公开(公告)号：WO2005074576A3

公开(公告)日：2007-02-08

申请号：PCT/US2005002945

申请日：2005-02-01

Applicant: AMERICAN PANEL CORP ,  LG PHILIPS LCD CO LTD ,  DUNN WILLIAM R ,  KWON KEUK-SANG ,  PARK HYOUNG-YOL ,  KANG IN-BYEONG

Inventor： DUNN WILLIAM R ,  KWON KEUK-SANG ,  PARK HYOUNG-YOL ,  KANG IN-BYEONG

IPC: G02F1/1333 ,  G02F1/13 ,  G02F1/133 ,  G02F1/1335 ,  G09G20060101

CPC classification number: G02F1/133382 ,  G02F1/133502 ,  G02F1/133512 ,  G02F2201/50 ,  G02F2202/22

Abstract: A flat panel display having a black mask EMI layer (58) isolated from Vcom (62) and tied to zero potential. The flat panel display has an integral metal heater layer (70) and thermal sensor (82) that are in close proximity to the liquid crystals to provide efficient heating and temperature sensing.

Abstract translation: 一种具有黑色掩模EMI层（58）的平板显示器，其与Vcom（62）隔离并且被绑定到零电位。 平板显示器具有与液晶非常接近的整体金属加热器层（70）和热传感器（82），以提供有效的加热和温度感测。

公开(公告)号：WO2005074577A3

公开(公告)日：2006-02-16

申请号：PCT/US2005002952

申请日：2005-02-01

Applicant: AMERICAN PANEL CORP ,  LG PHILIPS LCD CO LTD ,  DUNN WILLIAM R ,  KWON KEUK-SANG ,  PARK HYOUNG-YOL ,  KANG IN-BYEONG

Inventor： DUNN WILLIAM R ,  KWON KEUK-SANG ,  PARK HYOUNG-YOL ,  KANG IN-BYEONG

IPC: G02F1/13 ,  G02F1/133 ,  G02F1/1333 ,  G02F1/1335 ,  G02F1/1362 ,  G09G20060101

CPC classification number: G02F1/133382 ,  G02F1/133502 ,  G02F1/133512 ,  G02F1/136204 ,  G02F2001/133334 ,  G02F2201/50 ,  G02F2202/22 ,  G02F2203/60

Abstract: A flat panel display (10) having a black mask EMI layer isolated (32) from Vcom and tied to zero potential. The flat panel display (10) has an integral metal heater layer (34) and thermal sensor (82) that are in close proximity to the liquid crystals (14) to provide efficient heating and temperature sensing.

Abstract translation: 一种平板显示器（10），其具有从Vcom隔离（32）并被绑定到零电位的黑色掩模EMI层。 平板显示器（10）具有与液晶（14）非常接近的一体金属加热器层（34）和热传感器（82），以提供有效的加热和温度感测。

公开(公告)号：WO2004055917A3

公开(公告)日：2004-09-02

申请号：PCT/IB0305512

申请日：2003-11-28

Applicant: KONINKL PHILIPS ELECTRONICS NV ,  CHAPMAN JEFFREY A ,  PARK SUNG-IL ,  LG PHILIPS LCD CO LTD

Inventor： CHAPMAN JEFFREY A ,  PARK SUNG-IL

IPC: G03F1/00 ,  H01L21/336 ,  G03F1/14

CPC classification number: H01L29/66765 ,  G02F2001/136236 ,  G03F1/50 ,  Y02P80/30

Abstract: A method of manufacturing a thin film transistor (TFT), comprises a photolithography step, wherein a photopolymer 7 is applied over a metalisation layer 6 and exposed to light through a photomask 8. The photomask 8 is a transparent substrate 9 with one surface partially covered to form transparent 12a, 12b, half-tone 11 and opaque 10a, 10b areas. In order to reduce diffraction effects, half-tone areas 11 are formed using a periodic pattern of opaque and transparent areas, e.g. a checkerboard, grid or parallel lines. The exposed photopolymer is removed, leaving an indented layer of photopolymer 7 and partially uncovering the metalisation layer 6. Following etching of the uncovered metalisation layer 6, the remaining photopolymer layer 7 may be thinned, exposing further portions of the metalisation layer 6 for etching. The photomask 8 may be configured so that a half-tone area is used to define a channel and opaque areas correspond to the positions of source and drain terminals.

Abstract translation: 制造薄膜晶体管（TFT）的方法包括光刻步骤，其中将光聚合物7施加在金属化层6上并通过光掩模8暴露于光。光掩模8是透明基板9，其一个表面部分被覆盖 以形成透明的12a，12b，半色调11和不透明的10a，10b区域。 为了减少衍射效应，使用不透明区域和透明区域的周期性图案形成半色调区域11。 棋盘，网格或平行线。 去除暴露的光聚合物，留下光密聚合物7的凹陷层并部分地露出金属化层6.在蚀刻未覆盖的金属化层6之后，剩余的光聚合物层7可以变薄，暴露金属化层6的另外部分用于蚀刻。 光掩模8可以被配置为使得半色调区域用于限定通道，并且不透明区域对应于源极和漏极端子的位置。