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    REWRITALBE OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH A MEDIUM
    2.
    发明申请
    REWRITALBE OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH A MEDIUM 审中-公开
    REWRITALBE光学数据存储介质和这种介质的使用

    公开(公告)号：WO2004006233A1

    公开(公告)日：2004-01-15

    申请号：PCT/IB2003/002930

    申请日：2003-06-13

    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  LANKHORST, Martijn, H., R. ,  VAN PIETERSON, Liesbeth ,  VAN SCHIJNDEL, Mark

    Inventor： LANKHORST, Martijn, H., R. ,  VAN PIETERSON, Liesbeth ,  VAN SCHIJNDEL, Mark

    IPC: G11B7/24

    CPC classification number: G11B7/258 ,  G11B7/00454 ,  G11B7/006 ,  G11B7/243 ,  G11B7/2531 ,  G11B7/2533 ,  G11B7/2542 ,  G11B7/257 ,  G11B2007/2431 ,  G11B2007/24314 ,  G11B2007/24316

    Abstract: A rewritable optical data storage medium (20) for high-speed recording by means of a focused radiation beam (10) is described. The medium (20) comprises a substrate (1) carrying a stack (2) of layers. The stack (2) comprises a first dielectric layer (3), a second dielectric layer (5), and a recording layer (4) of a phase-change material of an alloy comprising Sb and Te. The recording layer (4) is interposed between the first dielectric layer (3) and the second dielectric layer (5). The alloy additionally contains 2 - 10 at.% of Ga, by which a significant improvement of the maximum data rate during direct overwrite is achieved. By furthermore adding 0.5 - 4.0 % of Ge to the alloy the archival life stability is enhanced.

    Abstract translation: 描述了用于通过聚焦辐射束（10）进行高速记录的可重写光学数据存储介质（20）。 介质（20）包括承载层（2）层的衬底（1）。 堆叠（2）包括第一介电层（3），第二介电层（5）和包含Sb和Te的合金的相变材料的记录层（4）。 记录层（4）介于第一介电层（3）和第二介质层（5）之间。 该合金另外含有2-10原子％的Ga，通过该合金，可以实现直接覆盖期间最大数据速率的显着改善。 通过进一步向合金中添加0.5〜4.0％的Ge，提高了档案寿命的稳定性。

    MULTI-STACK OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH MEDIUM
    7.
    发明申请
    MULTI-STACK OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH MEDIUM 审中-公开
    多层光学数据存储介质和这种介质的使用

    公开(公告)号：WO2004042717A1

    公开(公告)日：2004-05-21

    申请号：PCT/IB2003/004682

    申请日：2003-10-22

    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  VAN SCHIJNDEL, Mark ,  MARTENS, Hubert C., F. ,  TIEKE, Benno ,  ZHOU, Guofu

    Inventor： VAN SCHIJNDEL, Mark ,  MARTENS, Hubert C., F. ,  TIEKE, Benno ,  ZHOU, Guofu

    IPC: G11B7/24

    CPC classification number: G11B7/258 ,  G11B7/24038 ,  G11B7/246 ,  G11B7/2585

    Abstract: The present invention relates to a multi-stack optical data storage medium (10). The medium comprises a first substrate (1a) with present on a side thereof a first recording stack (13) named L 0 , a second substrate (1b) with present on a side thereof a second recording stack (12) named L 1 comprising a recordable type L 1 recording layer (4) having a thickness t RL1 and a complex refractive index n λ - i*k λ at a wavelength λ. A second reflective layer (6) is present adjacent the L 1 recording layer (4) at a side most remote from a radiation beam (20) entrance face (11) of the medium. The second recording stack L 1 (12) is present at a position closer to the entrance face (11) than the L 0 recording stack (13). A radiation beam transparent spacer layer (9) is sandwiched between the recording stacks (12, 13). In order to achieve compatibility with the DVD-9 ROM standard as far as reflection levels are concerned, the second reflective layer (6) mainly comprises the metal Cu and has a thickness t MLn selected from the range of 8 - 20 nm and the thickness t RL1 and k λ of the recordable L 1 recording layer (4) fulfils the formula t RL1 *k λ ≤ 8 nm.

    Abstract translation: 本发明涉及一种多层光学数据存储介质（10）。 介质包括第一基板（1a），其一侧上具有名为L0的第一记录堆叠（13），第二基板（1b），其一侧上具有名称为L1的第二记录堆叠（12），其包括可记录型 L1记录层（4），其具有厚度tRL1和复数折射率nλ-i * klambda。 第二反射层（6）在距离介质的辐射束（20）入射面（11）最远的一侧邻近L1记录层（4）存在。 第二记录堆叠L1（12）存在于比L0记录堆叠（13）更靠近入口面（11）的位置。 辐射束透明间隔层（9）夹在记录叠层（12,13）之间。 为了实现与DVD-9 ROM标准的兼容性，就反射水平而言，第二反射层（6）主要包括金属Cu，并且具有选自8-20nm范围内的厚度tMLn和厚度tRL1 和可记录的L1记录层（4）的klambda满足公式tRL1 * klambda <= 8nm。

    MULTI-STACK OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH MEDIUM
    8.
    发明申请
    MULTI-STACK OPTICAL DATA STORAGE MEDIUM AND USE OF SUCH MEDIUM 审中-公开
    多层光学数据存储介质和这种介质的使用

    公开(公告)号：WO2003094160A1

    公开(公告)日：2003-11-13

    申请号：PCT/IB2003/001509

    申请日：2003-04-11

    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V. ,  VAN SCHIJNDEL, Mark ,  ZHOU, Guo-Fu ,  RIJPERS, Johannes, C., N. ,  ROOSEN, Johannes, H., J. ,  KUIPER, Antonius, E., T.

