公开(公告)号：WO02098175A3

公开(公告)日：2003-02-20

申请号：PCT/DE0201384

申请日：2002-04-13

Applicant: GERSTENDOERFER-HART BARBARA ,  ACKERMANN GUNTHER

Inventor： GERSTENDOERFER-HART BARBARA ,  ACKERMANN GUNTHER

IPC: B01J19/12 ,  H01L21/00 ,  H05B3/00

CPC classification number: B01J19/128 ,  B01J2219/0879 ,  H01L21/67115 ,  H05B3/0047 ,  H05B2203/032

Abstract: The invention relates to a device for heating substrates with an emitter (1) for the emission of electromagnetic radiation (6) in a wavelength range of 200 nm to 10000 nm and with a primary reflector (2), wherein the cross section of the primary reflector or reflectors (2) is configured in the form of a polyline or a curve and wherein one or more screens (3) and/or secondary reflectors (9) are provided in the following area between the emitter (1) and the substrate (5) to be irradiated or on one or both sides of said area or totally or partly surrounding said area, the cross section of said screens and reflectors being configured in the form of a polyline or curve, wherein energy distribution of the radiation (6, 7) striking the substrate (5) is, to a very large extent, homogeneous.

Abstract translation: 本发明涉及一种用于基片的加热装置具有发射器（1），用于发射电磁辐射（6）在波长范围为200nm至10000纳米，并用一个初级反射器（2），其中，所述一个或多个主反射器（2） 横截面形成为多边形或曲线的形状，并且其中在所述发射器（1）和基片之间的后续区的被照射（5）或一个或该区域的两侧或这些区域完全或部分地旋转一个或多个孔（3 ）和/或形成有横截面为多边形或曲线的形状，其特征在于，所述基板（5）入射的辐射（6,7）是在其能量分布方面很大程度上均匀次级反射器（9）提供。