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公开(公告)号:WO2023032682A1
公开(公告)日:2023-03-09
申请号:PCT/JP2022/031121
申请日:2022-08-17
Applicant: 富士フイルム株式会社
Inventor: 阪口 彬
Abstract: 支持体、及び、上記支持体上に画像記録層を有し、上記画像記録層が、重合性化合物、及び、重合開始剤、赤外線吸収剤、及び、発色体前駆体を含み、上記発色体前駆体から生成する発色体が、波長380nm以上580nm未満の範囲でありかつ上記発色体前駆体との吸光度差が0.1以上の極大吸収波長と、波長580nm以上750nm以下の範囲でありかつ上記発色体前駆体との吸光度差が0.07以上の極大吸収波長とを有する機上現像型平版印刷版原版、並びに、上記機上現像型平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法。
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公开(公告)号:WO2022132444A1
公开(公告)日:2022-06-23
申请号:PCT/US2021/061520
申请日:2021-12-02
Applicant: EASTMAN KODAK COMPANY
Inventor: OBENAUF, Johannes , BALBINOT, Domenico
Abstract: Lithographic printing plate precursors have an aluminum-containing substrate prepared using two anodizing processes to provide an inner aluminum oxide layer of average dry thickness of 300-3,000 nm and a multiplicity of inner micropores of average inner micropore diameter of ≤100 nm. An outer aluminum oxide layer is provided with a multiplicity of outer micropores of average outer micropore diameter of 15-30 nm and a dry thickness of 30-650 nm. A hydrophilic layer is disposed on the outer aluminum oxide layer at 0.0002-0.1 g/m2 and has a (1) compound having an ethylenically unsaturated polymerizable groups; a -OM group connected directly to a phosphorus atom, wherein M represents a hydrogen, sodium, potassium, or aluminum atom; and (2) one or more hydrophilic polymers having (a) recurring units comprising an amide group, and (b) recurring units having an -OM' group that is directly connected to a phosphorus atom, wherein M' represents a hydrogen, sodium, potassium, or aluminum atom.
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公开(公告)号:WO2022025068A1
公开(公告)日:2022-02-03
申请号:PCT/JP2021/027775
申请日:2021-07-27
Applicant: 富士フイルム株式会社
Abstract: 支持体と、画像記録層と、最外層と、をこの順で有し、上記最外層が、疎水性ポリマーを含む非連続相と水溶性ポリマーを含む連続相からなる海島構造を有する機上現像型平版印刷版原版、並びに、上記機上現像型平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法。
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公开(公告)号:WO2022019217A1
公开(公告)日:2022-01-27
申请号:PCT/JP2021/026683
申请日:2021-07-15
Applicant: 富士フイルム株式会社
IPC: B41N1/14 , B41C1/10 , B41M1/06 , B41N1/08 , B41N3/03 , G03F7/00 , G03F7/004 , G03F7/027 , G03F7/028 , G03F7/029 , G03F7/09 , G03F7/11
Abstract: 波長760nm~900nmの範囲において、極大吸収波長を2つ以上有し、エネルギー密度110mJ/cm2にて波長830nmの赤外線による露光を行った場合の、上記露光を行った部分における上記露光前と上記露光後25℃70%RHの条件にて24時間保管後との明度変化ΔLが、3.0以上である機上現像型平版印刷版原版、並びに、上記機上現像型平版印刷版原版を用いた平版印刷版の作製方法又は平版印刷方法。
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公开(公告)号:WO2021259637A1
公开(公告)日:2021-12-30
申请号:PCT/EP2021/065455
申请日:2021-06-09
Applicant: AGFA OFFSET BV
Inventor: LAZREG, Faïma , LOCCUFIER, Johan , BILLIET, Thomas
IPC: B41C1/10 , B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/12 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22
Abstract: A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound, a photoinitiator and an asymmetrically substituted infrared absorbing compound.
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公开(公告)号:WO2021204502A1
公开(公告)日:2021-10-14
申请号:PCT/EP2021/056760
申请日:2021-03-17
Applicant: AGFA NV
Inventor: BILLIET, Thomas
Abstract: A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound and a photoinitiator, and a toplayer provided above the photopolymerisable layer; characterized in that the toplayer includes a non-polymeric polyfunctional compound in an amount between 2 mg/m² and 80 mg/m² which comprises at least two carboxyl and/or carboxylate groups.
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公开(公告)号:WO2021175571A1
公开(公告)日:2021-09-10
申请号:PCT/EP2021/053583
申请日:2021-02-15
Applicant: AGFA NV
Inventor: BILLIET, Thomas
Abstract: A lithographic printing plate precursor is disclosed including a support and a coating comprising (i) a photopolymerisable layer including a polymerisable compound and a photoinitiator, and a toplayer provided above the photopolymerisable layer; characterized in that the toplayer includes a halogenated polymer and a nitrite and/or nitrate salt.
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公开(公告)号:WO2021077045A1
公开(公告)日:2021-04-22
申请号:PCT/US2020/056190
申请日:2020-10-16
Applicant: NORTHEASTERN UNIVERSITY
Inventor: ABBASI, Salman, A. , CHAI, Zhimin , BUSNAINA, Ahmed
Abstract: A scalable printing process capable of printing microscale and nanoscale features for additively manufacturing electronics is provided. This fast, directed assembly-based approach selectively prints microscale and nanoscale features on both rigid and flexible substrates. The printing speed is much faster than state-of-the- art inkjet and flexographic printing, and the resolution is two orders of magnitude higher, with minimum feature size of 100 nm. Feature patterns can be printed over large areas and require no special limitations on the assembled materials. Hydrophilic/hydrophobic patterns are used to direct deposition of nanomaterials to specific regions or to selectively assemble polymer blends to desired sites in a one- step process with high specificity and selectively. The selective deposition can be based on electrostatic forces, hydrogen bonding, or hydrophobic interactions. The methods and nanoscale patterned substrates can be used with polyelectrolytes, conductive polymers, colloids, and nanoparticles for application in electronics, sensors, energy, medical devices, and structural materials.
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公开(公告)号:WO2021069868A1
公开(公告)日:2021-04-15
申请号:PCT/GB2020/052405
申请日:2020-10-01
Applicant: OXFORD UNIVERSITY INNOVATION LIMITED
Inventor: ASSENDER, Hazel E. , STUART, Bryan W. , FRANCIS, Gemma L.
Abstract: A print head for use in a flexographic process, the print head comprising a flat surface having a first portion with a first surface energy and a second portion with a second surface energy that is different from the first surface energy.
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公开(公告)号:WO2021069540A1
公开(公告)日:2021-04-15
申请号:PCT/EP2020/078203
申请日:2020-10-08
Applicant: XEIKON PREPRESS N.V.
Inventor: WATTYN, Bart Marc Luc
Abstract: Punching station (300) for arranging one or more penetration elements in or through an edge portion of a relief plate precursor (P) or for arranging one or more perforations in the edge portion, comprising: a punching means (10) comprising one or more penetration elements (110) or perforating elements, said punching means being configured for arranging the one or more penetration elements or perforating elements through or in an edge portion of the relief plate precursor; an abutment means (20) aligned with the punching means and configured for forming an abutment for the edge of the relief plate precursor; a detection means (30) configured to detect at two or more locations along the abutment means whether the edge portion of the relief plate precursor is correctly positioned against the abutment means; a signalling means (40) configured to communicate a signal in function of the detection by the detection means.
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