

    申请号:PCT/EP2009/062583

    申请日:2009-09-29

    Abstract: Um ein allgemein bekanntes Verfahren zur Herstellung von fluordotiertem Quarzglas, bei dem mittels eines Plasma-Abscheideprozesses SiO 2 -Partikel in Gegenwart von Fluor gebildet und schichtweise auf einem Aussenmantel eines um seine Längsachse rotierenden, zylinderförmigen Substratkörpers aus Quarzglas abgeschieden und zu einer Schicht aus Quarzglas mit einem Fluorgehalt von mindestens 1,5 Gew.-% verglast werden, dahingehend zu verbessern, dass ein Halbzeug aus Quarzglas mit hohem Fluorgehalt erhalten wird, das sich durch eine hohe Grundtransmission im UV-Wellenlängenbereich auszeichnet, wird erfindungsgemäß vorgeschlagen, dass der Substratkörper mindestens im Bereich des Aussenmantels eine Reservoirschicht aus Quarzglas aufweist, das einen Hydroxylgruppengehalt von 200 Gew.-ppm oder mehr und/oder einen Wasserstoffgehalt von 1 x 10 17 Molekülen/cm 3 oder mehr aufweist, und dass der Substratkörper nach dem Abscheiden der mit Fluor dotierten Quarzglasschicht entweder vollständig oder teilweise entfernt wird.

    Abstract translation: 用于生产掺氟的石英玻璃,其中通过等离子体沉积过程中,在氟的存在SiO 2颗粒形成,并沉积在层上的一个绕其纵轴旋转的圆柱形衬底本体由石英玻璃制成的外护套以及具有一个石英玻璃的层上的公知的工艺 氟含量被玻璃化的至少1.5重量%,以提高其由石英玻璃制成的半成品与高的氟含量,其特点是在UV波长范围内具有高的基本传输所获得的效果,本发明提出的是,基体至少在该区域 具有按重量计或更多和/或1×10 17分子/ cm 3以上,并且的氢含量为200 ppm的羟基含量的石英玻璃构成的贮库层外壳掺氟的石英玻璃层的沉积要么完全后的基板构件 是或部分地去除。

    PROCESS FOR THE MANUFACTURE OF A PREFORM FOR OPTICAL FIBRES
    5.
    发明申请
    PROCESS FOR THE MANUFACTURE OF A PREFORM FOR OPTICAL FIBRES 审中-公开
    用于制造光纤的预制件的方法

    公开(公告)号:WO2006106068A3

    公开(公告)日:2006-12-14

    申请号:PCT/EP2006061179

    申请日:2006-03-30

    Abstract: In a known process for the manufacture of a preform for optical fibres of quartz glass using a plasma burner (1), this is operated in a deposition phase and a smoothing phase, a silicon-containing starting substance being supplied to the plasma burner during the deposition phase, SiO 2 being formed therefrom in a plasma flame allocated to the plasma burner and this SiO 2 being deposited in layers on the cylinder jacket surface (9) of a substrate body (3) rotating around its own longitudinal axis by reversing movement of the plasma burner along the substrate body and being vitrified directly during this process into quartz glass of the preform and the preform surface being treated during the smoothing phase, by the plasma flame moving at least once along the preform, with a temperature which is higher in comparison with deposition phase such that smoothing of the preform surface and melting of the near-surface bubbles are effected. In order to indicate an economic process on this basis which allows the manufacture of low bubble content or bubble-free preforms with an acceptable time and material expenditure, it is suggested according to the invention that the deposition phase comprises a multiplicity of successive deposition sub-phases in the course of which a quartz glass layer is produced in a thickness of less than 400 µm, successive deposition sub-phases being interrupted by a smoothing phase.

