SOLAR CONCENTRATING MIRROR
    1.
    发明申请
    SOLAR CONCENTRATING MIRROR 审中-公开
    太阳能浓缩镜

    公开(公告)号:WO2009140493A1

    公开(公告)日:2009-11-19

    申请号:PCT/US2009/043952

    申请日:2009-05-14

    Abstract: An article that is suitable for use as a solar concentrating mirror for enhancing the use of solar collection devices, such as solar cells. The article includes a multilayer optical film and a compliant UV protective layer. The article addresses degradation issues in solar concentration devices, provides specific bandwidths of electromagnetic energy to the solar cell while eliminating or reducing undesirable bandwidths of electromagnetic energy that may degrade or adversely affect the solar cell, and renders a compliant sheet of material that may be readily formed into a multitude of shapes or constructions for end use applications. A solar collection device comprising the article and optionally comprising a celestial tracking mechanism is also disclosed.

    Abstract translation: 适合用作太阳能聚光镜的物品,用于增强太阳能收集装置如太阳能电池的使用。 该物品包括多层光学膜和柔顺的UV保护层。 该文章解决了太阳能集中装置中的降解问题,为太阳能电池提供了电磁能的特定带宽,同时消除或减少了可能降解或不利地影响太阳能电池的电磁能的不期望带宽,并使得容易的材料片 形成多种形状或结构用于最终用途应用。 还公开了一种包括该制品并且可选地包括天体跟踪机构的太阳能收集装置。

    METHOD OF MAKING A NANOSTRUCTURE
    3.
    发明申请
    METHOD OF MAKING A NANOSTRUCTURE 审中-公开
    制造纳米结构的方法

    公开(公告)号:WO2011139593A1

    公开(公告)日:2011-11-10

    申请号:PCT/US2011/033536

    申请日:2011-04-22

    Abstract: A method of making a nanostructure is provided that includes applying a thin, random discontinuous masking layer (105) to a major surface (103) of a substrate (101) by plasma chemical vapor deposition. The substrate (101) can be a polymer, an inorganic material, an alloy, or a solid solution. The masking layer (105) can include the reaction product of plasma chemical vapor deposition using a reactant gas comprising a compound selected from the group consisting of organosilicon compounds, metal alkyls, metal isopropoxides, metal acetylacetonates, and metal halides. Portions (107) of the substrate (101) not protected by the masking layer (105) are then etched away by reactive ion etching to make the nanostructures.

    Abstract translation: 提供一种制备纳米结构的方法,其包括通过等离子体化学气相沉积将薄的随机不连续掩模层(105)施加到衬底(101)的主表面(103)。 基板(101)可以是聚合物,无机材料,合金或固溶体。 掩模层(105)可以包括使用包含选自有机硅化合物,金属烷基,金属异丙氧基化物,金属乙酰丙酮化物和金属卤化物的化合物的反应物气体的等离子体化学气相沉积的反应产物。 然后通过反应离子蚀刻将未被掩模层(105)保护的衬底(101)的部分(107)蚀刻掉以制成纳米结构。

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