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    HIGH INTENSITY X-RAY BEAM SYSTEM
    1.
    发明申请
    HIGH INTENSITY X-RAY BEAM SYSTEM 审中-公开
    高强度X射线光束系统

    公开(公告)号：WO2009154967A1

    公开(公告)日：2009-12-23

    申请号：PCT/US2009/045250

    申请日：2009-05-27

    Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC. ,  JIANG, Licai

    Inventor： JIANG, Licai

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K1/062 ,  G21K2201/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064 ,  G21K2201/067

    Abstract: An x-ray optical system for producing high intensity x-ray beams. The system includes an optic with a surface formed by revolving a defined contour around a revolving axis that is different than the geometric symmetric axis of the optic. Accordingly, the system may use a source that has a circular emission profile or a large source to provide increased flux to a sample.

    Abstract translation: 一种用于产生高强度X射线束的X射线光学系统。 该系统包括具有通过围绕不同于光学器件的几何对称轴线的旋转轴线旋转限定轮廓而形成的表面的光学元件。 因此，系统可以使用具有圆形发射轮廓或大的源的源来向样品提供增加的通量。

    MULTI-BEAM X-RAY SYSTEM
    2.
    发明申请
    MULTI-BEAM X-RAY SYSTEM 审中-公开
    多波束X射线系统

    公开(公告)号：WO2011097115A1

    公开(公告)日：2011-08-11

    申请号：PCT/US2011/022724

    申请日：2011-01-27

    Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC ,  VERMAN, Boris ,  YOUNG, Michael ,  JIANG, Licai

    Inventor： VERMAN, Boris ,  YOUNG, Michael ,  JIANG, Licai

    IPC: G21K1/06 ,  H05G1/02

    CPC classification number: G21K1/06 ,  B82Y10/00 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/067

    Abstract: A multi-beam x-ray system includes an x-ray source (24) which emits x-rays and a housing with a first part and a second part. The second part is moveable relative to the first part and includes a plurality of optics (20, 22, 120, 122) of different performance characteristics. Each optic, through the movement of the second part relative to the first part, is positioned to a working position so that the optic receives the x-rays from the x-ray source and directs the x-rays with the desired performance attributes to a desired location (30).

    Abstract translation: 多光束X射线系统包括发射x射线的X射线源（24）和具有第一部分和第二部分的壳体。 第二部分可相对于第一部分移动，并且包括具有不同性能特征的多个光学器件（20,22，120，122）。 每个光学元件通过第二部分相对于第一部分的移动被定位到工作位置，使得光学器件接收来自x射线源的x射线，并将具有所需性能属性的x射线引导到 所需位置（30）。

    X-RAY OPTIC WITH VARYING FOCAL POINTS
    4.
    发明申请
    X-RAY OPTIC WITH VARYING FOCAL POINTS 审中-公开
    X射线光学与变化的关键点

    公开(公告)号：WO2009067305A1

    公开(公告)日：2009-05-28

    申请号：PCT/US2008/079626

    申请日：2008-10-10

    Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC. ,  JIANG, Licai

    Inventor： JIANG, Licai

    IPC: G21K1/06

    CPC classification number: G21K1/062 ,  B82Y10/00

    Abstract: An x-ray optical device (10) delivers an x-ray beam (24, 26) with variable convergence. The convergence or the divergence of the x-ray beams varies over different parts of the reflector (14). The device may include an adjustable aperture (16, 18, 21) to further select the convergence or divergence. The adjustable aperture selects the convergence angle by selectively occluding a portion of the x-ray beams.

    Abstract translation: x射线光学装置（10）以可变会聚传送x射线束（24,26）。 x射线束的会聚或发散在反射器（14）的不同部分上变化。 该装置可以包括可调整孔径（16,18,21），以进一步选择会聚或发散。 可调孔径通过选择性地遮挡一部分X射线束来选择会聚角度。

    TWO-DIMENSIONAL SMALL ANGLE X-RAY SCATTERING CAMERA
    5.
    发明申请
    TWO-DIMENSIONAL SMALL ANGLE X-RAY SCATTERING CAMERA 审中-公开
    二维小角度X射线散射相机

    公开(公告)号：WO2006130182A1

    公开(公告)日：2006-12-07

    申请号：PCT/US2006/000290

    申请日：2006-01-04

    Applicant: OSMIC, INC. ,  JIANG, Licai

    Inventor： JIANG, Licai

    IPC: G01N23/201 ,  G21K1/02

    CPC classification number: G21K1/04 ,  G01N23/20008 ,  G01N23/201

    Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two- dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Q min .

    Abstract translation: 二维X射线散射照相机包括光源，光学元件，检测器和一对准直块。 源发射由光学器件朝向样品反射的x射线束。 检测器检测来自样品的散射，该对准直块位于光学元件和检测器之间以准直该光束。 一个块的底表面基本上平行于另一个块的顶表面，并且块可围绕枢轴相对于梁旋转。 该系统形成在检测器位置处关于主波束轴对称的二维波束，而不管射束如何被准直块准直。 因此，该系统消除了污迹，并且可以用于高分辨率和低Q分钟的各向异性小角度散射。

    A METHOD OF MANUFACTURING PATTERNED X - RAY OPTICAL ELEMENTS
    6.
    发明申请
    A METHOD OF MANUFACTURING PATTERNED X - RAY OPTICAL ELEMENTS 审中-公开
    制作X射线光学元件的方法

    公开(公告)号：WO2013101571A1

    公开(公告)日：2013-07-04

    申请号：PCT/US2012/070450

    申请日：2012-12-19

    Applicant: RIGAKU INNOVATIVE TECHNOLOGIES, INC. ,  EHLERS, Bodo ,  JIANG, Licai

    Inventor： EHLERS, Bodo ,  JIANG, Licai

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G03F1/22

    Abstract: A pulsed laser beam (16) engraves a groove pattern on substrate (18) of material relatively transparent to the laser beam. The grooves (20) of the pattern are filled with a filling material of different density or different electron density. The pattern of grooves filled with material of different density creates a spatial density modulation that forms the basic structure of various optical elements. By adjusting the flux density of the laser beam to exceed a material break-down threshold only in specific locations, the material ablation can be reduced to a diameter smaller than the diameter of the laser beam itself. The grooves fabricated in this manner can be filled with a deformable material under vacuum with subsequent exposure to air pressure or higher pressure. It is also possible to fill the grooves with nanoparticles of different density and secured by heat application or with a coating.

    Abstract translation: 脉冲激光束（16）在与激光束相对透明的材料的基板（18）上雕刻凹槽图案。 图案的凹槽（20）填充有不同密度或不同电子密度的填充材料。 用不同密度的材料填充的凹槽的图案形成了形成各种光学元件的基本结构的空间密度调制。 通过仅在特定位置调整激光束的磁通密度才能超过材料分解阈值，材料消融可以减小到小于激光束自身直径的直径。 以这种方式制造的槽可以在真空下用可变形材料填充，随后暴露于空气压力或更高的压力。 也可以用不同密度的纳米颗粒填充凹槽，并通过加热或涂层来固定。

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