公开(公告)号：WO2020117979A1

公开(公告)日：2020-06-11

申请号：PCT/US2019/064539

申请日：2019-12-04

Applicant: APPLIED MATERIALS, INC.

Inventor： WU, Xiaowei ,  SUN, Jennifer Y. ,  RICE, Michael R.

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/687

Abstract: Certain embodiments of the present disclosure relate to coated articles and methods of coating articles. In one embodiment, a coated article comprises an article adapted for use in a processing chamber, and a coating formed on exterior and interior surfaces of the article. In one embodiment, the coating comprises a rare earth metal-containing ceramic, and the coating is substantially uniform, conformal, and porosity-free.

公开(公告)号：WO2017171989A1

公开(公告)日：2017-10-05

申请号：PCT/US2017/014615

申请日：2017-01-23

Applicant: APPLIED MATERIALS, INC.

Inventor： LEE, Chengtsin ,  SUN, Jennifer Y. ,  CHEN, Yikai

IPC: H01L21/02 ,  H01L21/56 ,  H01L21/3065

CPC classification number: B08B3/12 ,  C11D3/042 ,  C11D3/046 ,  C11D11/0023 ,  C11D11/0047 ,  H01J37/32009 ,  H01J37/32862

Abstract: A method includes immersing an article comprising a yttrium based oxide in an acidic cleaning solution comprising water and 1-10 mol% HF acid. A portion of the yttrium based oxide is dissolved by the HF acid. A yttrium based oxy-fluoride is formed based on a reaction between the HF acid and the dissolved portion of the yttrium based. The yttrium based oxy-fluoride is precipitated onto the article over the yttrium based oxide to form a yttrium based oxy-fluoride coating. The acidic cleaning solution may include a yttrium based salt, which may additionally react with the HF acid to form more of the yttrium based oxy-fluoride.

Abstract translation: 一种方法包括将包含钇基氧化物的制品浸入包含水和1-10摩尔％HF酸的酸性清洁溶液中。 一部分钇基氧化物被HF酸溶解。 基于HF酸和钇基溶解部分之间的反应形成基于钇的氟氧化物。 基于钇的氧氟化物在钇基氧化物上沉淀到制品上以形成钇基氧氟化物涂层。 酸性清洁溶液可以包括基于钇的盐，其可以另外与HF酸反应以形成更多的基于钇的氟氧化物。

公开(公告)号：WO2017132205A1

公开(公告)日：2017-08-03

申请号：PCT/US2017/014844

申请日：2017-01-25

Applicant: APPLIED MATERIALS, INC.

Inventor： AMIR, Ofer ,  SUN, Jennifer Y. ,  RICE, Michael R. ,  KUCHAR, Michael C. ,  SOMMERS, Joseph F.

IPC: H01L21/677 ,  H01L21/67

CPC classification number: H01J37/32477 ,  B08B3/12 ,  H01J37/32091 ,  H01J37/32853 ,  H01L21/67126

Abstract: Slit valve gates and methods for cleaning are provided. Slit valves include: a slit valve gate configured to seal an opening of a process chamber, the slit valve gate comprising a surface that faces a processing volume of the process chamber; and a non-porous anodized coating on the surface of the slit valve gate. Methods of cleaning include: immersing the slit valve gate in a tank comprising deionized water; sonicating the slit valve gate at a first power density of about 6 W/cm 2 to about 15 W/cm 2 and a frequency of about 25 kHz to about 40 kHz for a first period of time; sonicating the slit valve gate at a second power density of about 30 W/cm 2 to about 45 W/cm 2 and a frequency of about 25 kHz to about 40 kHz for a second period of time; and removing the slit valve gate from the tank.

Abstract translation:

提供了狭缝阀门和清洁方法。 狭缝阀包括：构造成密封处理室的开口的狭缝阀门，狭缝阀门包括面向处理室的处理容积的表面; 和在狭缝阀门表面上的无孔阳极氧化涂层。 清洁方法包括：将狭缝阀门浸入包含去离子水的槽中; 以约6W / cm 2到约15W / cm 2的第一功率密度和约25kHz到约40kHz的频率对狭缝阀门进行超声处理， 第一段时间; 以约30W / cm 2到约45W / cm 2的第二功率密度对狭缝阀门进行超声处理，对于约25kHz到约40kHz的频率 第二段时间; 并从槽中取出狭缝阀门。

公开(公告)号：WO2015013070A1

公开(公告)日：2015-01-29

申请号：PCT/US2014/046732

申请日：2014-07-15

Applicant: APPLIED MATERIALS, INC.

