LOW-EMISSIVITY GLAZING
    2.
    发明申请
    LOW-EMISSIVITY GLAZING 审中-公开
    低功率玻璃

    公开(公告)号:WO2014191472A2

    公开(公告)日:2014-12-04

    申请号:PCT/EP2014/061093

    申请日:2014-05-28

    CPC classification number: C03C17/3618 C03C17/3626 C03C17/3644 C03C17/366

    Abstract: The invention relates to low-emissivity glazing units that are capable of undergoing a heat treatment and only change very little in properties when they are subjected to such a heat treatment. They comprise a transparent substrate provided with a stack of thin layers of the type: first dielectric coating / infrared radiation reflecting functional layer / barrier layer / second dielectric coating. They are characterised by a first dielectric coating comprising a layer made from an oxide, in direct contact with the substrate, by a barrier layer based on zinc oxide or consisting of an indium oxide possibly doped with tin, and by a second dielectric coating comprising, in order, a layer made from an oxide other than silicon oxide with a thickness greater than 5 nm and a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm.

    Abstract translation: 本发明涉及能够进行热处理的低发射率玻璃单元,并且当它们进行这种热处理时,其性能仅变化很小。 它们包括具有一层薄层的透明基板,其具有以下类型:第一介电涂层/红外辐射反射功能层/阻挡层/第二电介质涂层。 它们的特征在于第一介电涂层,其包括由氧化物直接接触的氧化物制成的层,所述层由基于氧化锌的阻挡层或可能掺杂有锡的氧化铟组成,以及通过第二电介质涂层, 按照厚度大于5nm的由氧化硅以外的氧化物制成的层和厚度大于10nm的氮化硅或氧化硅制成的层。

    LOW-EMISSIVITY AND ANTI-SOLAR GLAZING
    3.
    发明申请
    LOW-EMISSIVITY AND ANTI-SOLAR GLAZING 审中-公开
    低功率和抗太阳能玻璃

    公开(公告)号:WO2014191484A2

    公开(公告)日:2014-12-04

    申请号:PCT/EP2014/061113

    申请日:2014-05-28

    Abstract: The invention relates to low-emissivity and anti-solar glazing systems that change only very little in properties when they are subjected to a heat treatment. They comprise a stack of thin layers comprising an alternating arrangement of n infrared radiation reflecting functional layers and n+ 1 dielectric coatings, characterised in that: (i) the first dielectric coating comprises a layer made from an oxide in contact with the substrate, (ii) the portion of the coating stack between two functional layers comprises, in order: a barrier layer, a zinc oxide-based layer, a layer of zinc-tin mixed oxide, a nucleation layer, and (iii) the last dielectric coating comprises a layer made from an oxide other than silicon oxide with a thickness greater than 3 nm overlaid with a layer made from a silicon nitride or a silicon oxide with a thickness greater than 10 nm superposed thereon.

    Abstract translation: 本发明涉及低发射率和抗太阳能玻璃窗系统,它们在进行热处理时其特性变化很小。 它们包括一叠薄层,其包括反射功能层和n + 1电介质涂层的n个红外辐射的交替布置,其特征在于:(i)第一介电涂层包括由与基底接触的氧化物制成的层,(ii )涂层叠层在两个功能层之间的部分按顺序包括:阻挡层,氧化锌基层,锌 - 锡混合氧化物层,成核层,和(iii)最后的电介质涂层包括 由厚度大于3nm的氧化硅以外的氧化物制成的层与由氮化硅或厚度大于10nm的氧化硅叠加的层叠加。

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