    Abstract translation: 在使用等离子体燃烧器(1)制造用于石英玻璃的光纤的预制件的已知方法中,其在沉积阶段和平滑阶段中操作,含硅原料被供给到等离子体燃烧器 在等离子体燃烧器中分配的等离子体火焰中形成由SiO 2沉积相,SiO 2层,并且该SiO 2层沉积在基板的圆筒套表面(9)上 主体(3)通过反转等离子体燃烧器沿着基板本体的运动而反转,并且在该过程期间被直接玻璃化成预成型体的石英玻璃和在平滑阶段期间被处理的预制件表面,通过等离子体火焰移动 沿着预成型件至少一次,其温度与沉积阶段相比更高,使得预成型件表面的平滑化和近表面气泡的熔化得以实现。 为了表明在此基础上的经济方法,其允许以可接受的时间和材料消耗制造低气泡含量或无气泡的预成型件,根据本发明,建议沉积阶段包括多个连续的沉积子层, 在其中制造厚度小于400μm的石英玻璃层的阶段,连续的沉积次级被平滑相位中断。

    METHOD FOR THE PRODUCTION OF A BLANK MOLD FOR OPTICAL FIBERS
    6.
    发明申请
    METHOD FOR THE PRODUCTION OF A BLANK MOLD FOR OPTICAL FIBERS 审中-公开
    制造方法的光纤预制件

    公开(公告)号:WO2004089837A3

    公开(公告)日:2005-01-20

    申请号:PCT/EP2004003665

    申请日:2004-04-06

    Abstract: In a known method for the production of a blank mold for optical fibers, a fluorine-doped Si02 enveloping glass is produced on a core glass cylinder that rotates about its longitudinal axis, wherein a silicon-containing starting substance is fed to a plasma burner, said substance is then oxidized in a plasma flame assigned to the plasma burner to obtain Si02 particles, the Si02 particles are deposited by layers on the enveloping surface of the cylinder of the core glass cylinder in the presence of fluorine and sintered into the enveloping glass. The invention aims at providing an economical method, which builds upon the above-mentioned method, in order to produce a blank mold from which optical multi-mode fibers (52) can be obtained. In comparison with fibers (51) produced according to standard methods, said optical multi-mode fibers are characterized by high initial transmission in the UV wavelength range and good resistance with respect to brief UV radiation, more particularly in the 210-300 nm wavelength range. According to the invention, a plasma flame that irradiates an ultraviolet light having a wavelength of 214 nm with an intensity of at least 0.9 ñW -determined on the basis of plasma flame intensity measurement- is used for the formation and deposition of the Si02 particles on the core glass.

    Abstract translation: 在制造光纤预成型件的一个已知的方法中,形成由含有硅的原料被提供给等离子体焰炬的旋转绕其纵轴线芯玻璃圆筒氟掺杂的SiO 2包层玻璃,该氧化在与等离子体炬等离子体火焰的SiO 2颗粒和相关联的 下氟的芯玻璃圆筒的圆柱形表面上存在的SiO 2的颗粒可以沉积在层中并且被烧结到包层玻璃。 为了此基础上用于产生从光学多模光纤可以得到(52)的预成型件提供一种经济的方法,比起那些通过标准程序纤维(51)通过在UV波长范围内高的初始传输,以及良好的耐生产接待了UV辐射,特别是 的波长范围210-300纳米,其特征在于,根据本发明,提出的是,在芯玻璃的的SiO 2颗粒的形成和沉积气缸中的等离子火焰被采用,具有214纳米的波长具有至少0.9 IW的强度的紫外光 - 确定 通过等离子火焰强度测量 - 辐射。

    PLASMA TORCH FOR MAKING SYNTHETIC SILICA
    9.
    发明申请
    PLASMA TORCH FOR MAKING SYNTHETIC SILICA 审中-公开
    用于制备合成二氧化硅的等离子体切割机

    公开(公告)号:WO2007079127B1

    公开(公告)日:2007-11-01

    申请号:PCT/US2006049389

    申请日:2006-12-28

    CPC classification number: C03B37/01426 C03B2207/81 H05H1/30 H05H1/42 Y02P40/57

    Abstract: The plasma torch (40) for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing (53) to provide active environment isolation. In addition, the present induction plasma torch (40) includes ring disks (66, 70) for more compact but complete environmental protection (360 degree coverage) . It also includes offsetting and switching the position of the chemical injection nozzles (68) for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch (40) maintains laminar flow for the injected chemicals and the middle quartz tube (154) is provided with a concave section (157) for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets (76) . It also includes chemical injection nozzles (68) having a downward angular inclination.

