公开(公告)号：WO2004055596A1

公开(公告)日：2004-07-01

申请号：PCT/JP2003/016017

申请日：2003-12-15

Applicant: SHOWA DENKO K. K. ,  KAMATA, Hirotoshi ,  KAMIJO, Masanao ,  ONISHI, Mina

Inventor： KAMATA, Hirotoshi ,  KAMIJO, Masanao ,  ONISHI, Mina

IPC: G03F7/00

CPC classification number: C08K5/3472 ,  C08K5/37 ,  G02F1/133512 ,  G03F7/0007 ,  G03F7/0275 ,  G03F7/031

Abstract: The present invention relates to (1) a photosensitive composition for color filter black matrix resists, containing (A) a binder resin having a carboxyl group, (B) a compound having an ethylenically unsaturated bond, (C) a photopolymerizing initiator, (D) a thiol compound having two or more mercapto-group-containing groups in which carbon atoms at the a-position and/or n-position with respect to the mercapto group have a substituent, and (E) an organic solvent, and having high sensitivity and excellent storage stability; and (2) color filterblack blackmatrix resist containing (1) the photosensitive composition for color filter black matrix resists and a black pigment (F).

Abstract translation: 本发明涉及（1）一种用于滤色器黑底抗蚀剂的感光组合物，其包含（A）具有羧基的粘合剂树脂，（B）具有烯属不饱和键的化合物，（C）光聚合引发剂，（D ）具有两个或多个含巯基的基团的硫醇化合物，其中在α-位和/或n位相对于巯基的碳原子具有取代基，和（E）有机溶剂，并且具有高的 灵敏度和优良的储存稳定性; 和（2）含有（1）<>用于滤色器黑色基质抗蚀剂的光敏组合物和黑色颜料（F）的彩色黑色黑矩阵抗蚀剂。

公开(公告)号：WO2006046736A1

公开(公告)日：2006-05-04

申请号：PCT/JP2005/019959

申请日：2005-10-25

Applicant: SHOWA DENKO K.K. ,  KAMATA, Hirotoshi ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

Inventor： KAMATA, Hirotoshi ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

IPC: C07C323/53 ,  G03F7/004 ,  G03F7/00 ,  B41C1/10

CPC classification number: C07C323/52 ,  C07C2603/18 ,  G03F7/0007 ,  G03F7/031 ,  H05K3/0076 ,  H05K3/287

Abstract: The present invention relates to a thiol compound represented by formula (1) : wherein R 1 , R 2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

Abstract translation: 本发明涉及由式（1）表示的硫醇化合物：其中R 1，R 2和n具有与说明书中相同的含义， 化合物，以及使用它们的光敏组合物和使用该组合物的黑矩阵抗蚀剂组合物，其具有在碱性显影时保持细线图案中线宽的高灵敏度和优异性能，即显影性能优异。

公开(公告)号：WO2004035546A1

公开(公告)日：2004-04-29

申请号：PCT/JP2003/012618

申请日：2003-10-01

Applicant: SHOWA DENKO K. K. ,  KAMATA, Hirotoshi ,  MIZO, Tatsuhiro ,  ONISHI, Mina

Inventor： KAMATA, Hirotoshi ,  MIZO, Tatsuhiro ,  ONISHI, Mina

IPC: C07D233/54

CPC classification number: G03F7/0007 ,  C07D233/88 ,  C08F2/50 ,  G03F7/0275 ,  G03F7/031

Abstract: The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R 1 represents a halogen, and each R 2 represents an optionally substituted C 1-4 alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like.

Abstract translation: 本发明提供下式（1）的新型六芳基联咪唑化合物：其中每个R 1 <代表卤素，并且每个R> 2 <代表任选取代的C 1-4烷基。 本发明的六芳基联咪唑化合物可用作用作抗蚀剂的光聚合组合物中的光自发发生剂，其特征在于低升华热分解产物。 可光聚合组合物可以适当地用作抗蚀剂或用作彩色液晶显示元件，照相机等的滤色器。

公开(公告)号：WO2005103823A1

公开(公告)日：2005-11-03

申请号：PCT/JP2005/008270

申请日：2005-04-22

Applicant: SHOWA DENKO K.K. ,  ISHIGAKI, Satoru ,  ONISHI, Mina ,  MUROFUSHI, Katsumi ,  MORINAKA, Katsutoshi

Inventor： ISHIGAKI, Satoru ,  ONISHI, Mina ,  MUROFUSHI, Katsumi ,  MORINAKA, Katsutoshi

IPC: G03F7/00

CPC classification number: G03F7/035 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/032

Abstract: The invention provides a photosensitive composition for a black matrix, comprising binder resin (A) which contains a urethane acrylate compound produced by reaction between an isocyanate compound (a-1) represented by formula (1) and a polyhydroxy compound (a-2), CH 2 =CH-COO-R-NCO (1), (wherein R represents a hydrocarbon group having 1 to 30 carbon atoms), black-base pigment (B). The composition may further comprise ethylenic unsaturated monomer (C), photopolymerization initiator (D) and organic solvent (E). The mass contents of the components other than organic solvent (E) is 10-40 % for binder resin (A), 25-60 % for black-base pigment (B), 5-20 % for ethylenic unsaturated monomer and 2-25 % for photopolymerization initiator (D). By using the composition, a pattern having a thin film property and a high light-shielding property can be easily formed by a photolithography method, and the composition has sufficient sensitivity, resolution, developability, durability and curing speed.

