ULTRA CLEAR SCRATCH RESISTANT COATING AND LAMINATE
    3.
    发明申请
    ULTRA CLEAR SCRATCH RESISTANT COATING AND LAMINATE 审中-公开
    超声波清漆防滑涂料和层压板

    公开(公告)号:WO2014055394A1

    公开(公告)日:2014-04-10

    申请号:PCT/US2013/062565

    申请日:2013-09-30

    Abstract: An ultra-clear rub and scratch resistant aqueous based coating that provides barrier properties to film and is receptive to flexo, litho, and gravure printing inks includes polyurethane acrylic hybrid dispersion in combination with melamine formaldehyde resin and micronized wax. The coating composition can be formulated with little or no N-methylpyrrolidone. This coating can be applied to a wide variety of different polymers such as polyesters, metalized polyesters, polyamides, metalized polyamides, biaxially oriented polypropylene, and others.

    Abstract translation: 提供对薄膜的屏障性能并且可接受柔版印刷,光刻和凹版印刷油墨的超清洁的耐擦擦擦和耐水性涂层包括与三聚氰胺甲醛树脂和微粉化蜡组合的聚氨酯丙烯酸混合分散体。 涂料组合物可以很少或不用N-甲基吡咯烷酮配制。 该涂层可以应用于各种不同的聚合物,例如聚酯,金属化聚酯,聚酰胺,金属化聚酰胺,双轴取向聚丙烯等。

    LOW ETCH PIT DENSITY (EPD) SEMI-INSULATING III-V WAFER
    7.
    发明申请
    LOW ETCH PIT DENSITY (EPD) SEMI-INSULATING III-V WAFER 审中-公开
    低密度密度(EPD)半绝缘III-V波形

    公开(公告)号:WO2013023194A1

    公开(公告)日:2013-02-14

    申请号:PCT/US2012/050480

    申请日:2012-08-10

    CPC classification number: C30B11/00 C30B29/42 H01L21/3228 Y10T428/24372

    Abstract: Systems and method of manufacturing wafers are disclosed using a low EPD crystal growth process and a wafer annealing process are provided resulting in III-V/GaAs wafers that provide higher device yields from the wafer. In one exemplary implementation, there is provided a method of manufacturing a group III based material with a low etch pit density (EPD). Moreover, the method includes forming polycrystalline group III based compounds, and performing vertical gradient freeze crystal growth using the polycrystalline group III based compounds. Other exemplary implementations may include controlling temperature gradients(s) during formation of the group III based crystal to provide very low etch pit density.

    Abstract translation: 使用低EPD晶体生长工艺公开了制造晶圆的系统和方法,并且提供晶片退火工艺,从而提供从晶片提供更高的器件产量的III-V / GaAs晶片。 在一个示例性实施方案中,提供了制造具有低蚀刻坑密度(EPD)的基于III族的材料的方法。 此外,该方法包括形成多晶III族化合物,并使用多晶III族化合物进行垂直梯度冷冻晶体生长。 其它示例性实施方案可包括在形成基于III族的晶体期间控制温度梯度以提供非常低的蚀刻坑密度。

    CMP PAD DRESSER HAVING LEVELED TIPS AND ASSOCIATED METHODS
    8.
    发明申请
    CMP PAD DRESSER HAVING LEVELED TIPS AND ASSOCIATED METHODS 审中-公开
    CMP PAD DRESSER具有水平提示和相关方法

    公开(公告)号:WO2012162430A2

    公开(公告)日:2012-11-29

    申请号:PCT/US2012039199

    申请日:2012-05-23

    Applicant: SUNG CHIEN-MIN

    Inventor: SUNG CHIEN-MIN

    Abstract: ABSTRACT CMP pad dressers having leveled tips and associated methods are provided. In one aspect, for example, a CMP pad dresser can include a matrix layer and a monolayer of a plurality of superabrasive particles embedded in the matrix layer, where each superabrasive particle in the monolayer protrudes from the matrix layer. The difference in the protrusion distance between the highest protruding tip and the next highest protruding tip of the monolayer of superabrasive particles is less than or equal to about 20 microns, and the difference in protrusion distance between the highest 1% of the protruding tips of the monolayer of superabrasive particles are within about 80 microns or less.

    Abstract translation: 摘要提供了具有调平尖端和相关方法的CMP抛光垫修整器。 在一个方面,例如,CMP垫修整器可以包括矩阵层和嵌入基质层中的多个超研磨颗粒的单层,其中单层中的每个超级磨料颗粒从基质层突出。 超级磨料颗粒单层的最高突起尖端和下一个最高突出尖端之间的突出距离之间的差异小于或等于约20微米,并且突出尖端的最高1%之间的突出距离的差异 超研磨颗粒的单层在约80微米以内。

    DESIGN AND MANUFACTURE OF HYDROPHOBIC SURFACES
    9.
    发明申请
    DESIGN AND MANUFACTURE OF HYDROPHOBIC SURFACES 审中-公开
    疏水表面的设计与制造

    公开(公告)号:WO2012138992A3

    公开(公告)日:2012-11-29

    申请号:PCT/US2012032511

    申请日:2012-04-06

    Abstract: Methods of producing hydrophobic surfaces include coating a surface with nanoparticle populations that differ in cross-sectional dimension and are coated with a low surface energy material. Transparent hydrophobic surfaces are disclosed that include functionalized nanoparticles and low surface energy polymers. The surfaces exhibit roughness, hydrophobic or superhydrophobic properties, and/or optical transparency or near-transparency.

    Abstract translation: 生产疏水性表面的方法包括用横截面尺寸不同并涂覆有低表面能材料的纳米颗粒群涂覆表面。 公开了包括官能化纳米颗粒和低表面能聚合物的透明疏水性表面。 表面表现出粗糙度,疏水性或超疏水性,和/或光学透明性或近透明度。

    RELEASE FILM HAVING A ROUGH SURFACE STRUCTURE
    10.
    发明申请
    RELEASE FILM HAVING A ROUGH SURFACE STRUCTURE 审中-公开
    表面粗糙结构离型膜

    公开(公告)号:WO2012110206A3

    公开(公告)日:2012-11-01

    申请号:PCT/EP2012000522

    申请日:2012-02-06

    Inventor: ENGELHARD HEINZ

    Abstract: The present invention relates to a release film having at least one layer (s) based on at least one thermoplastic polymer as matrix polymer, in which solid microparticles having a melting point which is at least 10°C higher than that of the matrix polymer are present in a dispersed manner and of the surfaces of which at least one is provided with a release layer (b) as outer layer based on at least one cured polysiloxane, a use of such a release film as detachable protective and covering film and also a roofing sheet provided with such a release film as detachable protective and covering film.

    Abstract translation: 本发明涉及一种脱模薄膜的至少一个层(一个或多个)基于至少一种热塑性聚合物作为固体微粒的基质聚合物具有分布式作为基质的聚合物是本更高的由至少10℃的熔点,和至少一种(它们与释放层表面 b)基于至少一个固化的聚硅氧烷提供作为外层,使用这样的脱模膜作为剥离性保护和覆盖以及设置有这种剥离薄膜作为剥离性保护和覆盖膜屋顶片材。

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