公开(公告)号：WO2004077512B1

公开(公告)日：2005-08-04

申请号：PCT/US2004005214

申请日：2004-02-23

Applicant: BLUE29 CORP ,  IVANOV IGOR C ,  ZHANG JONATHAN WEIGUO

Inventor： IVANOV IGOR C ,  ZHANG JONATHAN WEIGUO

IPC: B23B31/14 ,  B23B31/18 ,  H01L21/00 ,  H01L21/687

CPC classification number: H01L21/67126 ,  B23B31/14 ,  B23B31/18 ,  H01L21/68707 ,  H01L21/68728 ,  Y10T279/18 ,  Y10T279/24 ,  Y10T279/247

Abstract: A universal substrate holder of the invention for treating wafer substrates in liquids is provided with a shaft and a rod slidingly inserted into the central opening of the shaft. The end of the shaft that protrudes into the bowl supports a base platform for the substrate, while the end of the rod that protrudes into the bowl has radial arms that rigidly support an annular plate with pins that can pass through the opening of the base platform so that they can support the substrate above the surface of the platform. The annular plate supports clamping jaws made in the form of two-arm levers with shorter arms and longer arms. The longer arms are heavier and therefore in the stationary state of the holder keep the jaws turned into an open position. When the shaft begins to rotate, the jaws are turned under the effect of centrifugal forces into positions of clamping the substrate with the shorter arms. When the rod is pulled down, the ends of the longer arms come into contact with the base platform and are turned into the clamping position. The substrate holder of the invention allows clamping and releasing of the substrate in positions of the substrate above the platform and in a position of the substrate on the base substrate, when the backside of the substrate is inaccessible to the process liquid.

Abstract translation: 用于在液体中处理晶片基底的本发明的通用基底保持器设有轴和可滑动地插入轴的中心开口中的杆。 突出到碗中的轴的端部支撑用于基底的基部平台，而突出到碗中的杆的端部具有径向臂，所述径向臂利用可以穿过基部平台的开口的销刚性地支撑环形板 以便它们可以将平台支撑在平台表面上方。 环形板支撑具有较短臂和较长臂的双臂杠杆形式的夹爪。 较长的臂较重，因此在保持器的静止状态下保持钳口转入打开位置。 当轴开始旋转时，夹爪在离心力的作用下转动到用较短的臂夹紧基板的位置。 当杆被拉下时，较长臂的端部与底座平台接触并转入夹紧位置。 当基板的背面不能接近处理液体时，本发明的基板支架允许在基板上方的基板位置和基板位于基板基板上的位置处夹持和释放基板。

公开(公告)号：WO2004077512A3

公开(公告)日：2004-09-10

申请号：PCT/US2004/005214

申请日：2004-02-23

Applicant: BLUE29 CORPORATION ,  IVANOV, Igor, C. ,  ZHANG, Jonathan, Weiguo

Inventor： IVANOV, Igor, C. ,  ZHANG, Jonathan, Weiguo

IPC: B23B31/14

Abstract: A universal substrate holder of the invention for treating wafer substrates in liquids is provided with a shaft and a rod slidingly inserted into the central opening of the shaft. The end of the shaft that protrudes into the bowl supports a base platform for the substrate, while the end of the rod that protrudes into the bowl has radial arms that rigidly support an annular plate with pins that can pass through the opening of the base platform so that they can support the substrate above the surface of the platform. The annular plate supports clamping jaws made in the form of two-arm levers with shorter arms and longer arms. The longer arms are heavier and therefore in the stationary state of the holder keep the jaws turned into an open position. When the shaft begins to rotate, the jaws are turned under the effect of centrifugal forces into positions of clamping the substrate with the shorter arms. When the rod is pulled down, the ends of the longer arms come into contact with the base platform and are turned into the clamping position. The substrate holder of the invention allows clamping and releasing of the substrate in positions of the substrate above the platform and in a position of the substrate on the base substrate, when the backside of the substrate is inaccessible to the process liquid.

公开(公告)号：WO2004077512A2

公开(公告)日：2004-09-10

申请号：PCT/US2004005214

申请日：2004-02-23

Applicant: BLUE29 CORP ,  IVANOV IGOR C ,  ZHANG JONATHAN WEIGUO

Inventor： IVANOV IGOR C ,  ZHANG JONATHAN WEIGUO

IPC: B23B31/14 ,  B23B31/18 ,  H01L21/00 ,  H01L21/687 ,  H01L

CPC classification number: H01L21/67126 ,  B23B31/14 ,  B23B31/18 ,  H01L21/68707 ,  H01L21/68728 ,  Y10T279/18 ,  Y10T279/24 ,  Y10T279/247

Abstract: A universal substrate holder of the invention for treating wafer substrates in liquids is provided with a shaft and a rod slidingly inserted into the central opening of the shaft. The end of the shaft that protrudes into the bowl supports a base platform for the substrate, while the end of the rod that protrudes into the bowl has radial arms that rigidly support an annular plate with pins that can pass through the opening of the base platform so that they can support the substrate above the surface of the platform. The annular plate supports clamping jaws made in the form of two-arm levers with shorter arms and longer arms. The longer arms are heavier and therefore in the stationary state of the holder keep the jaws turned into an open position. When the shaft begins to rotate, the jaws are turned under the effect of centrifugal forces into positions of clamping the substrate with the shorter arms. When the rod is pulled down, the ends of the longer arms come into contact with the base platform and are turned into the clamping position. The substrate holder of the invention allows clamping and releasing of the substrate in positions of the substrate above the platform and in a position of the substrate on the base substrate, when the backside of the substrate is inaccessible to the process liquid.

Abstract translation: 用于处理液体中的晶片基板的本发明的通用基板保持器设置有滑动地插入轴的中心开口中的轴和杆。 突出到碗中的轴的端部支撑用于基底的基座，而突出到碗中的杆的端部具有径向臂，其刚性地支撑环形板，销可以穿过基座的开口 使得它们可以支撑平台表面上方的基板。 环形板支撑以双臂杠杆的形式制成的夹爪，其具有较短的臂和较长的臂。 较长的手臂较重，因此在保持架的静止状态下，保持夹爪变成打开位置。 当轴开始旋转时，夹爪在离心力的作用下转动到用较短的臂夹持基板的位置。 当杆被拉下时，较长臂的端部与基座平台接触并转动到夹紧位置。 本发明的衬底保持器允许当衬底的背面不可用于处理液体时，衬底在平台上方的位置和衬底在基底衬底上的位置处的夹持和释放。