公开(公告)号：WO2022140147A1

公开(公告)日：2022-06-30

申请号：PCT/US2021/063754

申请日：2021-12-16

Applicant: APPLIED MATERIALS, INC.

Inventor： GAUTAM, Ribhu ,  JINDAL, Vibhu ,  BHAT, Sanjay ,  CHORAGUDI, Praveen Kumar ,  RAMACHANDRAN, Vinodh ,  RENGARAJ, Arun

IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687 ,  G03F1/22 ,  C23C14/56 ,  C23C14/58

Abstract: Substrate processing systems or platforms and methods configured to process substrates including of extreme ultraviolet (EUV) mask blanks are disclosed. Systems or platforms provide a small footprint, high throughput of substrates and minimize defect generation. The substrate processing system platform comprises a single central transfer chamber, a single transfer robot, a substrate flipping fixture, and processing chambers are positioned around the single central transfer chamber.