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    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE
    4.
    发明申请
    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE 审中-公开

    公开(公告)号：WO2007039895A3

    公开(公告)日：2007-04-12

    申请号：PCT/IL2006/001127

    申请日：2006-09-26

    Applicant: PIXER TECHNOLOGY LTD ,  ZAIT, Eitan ,  OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  BEN-ZVI, Guy ,  KRUGLYAKOV, Vladimir

    Inventor： ZAIT, Eitan ,  OSHEMKOV, Sergey ,  DMITRIEV, Vladimir ,  BEN-ZVI, Guy ,  KRUGLYAKOV, Vladimir

    IPC: A61N5/00

    Abstract: A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

    CRITICAL DIMENSION UNIFORMITY CORRECTION BY SCANNER SIGNATURE CONTROL
    5.
    发明申请
    CRITICAL DIMENSION UNIFORMITY CORRECTION BY SCANNER SIGNATURE CONTROL 审中-公开
    SCANNER签名控制的关键尺寸均匀校正

    公开(公告)号：WO2011104613A1

    公开(公告)日：2011-09-01

    申请号：PCT/IB2011/000366

    申请日：2011-02-23

    Applicant: CARL ZEISS SMS LTD. ,  SHARONI, Ofir ,  DMITRIEV, Vladimir ,  CHASON, Eran ,  BEN-ZVI, Guy ,  VARVARUK, Igor

    Inventor： SHARONI, Ofir ,  DMITRIEV, Vladimir ,  CHASON, Eran ,  BEN-ZVI, Guy ,  VARVARUK, Igor

    IPC: G03F7/20 ,  G03F1/00

    CPC classification number: G01B11/00 ,  G03F1/144 ,  G03F1/48 ,  G03F1/84 ,  G03F7/70625

    Abstract: A contribution to a wafer level critical dimension distribution from a scanner of a lithography system can be determined based on measured wafer level critica dimension uniformity distribution and a contribution to the wafer level critica dimension distribution from a photo mask. Light transmission (104) across the photo mask (162) can be measured, a transmittance variation distribution of the photo mask can be determined, and the contribution to the wafer level critical dimension distribution from the photo mask (162) can be determined (132) based on the transmittance variation distribution of the photo mask.

    Abstract translation: 可以基于测量的晶片级临界尺寸均匀性分布和从光掩模对晶片级临界尺寸分布的贡献来确定对来自光刻系统的扫描仪的晶片级临界尺寸分布的贡献。 可以测量穿过光掩模（162）的光透射（104），可以确定光掩模的透射率变化分布，并且可以确定对光掩模（162）对晶片级临界尺寸分布的贡献（132 ）基于光掩模的透射率变化分布。

    METHOD AND APPARATUS FOR DUV TRANSMISSION MAPPING
    7.
    发明申请
    METHOD AND APPARATUS FOR DUV TRANSMISSION MAPPING 审中-公开
    用于DUV传输映射的方法和装置

    公开(公告)号：WO2009007977A2

    公开(公告)日：2009-01-15

    申请号：PCT/IL2008000960

    申请日：2008-07-10

    Applicant: PIXER TECHNOLOGY LTD ,  BEN-ZVI GUY ,  ZAIT EITAN ,  DMITRIEV VLADIMIR J ,  LABOVITZ STEVEN M ,  GRAITZER EREZ ,  SHARONI OFIR

    Inventor： BEN-ZVI GUY ,  ZAIT EITAN ,  DMITRIEV VLADIMIR J ,  LABOVITZ STEVEN M ,  GRAITZER EREZ ,  SHARONI OFIR

    CPC classification number: G03F1/84 ,  G01N21/33 ,  G01N21/59 ,  G01N21/958 ,  G01N2021/95676

    Abstract: Apparatus and method for transmittance mapping of an object which is at least partially transparent to deep ultraviolet radiation. The method comprises directing a wide-band deep ultraviolet radiation so as to illuminate different areas of an array of successive areas of the object; using an optical detector positioned on an opposite side of the object with respect to the radiation source detecting the wide-band deep ultraviolet radiation that emerges from the object; and processing signals from the optical detector to determine the transmittance of the radiation through the different areas of the array of successive areas of the object.

    Abstract translation: 对于深紫外线辐射至少部分透明的物体的透射率测绘的装置和方法。 该方法包括引导宽带深紫外线辐射以照射物体的连续区域阵列的不同区域; 使用相对于所述辐射源位于所述物体的相对侧上的光学检测器来检测从所述物体出射的宽带深紫外线辐射; 以及处理来自光学检测器的信号，以确定通过对象的连续区域阵列的不同区域的辐射的透射率。

    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE
    8.
    发明申请
    METHOD AND APPARATUS FOR REMOVING CONTAMINANTS OFF A RETICLE 审中-公开
    关于污染物排放的方法和装置

    公开(公告)号：WO2007039895A2

    公开(公告)日：2007-04-12

    申请号：PCT/IL2006001127

    申请日：2006-09-26

    Applicant: PIXER TECHNOLOGY LTD ,  ZAIT EITAN ,  OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  BEN-ZVI GUY ,  KRUGLYAKOV VLADIMIR

    Inventor： ZAIT EITAN ,  OSHEMKOV SERGEY ,  DMITRIEV VLADIMIR ,  BEN-ZVI GUY ,  KRUGLYAKOV VLADIMIR

    IPC: G06F19/00

    CPC classification number: G03F1/82

    Abstract: A method for removing a soft defect from a reticle, the reticle comprising a substrate made from material transparent to UV irradiation and having a front surface and a back opposite surface, the front surface provided with a pattern on an absorber coating layer, the soft defect being located on the coating layer, on a space of the pattern or at another location within a volume enclosed between a pellicle substantially covering the front surface and the front surface of the reticle. The method comprises receiving information on the location of the soft defect; generating a pulsed laser beam using the pulsed laser source; and based on the information directing the pulsed laser beam through the back surface of the reticle and into the substrate and focusing the beam on the target location within the substrate adjacent the location of the soft defect or directly on the location of the soft defect.

    Abstract translation: 一种用于从掩模版去除软缺陷的方法，所述掩模版包括由对UV照射透明的材料制成的基板，并且具有前表面和后相对表面，所述前表面在吸收器涂层上设置图案，所述软缺陷 位于涂层上，在图案的空间上或在基本上覆盖前表面的防护薄纸巾和掩模版的前表面之间的体积内的另一位置处。 该方法包括接收关于软缺陷位置的信息; 使用脉冲激光源产生脉冲激光束; 并且基于指示脉冲激光束通过掩模版的背表面并进入衬底的信息，并将光束聚焦在邻近软缺陷的位置的衬底内的目标位置上，或者直接在软缺陷的位置上。

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