    Inventor： VAN SCHIJNDEL, Mark ,  ZHOU, Guo-Fu ,  RIJPERS, Johannes, C., N. ,  ROOSEN, Johannes, H., J. ,  KUIPER, Antonius, E., T.

    IPC: G11B7/24

    CPC classification number: G11B7/257 ,  G11B7/00454 ,  G11B7/24038 ,  G11B7/258 ,  G11B2007/25706 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25711 ,  G11B2007/25713 ,  G11B2007/25715

    Abstract: A description is given of a multi-stack optical data storage medium (20) for rewritable recording using a focused radiation beam (30) entering through an entrance face (16) of the medium (20) during recording. The medium (20) has a substrate (1). Deposited on a side thereof is a first recording stack (2) with a phase-change type recording layer (6). The first recording stack (2) is present at a position most remote from the entrance face (16). At least one further recording stack (3), with a phase-change type recording layer (12) is present closer to the entrance face (16) than the first recording stack (2). A metal reflective layer of Cu, transparent for the radiation beam (30), is present in the further recording stack (3) and has a thickness between 2 and 10 nm. A transparent spacer layer (9) is present between the recording stacks (2, 3). In such a way a metal reflective layer (14) with a high optical transmission combined with sufficient heat sink action is achieved which furthermore has a low chemical reactivity with adjacent layers.

    Abstract translation: 给出了在记录期间使用聚焦辐射束（30）通过介质（20）的入射面（16）进入可重写记录的多层光学数据存储介质（20）的描述。 介质（20）具有基板（1）。 沉积在其一侧的是具有相变型记录层（6）的第一记录层（2）。 第一记录堆叠（2）存在于最远离入射面（16）的位置处。 具有相变型记录层（12）的至少一个另外的记录堆叠（3）比第一记录堆叠（2）更靠近入口面（16）。 对于辐射束（30）透明的Cu的金属反射层存在于另外的记录叠层（3）中，并且具有2至10nm的厚度。 在记录叠层（2,3）之间存在透明间隔层（9）。 以这种方式，实现了具有与具有足够散热作用的高光学透射率的金属反射层（14），该金属反射层还具有与相邻层的低化学反应性。

    METROLOGY METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
    9.
    发明申请
    METROLOGY METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
    计量方法和装置，以及装置制造方法

    公开(公告)号：WO2013026598A1

    公开(公告)日：2013-02-28

    申请号：PCT/EP2012/062555

    申请日：2012-06-28

    Applicant: ASML NETHERLANDS B.V. ,  WARNAAR, Patrick ,  VAN SCHIJNDEL, Mark ,  KUBIS, Michael

    Inventor： WARNAAR, Patrick ,  VAN SCHIJNDEL, Mark ,  KUBIS, Michael

    IPC: G03F7/00

    CPC classification number: G03F7/70633 ,  G03F1/44 ,  G03F7/70683

    Abstract: A target structure including one or more periodic structures is formed on a substrate by a lithographic process. A image of the target structure is detected while illuminating the target structure with a beam of radiation, the image being formed using a first part of non-zero order diffracted radiation while excluding zero order diffracted radiation. Intensity values extracted from at least one region of interest within the image are used to determine a property of the periodic structure, for example asymmetry or overlay. To locate the ROI, a processing unit recognizes locations of a plurality of boundary features in the image of the target structure. The number of boundary features in each direction is at least twice a number of boundaries of periodic structures within the target structure. The accuracy of locating the ROI is greater than by recognizing only the boundaries of the periodic structure(s). The boundary features can be created by providing interruptions in a boundary region of the periodic structure. Regions of interest can be located in X and Y directions simultaneously, and with diffraction in X and Y directions simultaneously.

    Abstract translation: 通过光刻工艺在衬底上形成包括一个或多个周期结构的靶结构。 在用辐射束照射目标结构的同时检测目标结构的图像，该图像使用非零次衍射辐射的第一部分形成，同时排除零级衍射辐射。 使用从图像内的至少一个感兴趣区域提取的强度值来确定周期性结构的属性，例如不对称或覆盖。 为了定位ROI，处理单元识别目标结构的图像中的多个边界特征的位置。 每个方向上边界特征的数量至少是目标结构内周期性结构边界数量的两倍。 定位ROI的准确性大于仅识别周期性结构的边界。 可以通过在周期性结构的边界区域中提供中断来创建边界特征。 感兴趣区域可以同时位于X和Y方向，同时在X和Y方向衍射。

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