Abstract translation: 本发明提供一种黑色基质用感光性组合物，其含有粘合剂树脂（A），其含有通过式（1）表示的异氰酸酯化合物（a-1）与多羟基化合物（a-2）反应而生成的氨基甲酸酯丙烯酸酯化合物， ，CH 2 = CH-COO-R-NCO（1），（其中R表示碳原子数1〜30的烃基），黑色颜料（B）。 组合物还可以包含烯属不饱和单体（C），光聚合引发剂（D）和有机溶剂（E）。 有机溶剂（E）以外的成分的质量含量对于粘合剂树脂（A）为10-40％，黑色基色素（B）为25-60％，烯属不饱和单体为5-20％，2-25 ％的光聚合引发剂（D）。 通过使用该组合物，可以通过光刻法容易地形成具有薄膜性质和高遮光性的图案，并且该组合物具有足够的灵敏度，分辨率，显影性，耐久性和固化速度。

公开(公告)号：WO2006046733A1

公开(公告)日：2006-05-04

申请号：PCT/JP2005/019955

申请日：2005-10-25

Applicant: SHOWA DENKO K.K ,  KAMATA, Hirotoshi ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

Inventor： KAMATA, Hirotoshi ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

IPC: C07C323/52

CPC classification number: C07C323/52 ,  G03F7/0007 ,  G03F7/031 ,  H05K3/0076 ,  H05K3/287

Abstract: The invention is related to a thiol compound represented by formula (1), production method thereof, and a photosensitive composition and a resist composition for black matrix for color filters which use the thiol compound and are excellent in sensitivity and can keep the line width in patterns unchanged, i. e. attain an excellent developing latitude. (All the symbols have the same meanings as defined in the Description.)

Abstract translation: 本发明涉及由式（1）表示的硫醇化合物及其制备方法以及使用硫醇化合物的感光组合物和用于滤色器的黑色矩阵的抗蚀剂组合物，并且灵敏度优异并且可以将线宽保持在 模式不变，我 即 获得了良好的发展空间。 （所有符号与说明中定义的含义相同）

公开(公告)号：WO2003072614A2

公开(公告)日：2003-09-04

申请号：PCT/JP2003/002219

申请日：2003-02-27

Applicant: SHOWA DENKO K.K. ,  KATOH, Tsuyoshi ,  KAMATA, Hirotoshi ,  ONISHI, Mina

Inventor： KATOH, Tsuyoshi ,  KAMATA, Hirotoshi ,  ONISHI, Mina

IPC: C08F2/00

CPC classification number: G03F7/031 ,  C07C323/52 ,  C08F2/48 ,  C08F2/50 ,  G03F3/106 ,  G03F7/0007 ,  G03F7/0275 ,  Y10S430/117 ,  Y10S430/122 ,  Y10S430/127

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β- position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

Abstract translation: 含有具有含巯基的硫醇化合物的光聚合引发剂组合物，所述硫醇化合物在相对于巯基的α-和/或β-位置的碳原子上具有至少一个取代基，并且光聚合 引发剂; 含有该组合物的光敏组合物; 和用于这些组合物的新型硫醇化合物。 含有本发明的光聚合引发剂组合物的感光性组合物具有高灵敏度和优异的储存稳定性，能够通过提高生产率降低成本。

公开(公告)号：WO2005047346A1

公开(公告)日：2005-05-26

申请号：PCT/JP2004/016505

申请日：2004-11-01

Applicant: SHOWA DENKO K.K. ,  KAMIJO, Masanao ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

Inventor： KAMIJO, Masanao ,  ONISHI, Mina ,  MUROFUSHI, Katsumi

IPC: C08F8/14

CPC classification number: C08F220/32 ,  C08F8/00 ,  C08F8/14 ,  C08F222/1006 ,  C08F290/12 ,  C08F290/126 ,  C08F2800/10 ,  C08F2800/20 ,  C08F2810/30 ,  G03F7/0007 ,  G03F7/0388 ,  C08F220/06 ,  C08F212/00

Abstract: There are provided a novel curable polymer compound of the present invention comprises having a structure represented by the following Formula (I): CH 2 =C(R 1 )COO(R 2 O) n CH 2 CH(OH)CH 2 OOC- wherein R 1 represents a hydrogen atom or a methyl group, R 2 independently has one or more organic residues selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 1, a method of preparing the polymer compound, a radical polymerizable and curable composition using the polymer compound, and a cured product obtained by photo-curing the radical polymerizable and curable composition.

