公开(公告)号：WO2008066684A1

公开(公告)日：2008-06-05

申请号：PCT/US2007/023553

申请日：2007-11-08

申请人： CORNING INCORPORATED ,  ROSCH, William, R. ,  SABIA, Robert

发明人： ROSCH, William, R. ,  SABIA, Robert

IPC分类号： G02F1/1333

CPC分类号： B24B37/04 ,  G03F1/60 ,  G03F7/70791

摘要： The invention is directed to large LCD image masks having a final flatness of less than 40 nm and a method of making such LCD image masks by utilizing subaperture deterministic grinding/lapping /polishing. In one preferred embodiment the final flatness is

摘要翻译： 本发明涉及具有小于40nm的最终平坦度的大型LCD图像掩模和通过利用子孔径确定性研磨/研磨/研磨来制造这种LCD图像掩模的方法。 在一个优选实施例中，最终平坦度<20μm。 在另一个中，最终平坦度<10nm。 LCD图像掩模的长度和宽度各自独立于大于400mm，厚度小于20mm。 在至少一个优选实施例中，ICD图像掩模的长度和宽度各自独立地大于100mm，厚度<15mm。 玻璃LCD图像掩模可以是适用于LCD图像掩模的任何玻璃材料。 本发明的方法可以与所有这样的眼镜一起使用。 示例性LCD图像掩模玻璃包括熔融二氧化硅，高纯度熔融石英和含有5-10重量％二氧化钛的二氧化硅二氧化钛。

公开(公告)号：WO2007143069A3

公开(公告)日：2007-12-13

申请号：PCT/US2007/012899

申请日：2007-05-31

申请人： CORNING INCORPORATED ,  MAXON, John, E. ,  ROSCH, William, R.

发明人： MAXON, John, E. ,  ROSCH, William, R.

IPC分类号： C03C3/06 ,  C03B19/14

摘要： The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.

公开(公告)号：WO2007143069A2

公开(公告)日：2007-12-13

申请号：PCT/US2007012899

申请日：2007-05-31

申请人： CORNING INC ,  MAXON JOHN E ,  ROSCH WILLIAM R

发明人： MAXON JOHN E ,  ROSCH WILLIAM R

IPC分类号： C03C3/06 ,  C03B19/14

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B19/1484 ,  C03B2201/42 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/42 ,  C03C2203/50 ,  Y02P40/57

摘要： The invention is directed to a low expansion glass with reduced striae, the glass have a point to point variation in titania content is 0.1 wt% or less through its thickness and a CTE of 0 ± 3 ppb/°C throughout the temperature range 5-35 °C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat treating the glass at temperatures above 1600 °C for a time in the range of 48 160 hours. The invention is also directed to optical elements suitable for extreme ultraviolet lithography, which elements are made of a titania-containing silica glass having a titania content in the range of 5-10 wt.%, a polished and shaped surface have a peak to valley roughness of less than 10 nm, an average variation in titania content of less than ± 0.1 wt. % as measured through the vertical thickness of the glass and a coefficient of thermal expansion of 0 ± 3 ppb/°C throughout the temperature range 5 35 °C.

摘要翻译： 本发明涉及一种具有减少条纹的低膨胀玻璃，通过其厚度，玻璃具有0.1重量％以下的二氧化钛含量的点对点变化，并且在整个温度范围内的CTE为0±3ppb /℃， 35°C。 本发明还涉及一种通过使用在该方法中使用的振荡图案的重复时间为10分钟以下的方法制造低膨胀玻璃的方法。 此外，本发明的低膨胀玻璃可以通过在高于1600℃的温度下热处理玻璃在48 160小时的时间内进一步降低条纹。 本发明还涉及适用于极紫外光刻的光学元件，该元件由二氧化钛含量在5-10重量％范围内的含二氧化钛的二氧化硅玻璃制成，抛光和成形的表面具有峰谷 粗糙度小于10nm，二氧化钛含量的平均变化小于±0.1wt。 通过玻璃的垂直厚度测量，并且在整个温度范围5 35°C时，热膨胀系数为0±3ppb /°C。