公开(公告)号：WO2004012308A3

公开(公告)日：2004-07-15

申请号：PCT/US0324146

申请日：2003-07-30

Applicant: CYMER INC ,  FALLON JOHN P ,  RULE JOHN A ,  JACQUES ROBERT N ,  LIPCON JACOB P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ERSHOV ALEXANDER I ,  ISHIHARA TOSHIHIKO ,  MEISNER JOHN ,  NESS RICHARD M ,  MELCHER PAUL C

Inventor： FALLON JOHN P ,  RULE JOHN A ,  JACQUES ROBERT N ,  LIPCON JACOB P ,  SANDSTROM RICHARD L ,  PARTLO WILLIAM N ,  ERSHOV ALEXANDER I ,  ISHIHARA TOSHIHIKO ,  MEISNER JOHN ,  NESS RICHARD M ,  MELCHER PAUL C

IPC: H01S20060101 ,  H01S3/036 ,  H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet. In preferred embodiments, the laser is a production line machine with a master oscillator (10) producing a very narrow band seed beam which is amplified (12) in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线的控制系统。 在优选实施例中，激光器是具有主振荡器（10）的生产线机器，其产生非常窄的带子种子束，其在第二放电室中被放大（12）。 特别适用于双室气体放电激光系统的新型控制特征包括（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度 控制和（4）F2注射控制与新的学习算法。

公开(公告)号：WO2003011595A3

公开(公告)日：2003-02-13

申请号：PCT/US2002/022190

申请日：2002-07-11

Applicant: CYMER, INC. ,  SPANGLER, Ronald, L. ,  LIPCON, Jacob, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  KROYAN, Armen ,  LALOVIC, Ivan ,  FOMENKOV, Igor, V. ,  ALGOTS, John, M.

Inventor： SPANGLER, Ronald, L. ,  LIPCON, Jacob, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  KROYAN, Armen ,  LALOVIC, Ivan ,  FOMENKOV, Igor, V. ,  ALGOTS, John, M.

IPC: H01S3/10

Abstract: An integrated circuit lithography technique called (spectral engineering for bandwidth control of an electric discharge laser. A computer models lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism (104) adjusts the center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment (106) is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. A wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser.

公开(公告)号：WO2005060623A2

公开(公告)日：2005-07-07

申请号：PCT/US2004/041384

申请日：2004-12-10

Applicant: CYMER, INC. ,  RULE, John, A. ,  ZAMBON, Paulo

Inventor： RULE, John, A. ,  ZAMBON, Paulo

IPC: H01S3/134 ,  H01S3/22 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/225 ,  H01S3/134 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2366

Abstract: A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a coordinate system having at least two coordinates, each coordinate comprising a selected variable representing an operating parameter of the oscillator or the amplifier; tracking a multidimensional operating point in the multidimensional variable state space according to the variation of the selected variables in either or both of the oscillator or the amplifier to determine the position of the multidimensional operating point in the multidimensional state space; determining from the position of the multidimensional operating point in the multidimensional operating space a region from a plurality of defined regions in the multidimensional operating space in which the multidimensional operating point is located and identifying the region.

Abstract translation: 公开了一种用于控制包括振荡器气体放电激光器和放大器气体放电激光器的二腔气体放电激光器的输出的方法和装置，其可以包括建立包括具有至少两个坐标的坐标系的多维可变状态空间，每个坐标 包括表示振荡器或放大器的工作参数的选定变量; 根据所述振荡器或放大器中的任一个或两者中的所选变量的变化来跟踪所述多维可变状态空间中的多维工作点，以确定所述多维工作点在所述多维状态空间中的位置; 从所述多维操作空间中的所述多维操作区域中的所述多维操作区域中的所述多维操作区域中的所述多维操作区域的位置确定所述多维操作空间中的所述多维操作空间，并识别所述区域。

公开(公告)号：WO2003096492A3

公开(公告)日：2003-11-20

申请号：PCT/US2003/013939

申请日：2003-05-05

Applicant: CYMER, INC. ,  RULE, John, A. ,  HOFMANN, Thomas ,  MORTON, Richard, G. ,  BROWN, Daniel, J., W. ,  FLEUROV, Vladimir, B. ,  TRINTCHOUK, Fedor ,  ISHIHARA, Toshihiko ,  ERSHOV, Alexander, I. ,  WITTAK, Christian, J.

