公开(公告)号：WO2019210127A1

公开(公告)日：2019-10-31

申请号：PCT/US2019/029282

申请日：2019-04-26

Applicant: APPLIED MATERIALS, INC.

Inventor： RICE, Michael ,  AUBUCHON, Joseph ,  BALUJA, Sanjeev ,  OKADA, Ashley M. ,  FERNANDEZ, Alexander ,  XU, Ming ,  JOSEPHSON, Marcel E. ,  KOSHTI, Sushant Suresh ,  LE, Kenneth ,  BRASHEAR, Kevin

IPC: H01L21/67 ,  H01L21/02

Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A regulator is positioned at an upstream end of a shared volume having a plurality of downstream ends. A flow controller is positioned at each downstream end of the shared volume, the flow controller comprising an orifice and a fast pulsing valve. Methods of using the gas distribution apparatus and calibrating the flow controllers are also described.