Abstract:
A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like micron-scale topography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process. The external surface may define a plurality of micro-tears proximate the micron-scale topography.
Abstract:
A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like micron-scale topography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process. The external surface may define a plurality of micro-tears proximate the micron-scale topography.