公开(公告)号：WO2013002970A1

公开(公告)日：2013-01-03

申请号：PCT/US2012/040933

申请日：2012-06-05

Applicant: CYMER, INC. ,  O'BRIEN, Kevin, M. ,  THORNES, Joshua, J. ,  RIGGS, Daniel, J. ,  JIANG, Rui

Inventor： O'BRIEN, Kevin, M. ,  THORNES, Joshua, J. ,  RIGGS, Daniel, J. ,  JIANG, Rui

IPC: H01S3/22

CPC classification number: H01S3/036 ,  H01S3/104 ,  H01S3/2251 ,  H01S3/2366

Abstract: A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled until the discharge voltage meets/exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again until the voltage and pressure meet/exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled until the discharge voltage meets/exceeds the minimum value and the output energy meets/exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

Abstract translation: 一种用于在诸如准分子激光器的二室气体放电激光器的腔室中的再填充之后自动执行气体优化的系统和方法。 激光器以低功率输出连续点火，并且放大器激光器室中的气体排出直到放电电压达到/超过最小值，而不将压力降低到最小值以下。 功率输出增加，气体再次流出，直到电压和压力达到/超过最小值。 然后以突发模式发射激光，其近似于操作中激光器的预期发射，并且气体流出直到放电电压达到/超过最小值，并且输出能量达到/超过最小值，同时不降低压力 在室内低于最小值。 一旦提供最小值，该过程即可快速运行，无需手动交互。

公开(公告)号：WO2012050685A1

公开(公告)日：2012-04-19

申请号：PCT/US2011/050565

申请日：2011-09-06

Applicant: CYMER, INC. ,  PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Igor, V.

Inventor： PARTLO, William, N. ,  SANDSTROM, Richard, L. ,  BROWN, Daniel, J.w. ,  FOMENKOV, Igor, V.

IPC: A61N5/06

CPC classification number: G21K5/00 ,  G03F7/70033 ,  H01S3/117 ,  H01S3/2232 ,  H01S3/2308 ,  H05G2/008

Abstract: A device is disclosed, herein which may comprise a droplet generator producing droplets of target material; a sensor providing an. intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the. intercept time signal; a. laser source responsive to a trigger signal to produce a laser pulse-; and a system controlling said delay circuit to provide a. trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light -pulse which is not focused on a droplet.

Abstract translation: 本文公开了一种装置，其可以包括产生目标材料的液滴的液滴发生器; 传感器提供。 当液滴到达预选位置时截获时间信号; 与所述传感器耦合的延迟电路，所述延迟电路产生从所述传感器延迟的触发信号。 拦截时间信号; 一个。 激光源响应于触发信号以产生激光脉冲; 以及控制所述延迟电路以提供a的系统。 触发信号从截取时间延迟第一延迟时间，以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号，以产生不聚焦在液滴上的光脉冲 。

公开(公告)号：WO2011130327A1

公开(公告)日：2011-10-20

申请号：PCT/US2011/032187

申请日：2011-04-12

Applicant: CYMER, INC. ,  ERSHOV, Alexander, I. ,  MORSE, Robert, L. ,  PARTLO, William, N. ,  PATE, Christopher, P.

Inventor： ERSHOV, Alexander, I. ,  MORSE, Robert, L. ,  PARTLO, William, N. ,  PATE, Christopher, P.

IPC: H01J3/14

CPC classification number: H05G2/008 ,  G02B7/008 ,  G03F7/70033 ,  G03F7/70891 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: Devices are described herein which may comprise an optic having a non- planar surface, the non-planar surface having, an optically active portion; and a flow guide directing gas upon the non-planar surface to produce turbulent flow on at least a portion of the optically active portion of the non-planar surface to cool the optic.

Abstract translation: 本文描述的装置可以包括具有非平面表面的光学元件，非平面表面具有光学活性部分; 以及引导气体在非平面表面上的流动引导件，以在非平面表面的光学活性部分的至少一部分上产生湍流，以冷却光学元件。

公开(公告)号：WO2011126992A1

公开(公告)日：2011-10-13

申请号：PCT/US2011/031116

申请日：2011-04-04

Applicant: CYMER, INC. ,  O'BRIEN, Kevin, M. ,  TRINTCHOUK, Fedor, B.

Inventor： O'BRIEN, Kevin, M. ,  TRINTCHOUK, Fedor, B.

IPC: H01S3/10

CPC classification number: H01S3/2308 ,  H01S3/134 ,  H01S3/225

Abstract: An apparatus includes a light source that produces a light beam, a bandwidth measurement system, a plurality of bandwidth actuation systems, and a control system. Each bandwidth actuation system includes one or more bandwidth actuators and each bandwidth actuation system is connected to an optical feature that is optically coupled to the produced light beam and operable to modify the connected optical feature to select a bandwidth within a bandwidth range of the produced light beam. The control system is connected to the bandwidth measurement system and to the plurality of bandwidth actuation systems. The control system is configured to switch between activating and operating a first bandwidth actuation system and activating and operating a second bandwidth actuation system independently and separately of activating and operating the first bandwidth actuation system based on a provided bandwidth measurement and a selected target bandwidth.

