公开(公告)号：WO2012166256A1

公开(公告)日：2012-12-06

申请号：PCT/US2012/033817

申请日：2012-04-16

Applicant: APPLIED MATERIALS, INC. ,  BOYD, Wendell G., Jr. ,  SOMMERS, Joseph F. ,  LU, William M. ,  BALESAN, Rajan

Inventor： BOYD, Wendell G., Jr. ,  SOMMERS, Joseph F. ,  LU, William M. ,  BALESAN, Rajan

IPC: H01L21/683 ,  H02N13/00 ,  B23Q3/15

CPC classification number: H01L21/6833 ,  H01L21/6875 ,  Y10T29/49746

Abstract: The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.

Abstract translation: 本发明一般涉及一种翻新的静电吸盘和一种用于对所用静电卡盘进行翻新的方法。 最初，从使用过的静电卡盘中除去预定量的介电材料以留下基面。 然后，基底表面被粗糙化以增强新的介电材料对其的粘附。 然后将新的介电材料喷涂到粗糙表面上。 然后将掩模放置在新的介电材料上，以帮助形成台面，在其中衬底将在其中在处理期间坐下。 然后去除新的介电层的一部分以形成新的台面。 去除掩模后，台面的边缘可能会平滑，并且经过翻新的静电卡盘可以在清洁后恢复使用。

公开(公告)号：WO2023283375A1

公开(公告)日：2023-01-12

申请号：PCT/US2022/036413

申请日：2022-07-07

Applicant: APPLIED MATERIALS, INC.

Inventor： BEHNKE, Joseph Frederick ,  WAKABAYASHI, Reyn Tetsuro ,  WONG, Carlaton ,  FRANKLIN, Timothy Joseph ,  SOMMERS, Joseph F.

IPC: H01J37/32

Abstract: Embodiments of showerheads are provided herein. In some embodiments, a showerhead assembly includes a chill plate comprising a gas plate and a cooling plate having an aluminum-silicon foil interlayer disposed therebetween for diffusion bonding the gas plate to the cooling plate and a heater plate comprising a first plate, a second plate, and a third plate, wherein an aluminum-silicon foil interlayer is disposed between the first plate and the cooling plate for diffusion bonding the first plate to the cooling plate, wherein an aluminum-silicon foil interlayer is disposed between the first plate and the second plate for diffusion bonding the first plate to the second plate, and wherein an aluminum-silicon foil interlayer is disposed between the second plate and the third plate for diffusion bonding the second plate to the third plate.

公开(公告)号：WO2017132205A1

公开(公告)日：2017-08-03

申请号：PCT/US2017/014844

申请日：2017-01-25

Applicant: APPLIED MATERIALS, INC.

Inventor： AMIR, Ofer ,  SUN, Jennifer Y. ,  RICE, Michael R. ,  KUCHAR, Michael C. ,  SOMMERS, Joseph F.

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01J37/32477 ,  B08B3/12 ,  H01J37/32091 ,  H01J37/32853 ,  H01L21/67126

Abstract: Slit valve gates and methods for cleaning are provided. Slit valves include: a slit valve gate configured to seal an opening of a process chamber, the slit valve gate comprising a surface that faces a processing volume of the process chamber; and a non-porous anodized coating on the surface of the slit valve gate. Methods of cleaning include: immersing the slit valve gate in a tank comprising deionized water; sonicating the slit valve gate at a first power density of about 6 W/cm 2 to about 15 W/cm 2 and a frequency of about 25 kHz to about 40 kHz for a first period of time; sonicating the slit valve gate at a second power density of about 30 W/cm 2 to about 45 W/cm 2 and a frequency of about 25 kHz to about 40 kHz for a second period of time; and removing the slit valve gate from the tank.

Abstract translation:

提供了狭缝阀门和清洁方法。 狭缝阀包括：构造成密封处理室的开口的狭缝阀门，狭缝阀门包括面向处理室的处理容积的表面; 和在狭缝阀门表面上的无孔阳极氧化涂层。 清洁方法包括：将狭缝阀门浸入包含去离子水的槽中; 以约6W / cm 2到约15W / cm 2的第一功率密度和约25kHz到约40kHz的频率对狭缝阀门进行超声处理， 第一段时间; 以约30W / cm 2到约45W / cm 2的第二功率密度对狭缝阀门进行超声处理，对于约25kHz到约40kHz的频率 第二段时间; 并从槽中取出狭缝阀门。

公开(公告)号：WO2015041812A1

公开(公告)日：2015-03-26

申请号：PCT/US2014/052727

申请日：2014-08-26

Applicant: APPLIED MATERIALS, INC.

