公开(公告)号：WO2008149352A3

公开(公告)日：2010-02-25

申请号：PCT/IL2008000755

申请日：2008-06-04

Applicant: PIXER TECHNOLOGY LTD ,  OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  DVORKIN LEV

Inventor： OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  DVORKIN LEV

IPC: H01S3/00

CPC classification number: A61B18/26 ,  A61B17/3203 ,  A61B2017/32032 ,  A61B2018/263 ,  Y10T137/0391 ,  Y10T137/2191 ,  Y10T137/2196 ,  Y10T137/2207

Abstract: A method for inducing a controllable jet in a transparent liquid is disclosed. The method comprises providing a gas-liquid interface, providing a laser source and generating a beam comprising a sequence of laser pulses, and focusing the beam to a target location within the liquid at a predetermined distance from the gas-liquid interface and creating a plurality of cavitation bubbles, yielding a jet directed away from the gas-liquid interface. Other methods and apparatus are also described and claimed.

Abstract translation: 公开了一种用于在透明液体中诱导可控射流的方法。 该方法包括提供气 - 液界面，提供激光源并产生包括一系列激光脉冲的光束，并将光束聚焦到液体内的目标位置，距离气 - 液界面预定距离，并产生多个 的空化气泡，产生远离气 - 液界面的射流。 还描述和要求保护其它方法和装置。

公开(公告)号：WO2008149352A2

公开(公告)日：2008-12-11

申请号：PCT/IL2008/000755

申请日：2008-06-04

Applicant: PIXER TECHNOLOGY LTD. ,  OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  DVORKIN, Lev

Inventor： OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  DVORKIN, Lev

IPC: G05D7/06

CPC classification number: A61B18/26 ,  A61B17/3203 ,  A61B2017/32032 ,  A61B2018/263 ,  Y10T137/0391 ,  Y10T137/2191 ,  Y10T137/2196 ,  Y10T137/2207

Abstract: A method for inducing a controllable jet in a transparent liquid is disclosed. The method comprises providing a gas-liquid interface, providing a laser source and generating a beam comprising a sequence of laser pulses, and focusing the beam to a target location within the liquid at a predetermined distance from the gas-liquid interface and creating a plurality of cavitation bubbles, yielding a jet directed away from the gas-liquid interface. Other methods and apparatus are also described and claimed.

Abstract translation: 公开了一种用于在透明液体中诱导可控射流的方法。 该方法包括提供气 - 液界面，提供激光源并产生包括一系列激光脉冲的光束，并将光束聚焦到液体内的目标位置，距离气 - 液界面预定距离，并产生多个 的空化气泡，产生远离气 - 液界面的射流。 还描述和要求保护其它方法和装置。

公开(公告)号：WO2012103933A1

公开(公告)日：2012-08-09

申请号：PCT/EP2011/051374

申请日：2011-02-01

Applicant: CARL ZEISS SMT GMBH ,  PIXER TECHNOLOGY LTD. ,  MENGEL, Markus ,  STICKEL, Franz-Josef ,  WEGMANN, Ulrich ,  DÖRBAND, Bernd ,  OSHEMKOV, Sergey

Inventor： MENGEL, Markus ,  STICKEL, Franz-Josef ,  WEGMANN, Ulrich ,  DÖRBAND, Bernd ,  OSHEMKOV, Sergey

IPC: B23K26/00 ,  G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70591 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/52 ,  G03F1/60 ,  G03F1/72 ,  G03F7/70316

Abstract: The invention relates to a method for correcting a local surface defect (430, 440, 530, 540) of a reflective optical element (170, 171, 172, 173, 74, 175, 200, 300, 400, 500, 700, 800) of an extreme ultraviolet lithography system (100) comprises the steps of analyzing the local surface defect (430, 440, 530, 540), correcting the local surface defect (430, 440, 530, 540) by focusing femto- or picosecond light pulses of a laser system (600) onto positions of the local surface defect (430, 440, 530, 540), and verifying that a wave front sensor (190) associated with the extreme ultraviolet lithography system (100) can no longer detect the local surface defect (430, 440, 530, 540).

Abstract translation: 本发明涉及一种校正反射光学元件（170,171,172,173,74,175,200,300,400,500,700,800）的局部表面缺陷（430,440,530,540）的方法， ）包括以下步骤：通过聚焦毫微微秒或皮秒光来分析局部表面缺陷（430,440,530,540），校正局部表面缺陷（430,440,530,540） 激光系统（600）的脉冲到局部表面缺陷（430,440,530,540）的位置，并且验证与极紫外光刻系统（100）相关联的波前传感器（190）不能再检测到 局部表面缺陷（430,440,530,540）。

公开(公告)号：WO2007039895A3

公开(公告)日：2007-04-12

申请号：PCT/IL2006/001127

申请日：2006-09-26

Applicant: PIXER TECHNOLOGY LTD ,  ZAIT, Eitan ,  OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  BEN-ZVI, Guy ,  KRUGLYAKOV, Vladimir

Inventor： ZAIT, Eitan ,  OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  BEN-ZVI, Guy ,  KRUGLYAKOV, Vladimir

IPC: A61N5/00

Abstract: A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

公开(公告)号：WO2009122417A3

公开(公告)日：2010-03-18

申请号：PCT/IL2009000374

申请日：2009-04-05

Applicant: PIXER TECHNOLOGY LTD ,  OSHEMKOV SERGEY ,  DVORKIN LEV ,  DMITRIEV VLADIMIR

Inventor： OSHEMKOV SERGEY ,  DVORKIN LEV ,  DMITRIEV VLADIMIR

IPC: G01N21/01

CPC classification number: G02B21/32 ,  A61B18/26 ,  A61B2018/263

Abstract: A method for producing, trapping and manipulating a gas microbubble in liquid is disclosed. The method includes providing a pulsed laser source for generating a pulsed laser radiation and focusing optics; and focusing a pulsed laser radiation to a focal zone within the liquid, with energy exceeding the threshold of optical breakdown in the liquid at the focal zone. It is also suggested to use focusing optics to focus the laser beam to a focal point at a depth close to the compensation depth of the focusing optics for spherical aberration.

