OPTOELECTRONIC DEVICE HAVING A VERY LOW PARASITIC CAPACITANCE AND ITS FABRICATION METHOD
    3.
    发明申请
    OPTOELECTRONIC DEVICE HAVING A VERY LOW PARASITIC CAPACITANCE AND ITS FABRICATION METHOD 审中-公开
    具有非常低的PARASIIC电容的光电器件及其制造方法

    公开(公告)号:WO1992019029A1

    公开(公告)日:1992-10-29

    申请号:PCT/FR1992000338

    申请日:1992-04-15

    Inventor: FRANCE TELECOM

    CPC classification number: H01S5/227 H01S5/2275

    Abstract: The optoelectronic device is comprised of an n-doped semi-conductor substrate layer (46); on the substrate layer, a lateral confinement layer (50) of semi-conductor material and doped so as to be semi-insulating; a strip (30) comprising an active material (32), said strip being buried in the lateral confinement layer and in contact with the substrate layer, the lateral confinement layer having a groove (52) cut above and along the strip; an n-doped semi-contactor insulating layer (70) deposited on either side of the groove on the lateral confinement layer; a p-doped semi-conductor vertical confinement layer (60) deposited on the insulating layer and filling the groove, the insulating layer being made of a material whose composition is different from that of the lateral and vertical confinement layers; a first electric contact connector (80, 90) on the vertical confinement layer at least to the vertical of strip (30), and a second electric contact connector (44) on the substrate layer.

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