Abstract translation: 提供本发明的新型可固化聚合物化合物，其包含具有由下式（I）表示的结构：CH 2 = C（R 1）COO（R 2 O）n CH 2 CH（OH）CH 2 OOC - ，其中R 1表示氢原子或甲基，R 2独立地具有一个或多个选自亚烷基，支链亚烷基，亚烯基，支链亚烯基，亚环烷基的有机残基 ，亚环烯基和亚芳基，n表示0〜1的整数，高分子化合物的制备方法，使用该高分子化合物的自由基聚合性固化性组合物和通过光固化可自由基聚合的固化物 和可固化组合物。

公开(公告)号：WO2004055597A1

公开(公告)日：2004-07-01

申请号：PCT/JP2003/016174

申请日：2003-12-17

Applicant: SHOWA DENKO K. K. ,  KAMATA, Hirotoshi ,  KAMIJO, Masanao ,  ONISHI, Mina

Inventor： KAMATA, Hirotoshi ,  KAMIJO, Masanao ,  ONISHI, Mina

IPC: G03F7/00

CPC classification number: G03F7/0007 ,  G02F1/133512

Abstract: The present invention provides a carbon black dispersion composition for a color filter black matrix resist composition, containing (A) a carbon black having specified physical properties (average primary particle diameter, concentration of surface carboxyl groups), (B) a copolymer having an amino group and/or its quaternary ammonium salt, and (C) an organic solvent, and a color filter black matrix resist composition that contains the above-mentioned dispersion composition, (D) a binder resin having a carboxyl group, (E) an ethylenically unsaturated monomer, (F) a photopolymerization initiator, and (G) specified multifunctional thiol compound and can easily form a thin film or pattern having high light-shielding property by photolithographic method pattern, has excellent storage stability, and exhibits sufficient sensitivity and resolution.

Abstract translation: 本发明提供一种用于滤色器黑矩阵抗蚀剂组合物的炭黑分散组合物，其含有（A）具有特定物理性质（平均一次粒径，表面羧基浓度）的炭黑，（B）具有氨基 基团和/或其季铵盐，和（C）有机溶剂，以及含有上述分散组合物的滤色器黑矩阵抗蚀剂组合物，（D）具有羧基的粘合剂树脂，（E）烯属 不饱和单体，（F）光聚合引发剂和（G）指定的多官能硫醇化合物，并且可以通过光刻方法图案容易地形成具有高遮光性的薄膜或图案，具有优异的储存稳定性，并表现出足够的灵敏度和分辨率。

公开(公告)号：WO2003072614A3

公开(公告)日：2003-09-04

申请号：PCT/JP2003/002219

申请日：2003-02-27

Applicant: SHOWA DENKO K.K. ,  KATOH, Tsuyoshi ,  KAMATA, Hirotoshi ,  ONISHI, Mina

Inventor： KATOH, Tsuyoshi ,  KAMATA, Hirotoshi ,  ONISHI, Mina

IPC: C08F2/48

Abstract: A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β- position with respect to the mercapto group and a photopolymerization initiator; a photosensitive composition containing the composition; and a novel thiol compound for use in these compositions. The photosensitive composition containing the photopolymerizazion initiator composition of the present invention has high sensitivity and excellent storage stability and enables reduction in cost due by increasing productivity.

公开(公告)号：WO02093255A3

公开(公告)日：2003-05-08

申请号：PCT/JP0204645

申请日：2002-05-14

Applicant: SHOWA DENKO KK ,  KAMATA HIROTOSHI ,  ONISHI MINA ,  KATOH TSUYOSHI ,  MIYAJIMA YOSHIO ,  MUROFUSHI KATSUMI

Inventor： KAMATA HIROTOSHI ,  ONISHI MINA ,  KATOH TSUYOSHI ,  MIYAJIMA YOSHIO ,  MUROFUSHI KATSUMI

IPC: G03F7/00 ,  G03F7/033 ,  G03F7/038 ,  G03C7/00

CPC classification number: G03F7/0007 ,  G03F7/033 ,  G03F7/0388

Abstract: A photosensitive coloring composition for color filters using coloring compositons containd (A) a binder resin having an amido group and a carboxyl group and (B) a coloring material has excellent photosensitivity and has improved dispersibility upon producing in particular a coloring composition containing a black pigment such as a carbon black. Use of (A') an epoxy(meth)acrylate resin can further improve the photosensitivity and from a black matrix having sufficient film strenght and low reflectivity. Furhter, use of a modified carbon black treated with a compound having a isocyanate group and an ethylenically unsaturaged bond in a molecule as the coloring material can give rise to a photosensitive resin composition excellent in optically opaque property, photosensitivity and dispersion stability.

Abstract translation: 使用着色组合物的滤色剂用感光性着色组合物含有（A）具有酰胺基和羧基的粘合剂树脂和（B）着色材料，具有优异的光敏性，并且特别是制备含有黑色颜料的着色组合物时具有改善的分散性 例如炭黑。 （A'）环氧（甲基）丙烯酸酯树脂的使用可以进一步提高光敏性和具有足够的膜强度和低反射率的黑色基质。 另外，使用在分子中用异氰酸酯基和烯属不饱和键化合物处理的改性炭黑作为着色材料可以产生光学不透明性，光敏性和分散稳定性优异的感光性树脂组合物。