Abstract:
A MEMS scanning micromirror manufacturing method with a method for manufacturing a MEMS scanning micromirror having a cantilever beam including providing a silicon on insulator (SOI) wafer 200 having a first silicon layer 202, a second silicon layer 206, and an insulating layer 204 between the first silicon layer 202 and the second silicon layer 206, the thickness of the first silicon layer 202 being a final thickness of the cantilever beam 72; and fashioning the cantilever beam 72 from the first silicon layer 202 while maintaining the final thickness of the cantilever beam.
Abstract:
The invention provides a device for a computer tomography gantry (91) for transmitting data, wherein the gantry comprises a stationary part (92) and a rotary part (93). The device is adapted to transmit the data between the stationary part of the gantry (92) and the rotary part (93) of the gantry (91). The device comprises a hollow conductor (104, 204, 308) which is adapted to guide a first wave, a sender (102, 103) which is adapted to send the first wave inside the hollow conductor and a receiver (106) which is adapted to receive the first wave after a runtime inside the hollow conductor (104, 204, 308). A further aspect of the invention is a computer tomography gantry (91) comprising a device according to the inventive concept. Using the described device allows to transmit data between the rotary (93) and the stationary part (92), to measure a rotating speed of the rotary part (93) and to measure a position of the rotary part (93) with respect to the stationary part (92).
Abstract:
A MEMS scanning micromirror including a mirror body 50, the mirror body 50 having a rotation axis 58 with a pair of extension bars 56 parallel to the rotation axis 58; a frame 60 forming a mirror recess 62 with a recess periphery 64, the frame 60 having a pair of opposed frame bars 66 on the recess periphery 64 along the rotation axis 58; a pair of cantilever beam assemblies 70, each of the pair of cantilever beam assemblies 70 being fixed to one of the pair of opposed frame bars 66 and coupled to one end of the pair of extension bars 56; and a pair of vertical support beams 40 connected between each of the pair of opposed frame bars 66 to the mirror body 50 along the rotation axis 58.
Abstract:
A MEMS scanning micromirror manufacturing method with a method for manufacturing a MEMS scanning micromirror having a cantilever beam including providing a silicon on insulator (SOI) wafer 200 having a first silicon layer 202, a second silicon layer 206, and an insulating layer 204 between the first silicon layer 202 and the second silicon layer 206, the thickness of the first silicon layer 202 being a final thickness of the cantilever beam 72; and fashioning the cantilever beam 72 from the first silicon layer 202 while maintaining the final thickness of the cantilever beam.
Abstract:
A MEMS scanning micromirror with reduced dynamic deformation with a mirror support including a rotation axis beam 120 having a rotation axis 58; a pair of extension bars 56 parallel to the rotation axis 58, each having a first end 140, a midpoint 142, and a second end 144; and a pair of X beams 130, each of the pair of X beams 130 having a cross midpoint 134. One of the pair of X beams 130 is connected to the first end 140 and the midpoint 142 of each of the pair of extension bars 56; the other of the pair of X beams 130 is connected to the midpoint 142 and the second end 144 of each of the pair of extension bars 56; and the rotation axis beam 120 is connected to the cross midpoint 134 of each of the pair of X beams 130.