Inventor： SUN, Jennifer Y. ,  KANUNGO, Biraja P. ,  FIROUZDOR, Vahid ,  ZHANG, Ying

IPC: C23C14/48 ,  C23C14/08 ,  C23C14/54

CPC classification number: H01L21/67023 ,  B65D43/02 ,  C23C4/01 ,  C23C4/04 ,  C23C4/10 ,  C23C4/11 ,  C23C4/12 ,  C23C4/134 ,  C23C4/14 ,  C23C4/16 ,  C23C14/0015 ,  C23C14/0021 ,  C23C14/0031 ,  C23C14/0036 ,  C23C14/0052 ,  C23C14/0084 ,  C23C14/0094 ,  C23C14/08 ,  C23C14/081 ,  C23C14/083 ,  C23C14/088 ,  H01J37/32477 ,  H01J37/32495 ,  H01J37/32513 ,  H01J2237/334 ,  H01L21/67063 ,  H01L21/67069 ,  H01L21/6708 ,  H01L21/67086 ,  Y10T428/131 ,  Y10T428/1317 ,  Y10T428/139 ,  Y10T428/1393

Abstract: A method of manufacturing an article comprises providing a lid or nozzle for an etch reactor. Ion assisted deposition (IAD) is then performed to deposit a protective layer on at least one surface of the lid or nozzle, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 µm and an average surface roughness of 10 micro-inches or less.

Abstract translation: 制造制品的方法包括提供用于蚀刻反应器的盖或喷嘴。 然后进行离子辅助沉积（IAD）以在盖或喷嘴的至少一个表面上沉积保护层，其中保护层是具有小于300μm的厚度的等离子体耐受稀土氧化物膜，平均表面粗糙度 为10微英寸或更小。

公开(公告)号：WO2014205212A1

公开(公告)日：2014-12-24

申请号：PCT/US2014/043178

申请日：2014-06-19

Applicant: APPLIED MATERIALS, INC.

Inventor： SUN, Jennifer Y. ,  KANUNGO, Biraja P. ,  FIROUZDOR, Vahid ,  CHO, Tom

IPC: H01L21/3065

CPC classification number: C23C14/08 ,  B32B18/00 ,  C23C14/083 ,  C23C14/22 ,  C23C14/228 ,  C23C14/34 ,  H01J37/32477 ,  H01J37/32495 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/265

Abstract: An article comprises a body and at least one protective layer on at least one surface of the body. The at least one protective layer is a thin film having a thickness of less than approximately 20 microns that comprises a ceramic selected from a group consisting of Y 3 Al 5 O 12 , Y 4 Al 2 O 9 , Er 2 O 3 , Gd 2 O 3 , Er 3 Al 5 O 12 , Gd 3 Al 5 O 12 and a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 -ZrO 2 .

Abstract translation: 一种制品包括主体和至少一个在身体的至少一个表面上的保护层。 所述至少一个保护层是厚度小于约20微米的薄膜，其包含选自Y 3 Al 5 O 12，Y 4 Al 2 O 9，Er 2 O 3，Gd 2 O 3，Er 3 Al 5 O 12，Gd 3 Al 5 O 12和包含Y 4 Al 2 O 9的陶瓷化合物的陶瓷， Y2O3-ZrO2溶液。

公开(公告)号：WO2014089244A1

公开(公告)日：2014-06-12

申请号：PCT/US2013/073192

申请日：2013-12-04

Applicant: APPLIED MATERIALS, INC.

Inventor： SUN, Jennifer Y. ,  THACH, Senh ,  KANUNGO, Biraja P. ,  FIROUZDOR, Vahid

IPC: H01L21/683 ,  C04B35/505

CPC classification number: H01L21/6831 ,  H01L21/6875 ,  H01L21/68757 ,  Y10T156/1041 ,  Y10T428/24322 ,  Y10T428/24997

Abstract: A substrate support assembly comprises a ceramic body and a thermally conductive base bonded to a lower surface of the ceramic body. The substrate support assembly further comprises a protective layer covering an upper surface of the ceramic body, wherein the protective layer comprises at least one of yttrium aluminum garnet (YAG) or a ceramic compound comprising Y 4 Al 2 O 9 and a solid-solution of Y 2 O 3 -ZrO 2 .

Abstract translation: 衬底支撑组件包括陶瓷体和结合到陶瓷体的下表面的导热底座。 衬底支撑组件还包括覆盖陶瓷体的上表面的保护层，其中保护层包括钇铝石榴石（YAG）或包含Y 4 Al 2 O 9的陶瓷化合物和Y 2 O 3 -ZrO 2的固溶体中的至少一种。

公开(公告)号：WO2022098567A1

公开(公告)日：2022-05-12

申请号：PCT/US2021/057195

申请日：2021-10-29

Applicant: APPLIED MATERIALS, INC.

Inventor： KONNOTH JOSEPH, Job George ,  GANTA, Sathya Swaroop ,  BERA, Kallol ,  NGUYEN, Andrew ,  PINSON, II, Jay D. ,  DHANAKSHIRUR, Akshay ,  ALAYAVALLI, Kaushik Comandoor ,  LAI, Canfeng ,  DUAN, Ren-Guan ,  SUN, Jennifer Y. ,  KALAL, Anil Kumar ,  PANDEY, Abhishek

IPC: H01J37/32 ,  H01F1/04 ,  C23C16/50 ,  C23C16/44

Abstract: A plasma chamber includes a chamber body having a processing region therewithin, a liner disposed on the chamber body, the liner surrounding the processing region, a substrate support disposed within the liner, a magnet assembly comprising a plurality of magnets disposed around the liner, and a magnetic-material shield disposed around the liner, the magnetic-material shield encapsulating the processing region near the substrate support.