Abstract translation: 一种装置包括产生光束的光源，带宽测量系统，多个带宽致动系统和控制系统。 每个带宽致动系统包括一个或多个带宽致动器，并且每个带宽致动系统连接到光学特征，该光学特征光学地耦合到所产生的光束并且可操作以修改所连接的光学特征，以在所产生的光的带宽范围内选择带宽 光束。 控制系统连接到带宽测量系统和多个带宽致动系统。 控制系统被配置为在激活和操作第一带宽致动系统之间切换，并且基于所提供的带宽测量和所选择的目标带宽，独立且独立地激活和操作第一带宽致动系统来激活和操作第二带宽致动系统。

公开(公告)号：WO2011126947A1

公开(公告)日：2011-10-13

申请号：PCT/US2011/030974

申请日：2011-04-01

Applicant: CYMER, INC. ,  GOVINDARAJU, Abhiram ,  PARTLO, William, N.

Inventor： GOVINDARAJU, Abhiram ,  PARTLO, William, N.

IPC: H05G2/00

CPC classification number: H05G2/001 ,  H05G2/008

Abstract: An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.

Abstract translation: 一种装置包括具有增益介质的光源，该增益介质用于沿着光束路径产生源波长的放大光束以照射室中的目标材料并产生极紫外光; 以及覆盖所述室的内表面的至少一部分的子系统，并且被配置成沿着所述光束路径减少来自所述内表面的所述源波长处的光流。

公开(公告)号：WO2010117801A1

公开(公告)日：2010-10-14

申请号：PCT/US2010/029232

申请日：2010-03-30

Applicant: CYMER, INC. ,  VASCHENKO, Georgiy, O. ,  RAMADURAI, Krishna

Inventor： VASCHENKO, Georgiy, O. ,  RAMADURAI, Krishna

IPC: G01J3/10

CPC classification number: G05D7/0635 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70825 ,  G03F7/7085 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  Y10T137/0379 ,  Y10T137/7727

Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.

Abstract translation: 本文描述了一种装置，其可以包括腔室，流体管线，流体管线中的加压源材料，限制源材料流入腔室的部件，测量流体管线中的流体流量并提供 信号指示，以及响应于信号的减压阀，以在组件发生故障的情况下减少源材料泄漏到腔室中。

公开(公告)号：WO2009085095A1

公开(公告)日：2009-07-09

申请号：PCT/US2008/013417

申请日：2008-12-05

Applicant: CYMER, INC. ,  ERSHOV, Alexander, I. ,  HOFFMAN, Jerzy, R. ,  BOWERING, Norbert, R. ,  BYKANOV, Alexander, N.

Inventor： ERSHOV, Alexander, I. ,  HOFFMAN, Jerzy, R. ,  BOWERING, Norbert, R. ,  BYKANOV, Alexander, N.

IPC: G02F1/35

CPC classification number: H01S3/105 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/115 ,  H01S3/2232 ,  H01S3/225 ,  H01S3/2325 ,  H01S2301/02 ,  H05G2/003 ,  H05G2/008

Abstract: A device is described herein which may comprise an oscillator having an oscillator cavity length, L 0 , and defining an oscillator path; and a multi-pass optical amplifier coupled with the oscillator to establish a combined optical cavity including the oscillator path, the combined cavity having a length, L combined , where L combined = (N + x) * L 0 , where "N" is an integer and "x" is a number between 0.4 and 0.6.

Abstract translation: 本文描述了一种器件，其可以包括具有振荡器腔长度L0并且限定振荡器路径的振荡器; 和与所述振荡器耦合的多通光放大器以建立包括所述振荡器路径的组合光腔，所述组合腔具有长度L组合，其中L组合=（N + x）* L0，其中“N”是整数， “x”是介于0.4和0.6之间的数字。

公开(公告)号：WO2006060359A3

公开(公告)日：2009-04-16

申请号：PCT/US2005043055

申请日：2005-11-28

Applicant: CYMER INC ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  ALGOTS J MARTIN ,  TRINTCHOUK FEDOR

Inventor： SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  BROWN DANIEL J W ,  ALGOTS J MARTIN ,  TRINTCHOUK FEDOR

IPC: G02B5/04 ,  H01S3/08

CPC classification number: H01S3/08009 ,  H01S3/08031 ,  H01S3/08059 ,  H01S3/097 ,  H01S3/1055

