公开(公告)号：WO2007089216A1

公开(公告)日：2007-08-09

申请号：PCT/US2005/031478

申请日：2005-09-01

Applicant: GOROKHOVSKY, Vladimir, I.

Inventor： GOROKHOVSKY, Vladimir, I.

IPC: C23C14/34

CPC classification number: C23C14/325 ,  C23C4/134 ,  C23C4/137 ,  C23C14/0605 ,  C23C14/0641 ,  C23C14/14 ,  C23C14/22 ,  C23C14/48 ,  C23C16/34 ,  C23C16/50 ,  H01J37/32009 ,  H01J37/32055 ,  H01J37/3266 ,  H01J37/32706

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In some embodiments a bi-polar pulsed DC power supply having input and output terminals and a switching circuit alternately switches a direction of current applied to the substrate holder, to prevent the formation of micro-arcs on the substrate surface.

Abstract translation: 一种用于在真空中施加涂层的装置，包括由与第一等离子体源连通的磁偏转系统和涂覆室围绕的等离子体管道，其中衬底保持器布置在等离子体源的光轴之外，至少具有 一个偏转电极安装在等离子体管道的一个或多个壁上。 在一些实施例中，具有输入和输出端子和开关电路的双极性脉冲DC电源交替地切换施加到衬底保持器的电流的方向，以防止在衬底表面上形成微弧。

公开(公告)号：WO2005040451A1

公开(公告)日：2005-05-06

申请号：PCT/US2004/030603

申请日：2004-09-17

Applicant: GOROKHOVSKY, Vladimir, I.

Inventor： GOROKHOVSKY, Vladimir, I.

IPC: C23C14/32

CPC classification number: H01J37/32055 ,  C23C14/0605 ,  C23C14/0641 ,  C23C14/0647 ,  C23C14/325 ,  H01J37/32614 ,  H01J37/32623 ,  H01J37/3266

Abstract: The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors (62, 64, 66, 68) disposed along the short sides (32c, 32d) of a rectangular target (32) behind the target, and a magnetic focusing system disposed along the long sides (32a, 32b) of the target (32) in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides (32a, 32b) of the target (32). The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor (62, 64, 66, 68) can be controlled independently. In a further embodiment, electrically independent steering conductors (62, 64, 66, 68) are disposed along opposite long sides (32a, 32b) of the cathode plate (32), and by selectively varying a current through one conductor, the path of the arc spot shifts to widen the erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow.

Abstract translation: 本发明提供了一种具有转向磁场源的电弧涂覆装置，该转向磁场源包括沿靶材后面的矩形靶材（32）的短边（32c，32d）设置的转向导体（62,64,66,68） 所述系统沿着所述目标（32）前方的所述目标（32）的长边（32a，32b）设置在所述目标（32）的相对的长边（32a，32b）上产生的磁场之间限制所述等离子体的流动。 等离子体聚焦系统可用于使等离子体流离开阴极的工作轴线。 每个转向导体（62,64,66,68）可以独立地控制。 在另一个实施例中，电独立的导向导体（62,64,66,68）沿着阴极板（32）的相对的长边（32a，32b）设置，并且通过选择性地改变通过一个导体的电流， 弧线转移以扩大侵蚀走廊。 本发明还提供多个内部阳极，以及可选地用于偏转等离子体流的周围阳极。

公开(公告)号：WO0062327A3

公开(公告)日：2001-01-18

申请号：PCT/CA0000380

申请日：2000-04-07

Applicant: GOROKHOVSKY VLADIMIR I

Inventor： GOROKHOVSKY VLADIMIR I

IPC: C23C14/32 ,  C23C14/24 ,  H01J37/32

CPC classification number: C23C14/24 ,  C23C14/32 ,  H01J37/32

Abstract: The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors disposed along the short sides of a rectangular target behind the target, and a magnetic focusing system disposed along the long sides of the target in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides of the target. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor can be controlled independently. In a further embodiment, electrically independent steering conductors are disposed along opposite long sides of the cathode plate, and by selectively varying a current through one conductor, the path of the arc spot shifts to widen an erosion corridor. The invention further provides correcting magnets adjacent to the short sides of the target, to move the arc spot between the long sides.

Abstract translation: 本发明提供一种电弧涂覆装置，其具有转向磁场源，该转向磁场源包括沿着目标物体后方的矩形目标的短边设置的导向导体，以及沿目标前方的靶的长边设置的磁聚焦系统， 在目标的相对长边上产生的磁场之间的等离子体流动。 等离子体聚焦系统可用于使等离子体流离开阴极的工作轴线。 每个转向导体可以独立控制。 在另一个实施例中，电独立的导向导体沿着阴极板的相对的长边设置，并且通过选择性地改变通过一个导体的电流，电弧点的路径移动以扩大侵蚀走廊。 本发明还提供了与目标的短边相邻的校正磁体，以便在长边之间移动电弧点。