公开(公告)号：WO2004012308A3

公开(公告)日：2004-07-15

申请号：PCT/US0324146

申请日：2003-07-30

Applicant: CYMER INC ,  FALLON JOHN P ,  RULE JOHN A ,  JACQUES ROBERT N ,  LIPCON JACOB P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ERSHOV ALEXANDER I ,  ISHIHARA TOSHIHIKO ,  MEISNER JOHN ,  NESS RICHARD M ,  MELCHER PAUL C

Inventor： FALLON JOHN P ,  RULE JOHN A ,  JACQUES ROBERT N ,  LIPCON JACOB P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ERSHOV ALEXANDER I ,  ISHIHARA TOSHIHIKO ,  MEISNER JOHN ,  NESS RICHARD M ,  MELCHER PAUL C

IPC: H01S20060101 ,  H01S3/036 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。 在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。 特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度 控制和（4）F2注射控制与新的学习算法。

公开(公告)号：WO2004012308A2

公开(公告)日：2004-02-05

申请号：PCT/US2003/024146

申请日：2003-07-30

Applicant: CYMER, INC. ,  FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

Inventor： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC: H01S

CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体 温度控制和（4）F2注入控制与新的学习算法。