Abstract translation: 公开了一种用于在液体中产生，捕获和操纵气体微泡的方法。 该方法包括提供用于产生脉冲激光辐射和聚焦光学器件的脉冲激光源; 并且将脉冲激光辐射聚焦到液体内的聚焦区域，其能量超过在聚焦区域处的液体中光学击穿的阈值。 还建议使用聚焦光学器件将激光束聚焦到靠近聚焦光学器件的补偿深度的球面像差处的焦点。

公开(公告)号：WO2009122417A2

公开(公告)日：2009-10-08

申请号：PCT/IL2009/000374

申请日：2009-04-05

Applicant: PIXER TECHNOLOGY LTD. ,  OSHEMKOV, Sergey ,  DVORKIN, Lev ,  DMITRIEV, Vladimir

Inventor： OSHEMKOV, Sergey ,  DVORKIN, Lev ,  DMITRIEV, Vladimir

IPC: G02B26/02

CPC classification number: G02B21/32 ,  A61B18/26 ,  A61B2018/263

Abstract: A method for producing, trapping and manipulating a gas microbubble in liquid is disclosed. The method includes providing a pulsed laser source for generating a pulsed laser radiation and focusing optics; and focusing a pulsed laser radiation to a focal zone within the liquid, with energy exceeding the threshold of optical breakdown in the liquid at the focal zone. It is also suggested to use focusing optics to focus the laser beam to a focal point at a depth close to the compensation depth of the focusing optics for spherical aberration.

Abstract translation: 公开了一种用于在液体中产生，捕获和操纵气体微泡的方法。 该方法包括提供用于产生脉冲激光辐射和聚焦光学器件的脉冲激光源; 并且将脉冲激光辐射聚焦到液体内的聚焦区域，其能量超过在聚焦区域处的液体中光学击穿的阈值。 还建议使用聚焦光学器件将激光束聚焦到靠近聚焦光学器件的补偿深度的球面像差处的焦点。

公开(公告)号：WO2009007977A3

公开(公告)日：2009-01-15

申请号：PCT/IL2008/000960

申请日：2008-07-10

Applicant: PIXER TECHNOLOGY LTD. ,  BEN-ZVI, Guy ,  ZAIT, Eitan ,  DMITRIEV, Vladimir, J. ,  LABOVITZ, Steven, M. ,  GRAITZER, Erez ,  SHARONI, Ofir

Inventor： BEN-ZVI, Guy ,  ZAIT, Eitan ,  DMITRIEV, Vladimir, J. ,  LABOVITZ, Steven, M. ,  GRAITZER, Erez ,  SHARONI, Ofir

IPC: G03F7/20 ,  G06K9/00

Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.

公开(公告)号：WO2009007977A2

公开(公告)日：2009-01-15

申请号：PCT/IL2008000960

申请日：2008-07-10

Applicant: PIXER TECHNOLOGY LTD ,  BEN-ZVI GUY ,  ZAIT EITAN ,  DMITRIEV VLADIMIR J ,  LABOVITZ STEVEN M ,  GRAITZER EREZ ,  SHARONI OFIR

Inventor： BEN-ZVI GUY ,  ZAIT EITAN ,  DMITRIEV VLADIMIR J ,  LABOVITZ STEVEN M ,  GRAITZER EREZ ,  SHARONI OFIR

CPC classification number: G03F1/84 ,  G01N21/33 ,  G01N21/59 ,  G01N21/958 ,  G01N2021/95676

Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.

Abstract translation: 对于深紫外线辐射至少部分透明的物体的透射率测绘的装置和方法。 该方法包括引导宽带深紫外线辐射以照射物体的连续区域阵列的不同区域; 使用相对于所述辐射源位于所述物体的相对侧上的光学检测器来检测从所述物体出射的宽带深紫外线辐射; 以及处理来自光学检测器的信号，以确定通过对象的连续区域阵列的不同区域的辐射的透射率。

公开(公告)号：WO2007039895A2

公开(公告)日：2007-04-12

申请号：PCT/IL2006001127

申请日：2006-09-26

Applicant: PIXER TECHNOLOGY LTD ,  ZAIT EITAN ,  OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  BEN-ZVI GUY ,  KRUGLYAKOV VLADIMIR

Inventor： ZAIT EITAN ,  OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  BEN-ZVI GUY ,  KRUGLYAKOV VLADIMIR

IPC: G06F19/00

CPC classification number: G03F1/82

Abstract: A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

Abstract translation: 一种用于从掩模版去除软缺陷的方法，所述掩模版包括由对UV照射透明的材料制成的基板，并且具有前表面和后相对表面，所述前表面在吸收器涂层上设置图案，所述软缺陷 位于涂层上，在图案的空间上或在基本上覆盖前表面的防护薄纸巾和掩模版的前表面之间的体积内的另一位置处。 该方法包括接收关于软缺陷位置的信息; 使用脉冲激光源产生脉冲激光束; 并且基于指示脉冲激光束通过掩模版的背表面并进入衬底的信息，并将光束聚焦在邻近软缺陷的位置的衬底内的目标位置上，或者直接在软缺陷的位置上。