Inventor： RULE, John, A. ,  HOFMANN, Thomas ,  MORTON, Richard, G. ,  BROWN, Daniel, J., W. ,  FLEUROV, Vladimir, B. ,  TRINTCHOUK, Fedor ,  ISHIHARA, Toshihiko ,  ERSHOV, Alexander, I. ,  WITTAK, Christian, J.

IPC: H01S3/22

Abstract: An automatic F 2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor (604) for monitoring the F 2 consumption rates through the operating life of the laser system (4). These consumption rates are used by a processor (604) programmed with an algorithm to determine F 2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F 2 controls for a two-chamber MOPA laser system (5).

公开(公告)号：WO2002088687A1

公开(公告)日：2002-11-07

申请号：PCT/US2002/006249

申请日：2002-03-01

Applicant: CYMER, INC. ,  LUBLIN, Leonard ,  WARKENTIN, David, J. ,  PLETNER, Baruch ,  RULE, John, A.

Inventor： LUBLIN, Leonard ,  WARKENTIN, David, J. ,  PLETNER, Baruch ,  RULE, John, A.

IPC: G01N21/86

CPC classification number: F16F15/02 ,  F16F15/005 ,  F16F15/0275 ,  F16F2230/08 ,  G03F7/70725 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/709

Abstract: A system that provides a base stabilization system for controlling motion of a controlled structure. The system includes a ground structure such as the floor of a fabrication facility and the controlled structure includes a base (405) on which equipment is mounted. The system also includes at least three air mounts (480) and a plurality of actuators (430) all attached to the ground structure and to the base to isolate the base from the ground structure and to stabilize the base. The system includes a plurality of position and acceleration sensors (420) each of which are co-located with a corresponding actuator. The system also includes a multi-input, multi output feedback control system comprising a computer processor programmed with a feedback control algorithm for controlling each of the actuators based on feedback signals from each of the sensors. The co-location of the sensors with the actuators avoids serious problems resulting from higher order vibration modes.

Abstract translation: 提供用于控制受控结构的运动的基本稳定系统的系统。 该系统包括诸如制造设备的底板的接地结构，并且受控结构包括其上安装有设备的基座（405）。 该系统还包括至少三个空气安装件（480）和多个致动器（430），所述致动器全部附接到地面结构和基座，以将基座与地面结构隔离并稳定底座。 该系统包括多个位置和加速度传感器（420），每个位置和加速度传感器与对应的致动器共同定位。 该系统还包括多输入多输出反馈控制系统，其包括用基于来自每个传感器的反馈信号控制每个致动器的反馈控制算法编程的计算机处理器。 传感器与执行器的共同位置避免了由较高阶振动模式引起的严重问题。

公开(公告)号：WO2006076261A2

公开(公告)日：2006-07-20

申请号：PCT/US2006/000603

申请日：2006-01-09

Applicant: CYMER, INC. ,  RULE, John, A. ,  ZAMBON, Paolo ,  WATSON, Tom, A. ,  MESINA, Omez, S. ,  ZHENG, Weijie

Inventor： RULE, John, A. ,  ZAMBON, Paolo ,  WATSON, Tom, A. ,  MESINA, Omez, S. ,  ZHENG, Weijie

IPC: H01S3/22

CPC classification number: H01S3/036 ,  H01S3/097 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/1306 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2366

Abstract: The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.

Abstract translation: 本发明涉及一种氟气放电激光器系统，并且当气体放电激光器工作并且消耗氟时，控制补充氟气。

公开(公告)号：WO2004012308A2

公开(公告)日：2004-02-05

申请号：PCT/US2003/024146

申请日：2003-07-30

Applicant: CYMER, INC. ,  FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

Inventor： FALLON, John, P. ,  RULE, John, A. ,  JACQUES, Robert, N. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L. ,  PARTLO, William, N. ,  ERSHOV, Alexander I. ,  ISHIHARA, Toshihiko ,  MEISNER, John ,  NESS, Richard, M. ,  MELCHER, Paul, C.

IPC: H01S

CPC classification number: H01S3/2333 ,  H01S3/036 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2366

Abstract: The present invention provides a control system for a modular high repetition rate two discharge chamber ultra violet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F 2 injection controls with novel learning algorithm.