Abstract: A line narrowing apparatus and method for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses is disclosed, which may comprise a dispersive center wavelength selection optic contained within a line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive wavelength selection optic dispersive surface; a first dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a first manner; and, a second dispersive optic bending mechanism operatively connected to the dispersive center wavelength selection optic and operative to change the curvature of the dispersive surface in a second manner. The first manner may modify a first measure of bandwidth and the second manner may modify a second measure of bandwidth such that the ratio of the first measure to the second measure substantially changes. The first measure may be a spectrum width at a selected percentage of the spectrum peak value (FWX%M) and the second measure may be width within which some selected percentage of the spectral intensity is contained (EX%). The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second in a second dimension generally orthogonal to the first dimension. The laser system may comprise a beam path insert comprising a material having an different index of refraction and an index of refraction thermal gradient opposite from that of a neighboring optical element. The first dispersive optic bending mechanism may change the curvature of the dispersive surface in a first dimension and the second a second dimension generally parallel to the first dimension. An optical beam twisting element in the lasing cavity may optically twist the laser light pulse beam to present a twisted wavefront to the dispersive center wavelength selection optic. Bending may change the curvature and wavelength selection, e.g., in a burst may create two center wavelength peaks to select FWX%M and EX% independently.

Abstract translation: 公开了一种用于窄带DUV大功率高重复率气体放电激光器的脉冲串产生输出激光脉冲束脉冲的线窄化装置和方法，其可以包括包含在线窄模块内的分散中心波长选择光学器件，选择 用于每个脉冲的至少一个中心波长至少部分地由包含分散波长选择光学色散表面上的各个脉冲的激光束的入射角确定; 第一分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第一方式改变所述分散表面的曲率; 以及第二分散光学弯曲机构，其可操作地连接到所述分散中心波长选择光学器件并且以第二方式改变所述色散表面的曲率。 第一种方式可以修改第一带宽度量，并且第二种方式可以修改第二带宽度量，使得第一测量与第二测量的比率基本上改变。 第一测量可以是频谱峰值（FWX％M）的选定百分比处的频谱宽度，第二测量可以是包含光谱强度的某些选定百分比（EX％）的宽度。 第一分散光学弯曲机构可以在第一维度上改变分散表面的曲率，而第二维度可以大致垂直于第一维度改变。 激光系统可以包括光束路径插入件，其包括具有不同折射率的材料和与相邻光学元件的折射率相反的折射热梯度。 第一分散光学弯曲机构可以改变分散表面在第一尺寸中的曲率，而第二分散光学弯曲机构的第二尺寸大体上平行于第一尺寸。 激光腔中的光束加捻元件可以光学地扭转激光脉冲光束，以将扭曲的波前呈现到分散中心波长选择光学器件。 弯曲可以改变曲率和波长选择，例如，在脉冲串中可以产生两个中心波长峰值，以独立地选择FWX％M和EX％。

公开(公告)号：WO2008105989A3

公开(公告)日：2009-02-19

申请号：PCT/US2008001349

申请日：2008-02-01

Applicant: CYMER INC ,  BYKANOV ALEXANDER N ,  BOWERING NORBERT R ,  FOMENKOV IGOR V ,  BRANDT DAVID C ,  ERSHOV ALEXANDER I ,  KHODYKIN OLEH V ,  PARTLO WILLIAM N

Inventor： BYKANOV ALEXANDER N ,  BOWERING NORBERT R ,  FOMENKOV IGOR V ,  BRANDT DAVID C ,  ERSHOV ALEXANDER I ,  KHODYKIN OLEH V ,  PARTLO WILLIAM N

IPC: G01J3/10

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/008

Abstract: A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic, hi one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.

Abstract translation: 公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。 该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预选值以下。在一个实施方案中，气体可以包含氢气，并且在特定的实施方案中，气体可以包含大于50体积％的氢气。

公开(公告)号：WO2009011739A1

公开(公告)日：2009-01-22

申请号：PCT/US2008/007306

申请日：2008-06-11

Applicant: CYMER, INC. ,  VASCHENKO, Georgiy

Inventor： VASCHENKO, Georgiy

IPC: A61N5/06

CPC classification number: G03F7/70033 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO 2 laser, producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation. For the device, the droplet source may comprise a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing at least some adjacent droplet pairs to coalesce together prior to reaching the irradiation region, hi one implementation, the disturbance may comprise a frequency modulated disturbance waveform and in another implementation, the disturbance may comprise an amplitude modulated disturbance waveform.

Abstract translation: 公开了一种具有目标材料液滴源的等离子体产生系统，例如， 锡滴和激光，例如。 脉冲CO 2激光器，产生在照射区域照射液滴的光束，产生等离子体产生EUV辐射。 对于装置，液滴源可以包括离开孔的流体和产生流体中的扰动的子系统，其产生具有不同初始速度的液滴，导致至少一些相邻的液滴对在到达照射区域之前聚结在一起。 一个实现方式，干扰可以包括频率调制干扰波形，并且在另一实现中，干扰可以包括幅度调制干扰波形。