公开(公告)号：WO2017160612A1

公开(公告)日：2017-09-21

申请号：PCT/US2017/021722

申请日：2017-03-10

Applicant: APPLIED MATERIALS, INC

Inventor： BRASHEAR, Kevin ,  OKADA, Ashley M. ,  DEMARS, Dennis L. ,  YE, Zhiyuan ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E.

IPC: H01L21/54 ,  H01L21/67

Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.

公开(公告)号：WO2018004856A1

公开(公告)日：2018-01-04

申请号：PCT/US2017/033073

申请日：2017-05-17

Applicant: APPLIED MATERIALS, INC

Inventor： BRASHEAR, Kevin M. ,  YE, Zhiyuan ,  HOUGH, Justin ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E. ,  OKADA, Ashley M.

IPC: G01F25/00 ,  G05D7/06

Abstract: Mass flow verification systems and apparatus may verify mass flow rates of mass flow controllers (MFCs) based on choked flow principles. These systems and apparatus may include a plurality of differently-sized flow restrictors coupled in parallel. A wide range of flow rates may be verified via selection of a flow path through one of the flow restrictors based on an MFC's set point. Mass flow rates may be determined via pressure and temperature measurements upstream of the flow restrictors under choked flow conditions. Methods of verifying a mass flow rate based on choked flow principles are also provided, as are other aspects.

Abstract translation: 质量流量验证系统和装置可以基于扼流流量原理来验证质量流量控制器（MFC）的质量流率。 这些系统和设备可以包括并联耦合的多个不同尺寸的流量限制器。 基于MFC的设定点，可以通过选择通过流量限制器之一的流动路径来验证宽范围的流量。 质量流量可以通过在扼流条件下流量限制器上游的压力和温度测量来确定。 还提供了基于阻塞流量原理验证质量流量的方法，以及其他方面。

公开(公告)号：WO2023091192A1

公开(公告)日：2023-05-25

申请号：PCT/US2022/034478

申请日：2022-06-22

Applicant: APPLIED MATERIALS, INC.

Inventor： LEE, Songjae ,  SHERVEGAR, Avinash ,  RANGAPPA, Srinivasa ,  SHANMUGAM, Sundarapandiyan ,  ULLOA, Ernesto J. ,  RAMACHANDRAN, Vinodh ,  PALATY, Abraham ,  RAJARAM, Jaidev

IPC: H01L21/67 ,  H01J37/32

Abstract: Apparatus for processing a substrate are described herein, More specifically, embodiments described herein relate to separate pre-clean process modules and pre-clean control modules coupled to a cluster tool assembly. Each pre-clean process module and each pre-clean control module are connected by a cable conduit which is configured to have power and control cables passing therethrough between the pre-clean process module and the ore-clean control module. A maintenance passage is formed through the cluster tool assembly. Each of a purge gas source, a process gas source, a manometer, an isolation port, and a throttle valve are all accessible from one side of the pre-clean process module.

公开(公告)号：WO2017160614A1

公开(公告)日：2017-09-21

申请号：PCT/US2017/021724

申请日：2017-03-10

Applicant: APPLIED MATERIALS, INC

Inventor： BRASHEAR, Kevin ,  OKADA, Ashley M. ,  DEMARS, Dennis L. ,  YE, Zhiyuan ,  RAJARAM, Jaidev ,  JOSEPHSON, Marcel E.

IPC: H01L21/54 ,  H01L21/67

Abstract: Methods and gas flow control assemblies configured to deliver gas to process chamber zones in desired flow ratios. In some embodiments, assemblies include one or more MFCs and a back pressure controller (BPC). Assemblies includes a controller, a process gas supply, a distribution manifold, a pressure sensor coupled to the distribution manifold and configured to sense back pressure of the distribution manifold, a process chamber, a one or more mass flow controllers connected between the distribution manifold and process chamber to control gas flow there between, and a back pressure controller provided in fluid parallel relationship to the one or more mass flow controllers, wherein precise flow ratio control is achieved. Alternate embodiments include an upstream pressure controller configured to control flow of carrier gas to control back pressure. Further methods and assemblies for controlling zonal gas flow ratios are described, as are other aspects.

Abstract translation: 方法和气体流量控制组件被配置成以期望的流量比将气体输送到处理室区域。 在一些实施例中，组件包括一个或多个MFC和背压控制器（BPC）。 组件包括控制器，处理气体供应，分配歧管，耦合到分配歧管并被配置为感测分配歧管的背压的压力传感器，处理室，连接在分配歧管和分配歧管之间的一个或多个质量流量控制器 处理腔室以控制其间的气体流动，以及与所述一个或多个质量流量控制器成流体并联关系地提供的背压控制器，其中实现精确的流量比控制。 可选实施例包括上游压力控制器，该上游压力控制器被构造成控制载气的流量以控制背压。 描述了用于控制区带气体流量比率的其他方法和组件以及其他方面。

公开(公告)号：WO2013126323A1

公开(公告)日：2013-08-29

申请号：PCT/US2013/026644

申请日：2013-02-19

Applicant: APPLIED MATERIALS, INC.

Inventor： SANCHEZ, Errol Antonio C. ,  JOSEPHSON, Marcel E. ,  RAJARAM, Jaidev ,  COLLINS, Richard O. ,  CARLSON, David K.

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/455 ,  C23C16/4482 ,  C23C16/4483 ,  Y10T137/0318 ,  Y10T137/6416

Abstract: Methods and apparatus for delivering a gas mixture to a process chamber are provided herein. In some embodiments, a precursor delivery apparatus may include an ampoule having a body with a first volume to hold a liquid precursor, an inlet to receive the liquid precursor and a carrier gas, and an outlet to flow a gas mixture of the liquid precursor and the carrier gas from the ampoule; a first heater disposed proximate to or in the first volume to heat the liquid precursor disposed in the first volume proximate to or at a first location within the first volume where the liquid precursor contacts the carrier gas; and a heat transfer apparatus disposed about the body to at least one of provide heat to or remove heat from the ampoule.

Abstract translation: 本文提供了将气体混合物输送到处理室的方法和装置。 在一些实施方案中，前体输送装置可以包括具有第一体积以容纳液体前体的本体的安瓿，用于接收液体前体和载气的入口，以及使液体前体和/ 来自安瓿的载气; 设置在第一体积附近或第一体积中的第一加热器，用于加热设置在第一体积中的液体前体，该液体前体靠近第一容积或液体前体接触载气的第一容积内的第一位置; 以及传热装置，其围绕所述主体设置为向所述安瓿提供热量或从所述安瓿去除热量中的至少一个。