公开(公告)号：WO2011041418A2

公开(公告)日：2011-04-07

申请号：PCT/US2010050728

申请日：2010-09-29

Applicant: VARIAM SEMICONDUCTOR EQUIPMENT ASSOCIATES INC ,  FISH ROGER B ,  KRAMPERT JEFFREY E

Inventor： FISH ROGER B ,  KRAMPERT JEFFREY E

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/022 ,  H01J2237/2001

Abstract: In an ion implanter, one or more optica! heaters are disposed above a pair of support arms, The support arms have an engaged positioned which is disposed beneath a platen and a retractable position displaced vertically away from the platen and rotated away from the platen in a direction parallel to a pianar surface thereof. When the support arms are in the retracted position, the one or more opticai heaters is configured to provide optica! energy Incident on surfaces of the cooiing pads disposed on the support arms for removal of unwanted materials thereon. In this manner, the optical heaters are used during a regeneration cycie of cryogenic surfaces in an ion implanter.

Abstract translation: 在离子注入机中，一个或多个光学元件！ 加热器布置在一对支撑臂上方。支撑臂具有设置在台板下面的接合定位和垂直远离台板移位的可伸缩位置，并沿平行于其表面的方向远离台板旋转。 当支撑臂处于缩回位置时，一个或多个光学加热器被配置为提供光学元件。 能量在设置在支撑臂上的冷却垫的表面上发生入射，以去除其上的不需要的材料。 以这种方式，在离子注入机中低温表面的再生循环期间使用光学加热器。

公开(公告)号：WO2011084489A1

公开(公告)日：2011-07-14

申请号：PCT/US2010/060520

申请日：2010-12-15

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  FISH, Roger, B. ,  KRAMPERT, Jeffrey, E.

Inventor： FISH, Roger, B. ,  KRAMPERT, Jeffrey, E.

IPC: H01L21/00

CPC classification number: H01L21/67213 ,  H01L21/67115 ,  H01L21/67196

Abstract: A vacuum assembly used for warming processed substrates above the dew point to prevent unwanted moisture on the processed substrate surfaces as well as reducing negative impact on manufacturing throughput The vacuum assembly includes a processing chamber, a substrate handling robot, and a heater which may be an optical heater. The processing chamber is configured to cryogenically process one or more substrates. The transfer chamber is connected to the processing chamber and houses the substrate handling robot. The substrate handling robot is configured to displace one or more substrates from the processing chamber to the transfer chamber. The heater is connected to the transfer chamber above the substrate handling robot such that the heater emits energy incident on the substrate when the substrate handling robot displaces the substrate in the transfer chamber.

Abstract translation: 一种真空组件，用于将处理过的基材加热到露点以上，以防止处理的基材表面上的不希望的湿气，以及减少对制造通量的负面影响。真空组件包括处理室，基材处理机器人和加热器，其可以是 光学加热器 处理室被配置为低温处理一个或多个基板。 传送室连接到处理室并容纳基板处理机器人。 衬底处理机器人构造成将一个或多个衬底从处理室移动到传送室。 加热器连接到基板处理机器人上方的传送室，使得当基板处理机器人移动传送室中的基板时，加热器发射入射到基板上的能量。

公开(公告)号：WO2011041418A9

公开(公告)日：2011-05-26

申请号：PCT/US2010050728

申请日：2010-09-29

Applicant: VARIAM SEMICONDUCTOR EQUIPMENT ASSOCIATES INC ,  FISH ROGER B ,  KRAMPERT JEFFREY E

Inventor： FISH ROGER B ,  KRAMPERT JEFFREY E

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/20 ,  H01J2237/022 ,  H01J2237/2001

Abstract: In an ion implanter, one or more optica! heaters are disposed above a pair of support arms, The support arms have an engaged positioned which is disposed beneath a platen and a retractable position displaced vertically away from the platen and rotated away from the platen in a direction parallel to a pianar surface thereof. When the support arms are in the retracted position, the one or more opticai heaters is configured to provide optica! energy Incident on surfaces of the cooiing pads disposed on the support arms for removal of unwanted materials thereon. In this manner, the optical heaters are used during a regeneration cycie of cryogenic surfaces in an ion implanter.

公开(公告)号：WO2012036911A1

公开(公告)日：2012-03-22

申请号：PCT/US2011/050140

申请日：2011-09-01

Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  KRAMPERT, Jeffrey, E.

Inventor： KRAMPERT, Jeffrey, E.

IPC: H01L21/68

CPC classification number: H01L21/682 ,  H01J37/20 ,  H01J37/3171 ,  H01J2237/2007 ,  H01J2237/204 ,  H01J2237/31711 ,  H01L21/68 ,  Y10T29/49998

Abstract: A workpiece: support having alignment iea.i»es to a¾w the proper alignment of the shadow mask to the workpiece is: provided. The alignment features include tactile sensors, so as to measure the pressure being applied to each alignment feature. Based on these pressure readings, a determination can be made as to. whether the workpiece is properly aligned with the shadow mask In some embodiments corrective actions may be initiated if a determination is made that the workpiece is not properly aligned.

Abstract translation: 工件：具有对准的支撑件，即：荫罩与工件的正确对准是：提供。 对准特征包括触觉传感器，以便测量施加到每个对准特征的压力。 基于这些压力读数，可以确定。 工件是否与荫罩正确对准。在一些实施例中，如果确定工件未正确对准，则可以启动校正动作。

公开(公告)号：WO2011041418A3

公开(公告)日：2011-04-07

申请号：PCT/US2010/050728

申请日：2010-09-29

Applicant: VARIAM SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. ,  FISH, Roger, B. ,  KRAMPERT, Jeffrey, E.

Inventor： FISH, Roger, B. ,  KRAMPERT, Jeffrey, E.

IPC: H01J37/20 ,  H01J37/02 ,  H01J37/317

Abstract: In an ion implanter, one or more optica! heaters are disposed above a pair of support arms, The support arms have an engaged positioned which is disposed beneath a platen and a retractable position displaced vertically away from the platen and rotated away from the platen in a direction parallel to a pianar surface thereof. When the support arms are in the retracted position, the one or more opticai heaters is configured to provide optica! energy Incident on surfaces of the cooiing pads disposed on the support arms for removal of unwanted materials thereon. In this manner, the optical heaters are used during a regeneration cycie of cryogenic surfaces in an ion implanter.