    Abstract translation: 用于制造合成二氧化硅的等离子体焰炬(40)包括使用来自外部石英管(53)的氮气屏蔽气体来提供主动环境隔离。 此外,本感应等离子体焰炬(40)包括用于更紧凑但完全环境保护(360度覆盖)的环形盘(66,70)。 它还包括当以水平模式操作时,偏移和切换化学喷嘴(68)的位置,以允许在两个方向上改进的沉积。 此外,本发明的感应等离子体焰炬(40)保持注入的化学物质的层流,并且中间石英管(154)设置有用于增加等离子体射流的平均焓的凹部(157),从而提高等离子体的效率 火炬。 此外,它可以利用更多的等离子体气体入口(76)。 它还包括具有向下角度倾斜的化学喷嘴(68)。

    PROCESS FOR THE MANUFACTURE OF A PREFORM FOR OPTICAL FIBRES
    10.
    发明申请
    PROCESS FOR THE MANUFACTURE OF A PREFORM FOR OPTICAL FIBRES 审中-公开
    用于制造光纤的预制件的方法

    公开(公告)号:WO2006106068A2

    公开(公告)日:2006-10-12

    申请号:PCT/EP2006/061179

    申请日:2006-03-30

    Abstract: In a known process for the manufacture of a preform for optical fibres of quartz glass using a plasma burner, this is operated in a deposition phase and a smoothing phase, a silicon-containing starting substance being supplied to the plasma burner during the deposition phase, SiO 2 being formed therefrom in a plasma flame allocated to the plasma burner and this SiO 2 being deposited in layers on the cylinder jacket surface of a substrate body rotating around its own longitudinal axis by reversing movement of the plasma burner along the substrate body and being vitrified directly during this process into quartz glass of the preform and the preform surface being treated during the smoothing phase, by the plasma flame moving at least once along the preform, with a temperature which is higher in comparison with deposition phase such that smoothing of the preform surface and melting of the near-surface bubbles are effected. In order to indicate an economic process on this basis which allows the manufacture of low bubble content or bubble-free preforms with an acceptable time and material expenditure, it is suggested according to the invention that the deposition phase comprises a multiplicity of successive deposition sub-phases in the course of which a quartz glass layer is produced in a thickness of less than 400 µm, successive deposition sub-phases being interrupted by a smoothing phase.

    Abstract translation: 在使用等离子体燃烧器制造用于石英玻璃的光纤的预制件的已知方法中,其在沉积阶段和平滑阶段中操作,在沉积阶段期间将含硅起始物质供应到等离子体燃烧器, 在等离子体燃烧器中分配的等离子体火焰中形成SiO 2 2,并且该SiO 2层分层沉积在基板本体的圆筒套表面上,该衬底主体围绕其自身的纵向 通过沿着衬底主体反转等离子体燃烧器的运动,并且在该过程中被直接玻璃化成预成型体的石英玻璃和在平滑阶段期间被处理的预成型件表面,等离子体火焰沿着预成型件至少移动一次,具有 温度与沉积阶段相比更高,使得预成型件表面的平滑化和近表面气泡的熔化得以实现。 为了表明在此基础上的经济方法,其允许以可接受的时间和材料消耗制造低气泡含量或无气泡的预成型件,根据本发明,建议沉积阶段包括多个连续的沉积子层, 在其中制造厚度小于400μm的石英玻璃层的阶段,连续的沉积次级被平滑相位中断。

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