Abstract translation: 本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。 在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。 特别适用于双室气体放电激光系统的新型控制功能包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体 温度控制和（4）F2注入控制与新的学习算法。

公开(公告)号：WO2003096492A2

公开(公告)日：2003-11-20

申请号：PCT/US2003/013939

申请日：2003-05-05

Applicant: CYMER, INC. ,  RULE, John, A. ,  HOFMANN, Thomas ,  MORTON, Richard, G. ,  BROWN, Daniel, J., W. ,  FLEUROV, Vladimir, B. ,  TRINTCHOUK, Fedor ,  ISHIHARA, Toshihiko ,  ERSHOV, Alexander, I. ,  WITTAK, Christian, J.

Inventor： RULE, John, A. ,  HOFMANN, Thomas ,  MORTON, Richard, G. ,  BROWN, Daniel, J., W. ,  FLEUROV, Vladimir, B. ,  TRINTCHOUK, Fedor ,  ISHIHARA, Toshihiko ,  ERSHOV, Alexander, I. ,  WITTAK, Christian, J.

IPC: H01S

CPC classification number: H01S3/225 ,  G03F7/70025 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/2258 ,  H01S3/2333

Abstract: An automatic F 2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F 2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F 2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F 2 controls for a two-chamber MOPA laser system.

Abstract translation: 自动F2激光气体控制，用于模块化高重复率紫外线气体放电激光器。 激光气体控制包括技术，监视器和处理器（604），用于在激光系统（4）的使用寿命期间监测F2消耗速率。 这些消耗速率由编程有算法的处理器（604）使用以确定在输送范围内保持激光束质量所需的F2注射。 优选实施例包括用于双室MOPA激光系统（5）的F2控制。

公开(公告)号：WO2006076261A3

公开(公告)日：2007-04-19

申请号：PCT/US2006000603

申请日：2006-01-09

Applicant: CYMER INC ,  RULE JOHN A ,  ZAMBON PAOLO ,  WATSON TOM A ,  MESINA OMEZ S ,  ZHENG WEIJIE

Inventor： RULE JOHN A ,  ZAMBON PAOLO ,  WATSON TOM A ,  MESINA OMEZ S ,  ZHENG WEIJIE

IPC: H01S3/22 ,  H01S3/134 ,  H01S3/225 ,  H01S3/23

CPC classification number: H01S3/036 ,  H01S3/097 ,  H01S3/10069 ,  H01S3/104 ,  H01S3/1306 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2258 ,  H01S3/2308 ,  H01S3/2366

Abstract: The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine.

Abstract translation: 本发明涉及一种氟气放电激光器系统，并且当气体放电激光器工作并且消耗氟时，控制补充氟气。

公开(公告)号：WO2002069461A1

公开(公告)日：2002-09-06

申请号：PCT/US2002/004623

申请日：2002-02-15

Applicant: CYMER, INC. ,  SPANGLER, Ronald, L. ,  JACQUES, Robert, N. ,  RULE, John, A. ,  PALENSCHAT, Frederick, A. ,  FOMENKOV, Igor, V. ,  ALGOTS, John, M. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L.

Inventor： SPANGLER, Ronald, L. ,  JACQUES, Robert, N. ,  RULE, John, A. ,  PALENSCHAT, Frederick, A. ,  FOMENKOV, Igor, V. ,  ALGOTS, John, M. ,  LIPCON, Jacob, P. ,  SANDSTROM, Richard, L.

IPC: H01S3/10

CPC classification number: G03F7/70575 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70933 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/08036 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/1312 ,  H01S3/134 ,  H01S3/137 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225

Abstract: An electric discharge laser (34) with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system (104) and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide fast feedback control based on wavelength measurements, fast vibration control, active damping using the load cell and an active damping module (320), and transient inversion using feed forward algorithms based on historical burst data.

Abstract translation: 具有快速波长校正的放电激光器（34）。 快速波长校正设备包括至少一个压电驱动器和快速波长测量系统（104）和快速反馈响应时间。 在优选实施例中，提供设备以在从大约1到5毫秒的中间时间和几微秒的非常快的时间帧上在几毫秒的慢时间帧上控制波长。 优选的技术包括相对较慢的步进电机和非常快的压电驱动器的组合，用于使用调谐镜来调谐激光波长。 非常快的波长控制与压电驱动器组合地设置有压电测力传感器。 优选实施例提供基于波长测量，快速振动控制，使用负载传感器的主动阻尼和主动阻尼模块（320）的快速反馈控制，以及使用基于历史突发数据的前馈算法的瞬态反转。