公开(公告)号：WO0214231A3

公开(公告)日：2002-05-02

申请号：PCT/US0123353

申请日：2001-07-24

Applicant: YAZAKI CORP ,  KIRKBIR FIKRET ,  OTANI NATSUKI ,  RAYCHUDHURI SATYABRATA

Inventor： KIRKBIR FIKRET ,  OTANI NATSUKI ,  RAYCHUDHURI SATYABRATA

IPC: C03B19/12 ,  C03B19/14 ,  C03B37/014

CPC classification number: C03B19/1453 ,  C03B19/12 ,  C03B37/01446 ,  C03B2201/31 ,  C03B2203/22

Abstract: A process is suited for producing silica glass bodies having refractive index profiles. The process involves providing a porous body having an initially uniform dopant distribution, heating the porous body in a halogen-containing atmosphere to produce a dopant gradient, and densifying the porous body at an elevated temperature to produce the glass body. The process is more cost-effective than those previously known, and allows for high reproducibility of the refractive index gradients of the bodies produced.

Abstract translation: 一种方法适用于生产具有折射率分布的二氧化硅玻璃体。 该方法包括提供具有最初均匀掺杂剂分布的多孔体，在含卤素的气氛中加热多孔体以产生掺杂剂梯度，并在升高的温度下使多孔体致密化以产生玻璃体。 该方法比先前已知的方法更具成本效益，并且允许产生的物体的折射率梯度具有高的再现性。