公开(公告)号：WO2016011294A2

公开(公告)日：2016-01-21

申请号：PCT/US2015/040808

申请日：2015-07-16

Applicant: APPLIED MATERIALS, INC.

Inventor： RAMASWAMY, Kartik ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  SUN, Jennifer Y. ,  BREZOCZKY, Thomas B. ,  ROWLAND, Christopher A. ,  NEMANI, Srinivas D. ,  SRINIVASAN, Swaminathan ,  YAVELBERG, Simon ,  YIEH, Ellie Y. ,  NG, Hou T.

CPC classification number: B22F3/1055 ,  B22F1/0088 ,  B22F2003/1056 ,  B22F2003/1057 ,  B23K26/1464 ,  B23K26/342 ,  B23K26/702 ,  B28B1/001 ,  B28B17/0081 ,  B29C64/153 ,  B29C64/20 ,  B29C64/386 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y40/00 ,  B33Y50/02 ,  Y02P10/295

Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material onto the platen, a laser source configured to produce a laser beam during use of the additive manufacturing system, a controller configured to direct the laser beam to locations on the platen specified by a computer aided design program to cause the feed material to fuse, a gas source configured to supply gas, and a nozzle configured to accelerate and direct the gas to substantially the same location on the platen as the laser beam.

Abstract translation: 增材制造系统包括台板，构造成将进给材料传送到台板上的进给材料分配器设备，构造成在使用增材制造系统期间产生激光束的激光源，控制器 ，其被配置为将激光束引导至由计算机辅助设计程序指定的台板上的位置以引起供给材料熔合;配置成供给气体的气体源;以及配置成加速并引导气体到基本上相同位置的喷嘴 作为激光束的台板。

公开(公告)号：WO2016011290A1

公开(公告)日：2016-01-21

申请号：PCT/US2015/040803

申请日：2015-07-16

Applicant: APPLIED MATERIALS, INC.

Inventor： RAMASWAMY, Kartik ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  SUN, Jennifer Y. ,  NEMANI, Srinivas D. ,  BREZOCZKY, Thomas B. ,  ROWLAND, Christopher A. ,  YAVELBERG, Simon ,  SRINIVASAN, Swaminathan ,  PATIBANDLA, Nag B. ,  YIEH, Ellie Y. ,  NG, Hou T.

IPC: B29C67/00 ,  B33Y30/00 ,  B33Y50/02

CPC classification number: B22F3/1055 ,  B22F1/0003 ,  B22F2003/1051 ,  B22F2003/1057 ,  B22F2202/13 ,  B22F2301/205 ,  B22F2998/10 ,  B23K10/006 ,  B23K10/027 ,  B23K26/0006 ,  B23K26/342 ,  B23K26/702 ,  B23K2203/14 ,  B28B1/001 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02

Abstract: An additive manufacturing system includes a platen, a feed material dispenser apparatus configured to deliver a feed material over the platen, a laser configured to produce a laser beam, a controller configured to direct the laser beam to locations specified by data stored in a computer-readable medium to cause the feed material to fuse, and a plasma source configured to produce ions that are directed to substantially the same location on the platen as the laser beam.

Abstract translation: 添加剂制造系统包括压板，配置成将进给材料输送到压板上的进料分配器装置，配置成产生激光束的激光器，被配置为将激光束引导到存储在计算机可读介质中的数据指定的位置的控制器， 可引导进料材料熔化的等离子体源，以及被配置为产生离子的等离子体源，该离子被引导到与激光束基本相同的压板上的位置。

公开(公告)号：WO2016007672A1

公开(公告)日：2016-01-14

申请号：PCT/US2015/039609

申请日：2015-07-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ROWLAND, Christopher A. ,  SUBRAMANI, Anantha K. ,  KRISHNAN, Kasiraman ,  RAMASWAMY, Kartik ,  BREZOCZKY, Thomas B. ,  SRINIVASAN, Swaminathan ,  SUN, Jennifer Y. ,  YAVELBERG, Simon ,  NEMANI, Srinivas D. ,  PATIBANDLA, Nag B. ,  NG, Hou T.

IPC: B29C67/00 ,  B33Y30/00 ,  B33Y50/02

CPC classification number: B22F3/008 ,  B22F2003/1051 ,  B22F2003/1057 ,  B22F2998/10 ,  B23K10/006 ,  B23K10/027 ,  B28B1/001 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H05B3/0061

Abstract: An additive manufacturing system that includes a platen, a feed material delivery system configured to deliver feed material to a location on the platen specified by a computer aided design program and a heat source configured to raise a temperature of the feed material simultaneously across all of the layer or across a region that extends across a width of the platen and scans the region across a length of the platen. The heat source can be an array of heat lamps, or a plasma source.

Abstract translation: 一种添加剂制造系统，包括压板，进料输送系统，其被配置为将进料输送到由计算机辅助设计程序指定的压板上的位置;以及热源，该热源被配置为将所述进料的温度同时跨越所有 层或跨越压板的宽度延伸的区域，并跨越压板的长度扫描该区域。 热源可以是加热灯阵列或等离子体源。