Inventor： WANG, Jianqi ,  LU, William Ming-ye ,  NISHIMURA, Yukari ,  SOMMERS, Joseph F. ,  LO, Sio On ,  BALESAN, Rajan

IPC: H01L21/027

CPC classification number: B05C21/005 ,  C23C14/564 ,  C23C16/4404 ,  Y10T428/24165 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。

公开(公告)号：WO2021158346A1

公开(公告)日：2021-08-12

申请号：PCT/US2021/013540

申请日：2021-01-15

Applicant: APPLIED MATERIALS, INC.

Inventor： FRANKLIN, Timothy Joseph ,  SOMMERS, Joseph F. ,  WONG, Carlaton ,  WAKABAYASHI, Reyn ,  BEHNKE, Joseph Frederick

IPC: H01L21/67 ,  H01J37/32

Abstract: A showerhead assembly, and method of forming thereof is provided. The apparatus, for example, includes a gas distribution plate comprising an inner portion and an outer portion, the inner portion made from single crystal silicon (Si) and the outer portion made from one of single crystal Si or polysilicon (poly-Si), wherein a bonding layer is provided on a back surface of at least one of the inner portion or outer portion; a backing plate formed from silicon (Si) and silicon carbide (SiC) as a major component thereof, wherein the backing plate is bonded to at least one of the back surface of at least one of the inner portion or outer portion of the gas distribution plate.

公开(公告)号：WO2020251881A1

公开(公告)日：2020-12-17

申请号：PCT/US2020/036584

申请日：2020-06-08

Applicant: APPLIED MATERIALS, INC.

Inventor： SRINIVASAN, Swaminathan ,  SUBRAMANI, Anantha K. ,  JANAKIRAMAN, Karthik ,  SOMMERS, Joseph F.

IPC: H01J37/32 ,  C23C16/44

Abstract: Described herein are RF components with a modified surface material to improve chemical resistance and decrease metal contamination within processing chambers. Also disclosed herein are methods of manufacturing and using the same. Some embodiments of the disclosure comprise a base material with a Young's modulus greater than or equal to 75 GPa. Some embodiments of the disclosure have a modified surface material comprising one or more of aluminum, lanathanum and magnesium.

公开(公告)号：WO2022081865A1

公开(公告)日：2022-04-21

申请号：PCT/US2021/055012

申请日：2021-10-14

Applicant: APPLIED MATERIALS, INC.

Inventor： AGARWAL, Sumit ,  FRANKLIN, Timothy Joseph ,  SOMMERS, Joseph F.

IPC: B23K26/382 ,  B23K26/14 ,  B23K26/04 ,  H01L21/67 ,  B23K103/00

Abstract: Embodiments of a method of forming one or more holes in a substrate for use as a process chamber component are provided herein. In some embodiments, a method of forming one or more holes in a substrate for use as a process chamber component include forming the one or more holes in the substrate with one or more laser drills using at least one of a percussion drilling, a trepanning, or an ablation process, wherein each of the one or more holes have an aspect ratio of about 1:1 to about 50:1, and wherein the substrate is a component for gas delivery or fluid delivery.

公开(公告)号：WO2012142007A2

公开(公告)日：2012-10-18

申请号：PCT/US2012/032839

申请日：2012-04-10

Applicant: APPLIED MATERIALS, INC. ,  JACKSON, Michael ,  BOYD, Wendell G. ,  SOO, Tiong Khai ,  LU, William Ming-Ye ,  YOSHIDOME, Goichi ,  SOMMERS, Joseph F.

Inventor： JACKSON, Michael ,  BOYD, Wendell G. ,  SOO, Tiong Khai ,  LU, William Ming-Ye ,  YOSHIDOME, Goichi ,  SOMMERS, Joseph F.

IPC: H01L21/02

CPC classification number: C23C16/4404 ,  Y10T428/24355 ,  Y10T428/24479

Abstract: A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

Abstract translation: 提供了一种处理室部件及其制造方法。 处理室部件以本文所述的方式制造并且包括在腔室部件的表面上产生至少宏观纹理。 宏观纹理由在腔室部件的表面上以预定方向布置的多个工程特征限定。 在一些实施例中，工程特征防止形成在特征之间限定的视线表面，以增强沉积在腔室部件上的膜的保留。