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    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
    1.
    发明申请
    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE 审中-公开

    公开(公告)号：WO2019116215A1

    公开(公告)日：2019-06-20

    申请号：PCT/IB2018/059858

    申请日：2018-12-11

    Applicant: ARCELORMITTAL

    Inventor： SILBERBERG, Eric ,  SCHMITZ, Bruno ,  PACE, Sergio ,  BONNEMANN, Rémy ,  MARNEFFE, Didier

    IPC: C23C14/24 ,  C23C14/56

    CPC classification number: C23C14/24 ,  C23C14/562 ,  C23C14/564

    Abstract: The invention relates to a vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and comprising: - a central casing comprising a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, - a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap comprising at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
    2.
    发明申请
    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE 审中-公开

    公开(公告)号：WO2019116081A1

    公开(公告)日：2019-06-20

    申请号：PCT/IB2017/057943

    申请日：2017-12-14

    Applicant: ARCELORMITTAL

    Inventor： SILBERBERG, Eric ,  SCHMITZ, Bruno ,  MARNEFFE, Didier ,  PACE, Sergio ,  BONNEMANN, Rémy

    IPC: C23C14/24 ,  C23C14/56

    CPC classification number: C23C14/24 ,  C23C14/562 ,  C23C14/564

    Abstract: The invention relates to a vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility comprising a vacuum chamber and a means for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further comprises: - a central casing comprising a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, - a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors,

    APPARATUS AND METHOD FOR VACUUM DEPOSITION
    4.
    发明申请
    APPARATUS AND METHOD FOR VACUUM DEPOSITION 审中-公开
    用于真空沉积的装置和方法

    公开(公告)号：WO2018020311A1

    公开(公告)日：2018-02-01

    申请号：PCT/IB2017/000876

    申请日：2017-07-27

    Applicant: ARCELORMITTAL

    Inventor： PACE, Sergio ,  SILBERBERG, Eric ,  WILDERS, Dimitri ,  BONNEMANN, Rémy ,  GAOUYAT, Lucie

    IPC: C23C14/24

    Abstract: The invention relates to a vacuum deposition facility (1) for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element, the facility comprising a vacuum deposition chamber (2) and a means for running the substrate (5) through the chamber, wherein the facility further comprises: • - a vapor jet coater (3), • - an evaporation crucible (4) suited to feed the vapor jet coater with a vapor comprising the main element and the at least one additional element, • - a recharging furnace (9) suited to feed the evaporation crucible with the main element in molten state and capable of maintaining a constant level of liquid in the evaporation crucible, • - a feeding unit (11) suited to be fed with the at least one additional element in solid state and suited to feed the evaporation crucible with the at least one additional element indifferently in molten state, in solid state or partially in solid state. The invention also relates to a process for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element.

    Abstract translation: 本发明涉及一种真空沉积设备（1），其用于在运行基板上连续沉积由金属合金形成的涂层，所述金属合金包括主要元件和至少一个附加元件，所述设施包括真空沉积 所述设备还包括： - 蒸气喷射涂覆器（3）; - 蒸发坩埚（4），其适于向所述蒸汽喷射涂覆器供给蒸汽喷射涂覆器 包括所述主元件和所述至少一个附加元件的蒸汽， - 再充料炉（9），其适于以熔融状态供给具有所述主元件的所述蒸发坩埚并且能够保持所述蒸发坩埚中的液体的恒定水平， - - 供给单元（11），其适合于以固态供给所述至少一个附加元件并且适合于以熔融状态，固态或部分地供给所述蒸发坩埚和所述至少一个附加元件 固体状态。 本发明还涉及一种在运行基材上连续沉积由包含主要元素和至少一种附加元素的金属合金形成的涂层的方法。

    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
    6.
    发明申请
    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE 审中-公开

    公开(公告)号：WO2019116214A1

    公开(公告)日：2019-06-20

    申请号：PCT/IB2018/059856

    申请日：2018-12-11

    Applicant: ARCELORMITTAL

    Inventor： SILBERBERG, Eric ,  SCHMITZ, Bruno ,  PACE, Sergio ,  BONNEMANN, Rémy ,  MARNEFFE, Didier

    IPC: C23C14/24 ,  C23C14/56

    CPC classification number: C23C14/24 ,  C23C14/562 ,  C23C14/564

    Abstract: The invention relates to a vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility comprising a vacuum chamber and a means for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further comprises: - a central casing comprising a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, - a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE
    7.
    发明申请
    VACUUM DEPOSITION FACILITY AND METHOD FOR COATING A SUBSTRATE 审中-公开

    公开(公告)号：WO2019116082A1

    公开(公告)日：2019-06-20

    申请号：PCT/IB2017/057946

    申请日：2017-12-14

    Applicant: ARCELORMITTAL

    Inventor： SILBERBERG, Eric ,  SCHMITZ, Bruno ,  PACE, Sergio ,  BONNEMANN, Rémy ,  MARNEFFE, Didier

    IPC: C23C14/24 ,  C23C14/56

    CPC classification number: C23C14/24 ,  C23C14/562 ,  C23C14/564

    Abstract: The invention relates to a vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, and comprising: - a central casing comprising a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors, - a vapor trap located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors, the passage linking the central casing to the vapor trap comprising at least one thermal connector extending at least from the inner walls of the central casing to the inner walls of the vapor trap.

    APPARATUS AND METHOD FOR VACUUM DEPOSITION
    10.
    发明申请
    APPARATUS AND METHOD FOR VACUUM DEPOSITION 审中-公开
    用于真空沉积的装置和方法

    公开(公告)号：WO2018020296A1

    公开(公告)日：2018-02-01

    申请号：PCT/IB2016/054477

    申请日：2016-07-27

    Applicant: ARCELORMITTAL

    Inventor： PACE, Sergio ,  SILBERBERG, Eric ,  WILDERS, Dimitri ,  BONNEMANN, Rémy ,  GAOUYAT, Lucie

    IPC: C23C14/24

    Abstract: The invention relates to a vacuum deposition facility (1) for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element, the facility comprising a vacuum deposition chamber (2) and a means for running the substrate (S) through the chamber, wherein the facility further comprises: - a vapor jet coater (3), - an evaporation crucible (4) suited to feed the vapor jet coater with a vapor comprising the main element and the at least one additional element, - a recharging furnace (9) suited to feed the evaporation crucible with the main element in molten state and capable of maintaining a constant level of liquid in the evaporation crucible, - a feeding unit (11) suited to be fed with the at least one additional element in solid state and suited to feed the evaporation crucible with the at least one additional element indifferently in molten state, in solid state or partially in solid state. The invention also relates to a process for continuously depositing, on a running substrate, coatings formed from metal alloys comprising a main element and at least one additional element.

    Abstract translation: 本发明涉及一种真空沉积设备（1），其用于在运行基板上连续沉积由金属合金形成的涂层，所述金属合金包括主要元件和至少一个附加元件，所述设施包括真空沉积 （3）， - 蒸发坩埚（4），该蒸发坩埚（4）适于向蒸气喷射涂覆器供给蒸气（2）和用于使基板（S） 包括所述主元件和所述至少一个附加元件， - 再充电炉（9），其适于以熔融状态供给所述蒸发坩埚，并且所述主元件处于熔融状态并且能够保持所述蒸发坩埚中的恒定液位; - 供给单元 （11），其适合于供给至少一种处于固态的附加元件，并且适于以熔融状态，固态或部分固态向蒸发坩埚供给至少一种附加元件。 本发明还涉及一种在运行基材上连续沉积由包含主要元素和至少一种附加元素的金属合金形成的涂层的方法。

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