Abstract:
A waveguide heterostructure (0) for a semiconductor laser with an active part (I), comprising an active region layer (3) depending of the type of semiconductor used, surrounded in direction of a growth axis (G) by at least an active part bottom cladding (30) and an active part top cladding (31), wherein the active part (I) is sandwiched between an electrode layer (1) and a substrate (2), usable for dispersion compensation in a semiconductor laser frequency comb setup, should be optimized in order to lower the group velocity dispersion in a broad spectral range. This is reached by introducing a passive part (II), comprising at least a intercladding layer (40) and a passive top cladding (41) surrounding a passive core layer (4) inserted into the sandwich between substrate (2) and electrode layer (1) in direction of a growth axis (G) on top or below the active part (I), wherein the intercladding layer (40), passive part top cladding (41) and passive core layer (4) are semiconductors and the refractive indices of active region layer (3, (n(3)) and passive core layer (4, (n(4)) are greater than refractive indices of intercladding layer (40, n(40)) and passive part top cladding (41, n(41)).
Abstract:
Broadband travelling wave semiconductor optical amplifier (100, 200, 300, 400, 800) for amplification of light, wherein the amplifier (100, 200, 300, 400, 800) comprises a waveguide region (101, 201, 301, 401, 801) for providing confinement of the light in transverse directions and adapted for propagation of the light in at least a first mode along a longitudinal axis (102, 202, 302) of the amplifier (100, 200, 300, 400, 800) in a propagation direction (103, 203, 303), and wherein the waveguide region (101, 201, 301, 401, 801) comprises a gain region (104, 204, 304, 404, 804) for amplifying the light and an outer region (105, 205, 305, 405, 805), the waveguide region (101, 201, 301, 401, 801) having a width (106, 206, 306) and a height, and the gain region (104, 204, 304, 404, 804) having a width (107, 207, 307) and a height, wherein the width (106, 206, 306) of the waveguide region (101, 201, 301, 401, 801) increases along the longitudinal axis (102, 202, 302), and wherein the ratio between the width (106, 206, 306) of the waveguide region (101, 201, 301, 401, 801) and the width (107, 207, 307) of the gain region (104, 204, 304, 404, 804) increases along the longitudinal axis (102, 202, 302).
Abstract:
The invention relates to an optoelectronic semiconductor element which comprises a semiconductor base (1) having a surface-emitting vertical emitter zone (2) comprising a vertical emitter layer (3), at least one pump source (4) adapted to optically pump the vertical emitter layer (3), and a radiation exit surface (26) through which the electromagnetic radiation (31) produced in the vertical emitter layer exits the semiconductor base (1), the pump source (4) and the vertical emitter layer (3) being interspaced in the vertical direction.
Abstract:
Systems and methods for extending a linear range of a semiconductor optical amplifier (SOA). A feedback layer is included in an SOA. The optical mode of the SOA is distributed between the feedback layer and the active region. As output optical power increases, the mode confinement of the active region increases and the mode is drawn from the feedback layer into the active region. The increase in the mode confinement offsets a loss of material gain such that the linear range of the SOA is extended. In one embodiment, the modal gain increases an higher output optical powers.
Abstract:
The device is an optoelectronic device or transparent waveguide device that comprises a growth surface (122), a growth mask (132), an optical waveguide core mesa (140) and a cladding layer (160). The growth mask is located on the growth surface and defines an elongate growth window (134). The optical waveguide core mesa is located in the growth window and has a trapezoidal cross-sectional shape. The cladding layer covers the optical waveguide core mesa and extends over at least part of the growth mask. Such devices are fabricated by providing a wafer (110) comprising a growth surface (122), growing an optical waveguide core mesa (140) on the growth surface by micro-selective area growth at a first growth temperature and covering the optical waveguide core mesa with cladding material (160) at a second growth temperature, lower than the first growth temperature.